Tdk Corporation

Shinya Yoshihara

Masao Yamaguchi

Kanji Kobayashi

Jun Kudo

Toshio Kubota

Yoshiaki Ito

Hisayuki Abe

Yoshikazu Ito

Takashi Sakurai

Satoshi Kurimoto

Hiroshi Shindo

Ko Onodera

Genichi Watanabe

Hiroshi Shindou

Akihiro Horita

Masahiko Konno

There are provided a ceramic electronic component and a method for producing the ceramic electronic component, where a ground electrode layer can be directly coated with lead-free solder without lowering reliabilities. Terminal electrodeis provided with a ground electrode layerof Cu having been formed by firing, a solder layerformed of a lead-free solder based on five elements of Sn&#x2014;Ag&#x2014;Cu&#x2014;Ni&#x2014;Ge, and a diffusion layerhaving been formed by the diffusion of Ni between the ground electrode layerand the solder layer. Because the diffusion layerof Ni is formed between the ground electrode layerand the solder layer, the diffusion layer, which functions as a barrier layer, suppresses the solder leach of Cu from the ground electrode layer. The diffusion layerof Ni can also suppress the growth of fragile intermetallic compounds of Sn&#x2014;Cu. Therefore, a decrease in the bonding strength between the ground electrode layerand the solder layercan be prevented.

Ceramic electronic component and method for producing same

For cleaning a wafer by a cleaning apparatus, a cleaning liquid is contained in a cleaning bath. Leaving two brushes open, the wafer is inserted to the cleaning bath, placed on oscillation and rotation rollers and retained by the rollers. The brushes are closed and the wafer is held by the brushes. Next, the two brushes are rotated while the wafer is oscillated and rotated by the rollers and so on. Furthermore, ultrasonic vibrations are applied to the cleaning liquid in the cleaning bath by an ultrasonic generator. Scrub cleaning with the two brushes and ultrasonic cleaning by ultrasonic vibrations are thereby performed on the wafer.

Cleaning method

Cleaning apparatus

A cleaning apparatus includes a cleaning tank for reserving cleaning fluid, an object to be cleaned being immersed in the cleaning fluid, a vibrator for vibrating the cleaning fluid in the cleaning tank, and two micro-vibration sources for minutely vibrating the object to be cleaned in two different directions.

Cleaning apparatus and method

In the case where an object to be ground is ground by mounting a horizontally elongated jig onto a grinding head and by bringing the object into contact with a grinding surface of a grinding disk being driven and rotated, the attitude of the grinding head is controlled by an adjust ring that is in surface contact with the grinding surface of the grinding disk while moving the grinding head, the horizontally elongated jig holding thereon the object that has a plurality of thin film magnetic heads arrayed thereon. Thereby, the flatness of the object is improved and variations in the throat heights of many magnetic heads formed on the object to be ground are reduced by allowing the attitude of the object to be controlled with a grinding surface of a grinding disk as a reference.

Magnetic head grinding method and apparatus

Growing community of inventors

Kisakata-machi, Japan

Shinya Yoshihara