Dic Corporation

Shinya Yamamoto

Masanori Miyamoto

Tomoyuki Imada

Yutaka Kadomoto

Hidetomo Kai

Tetsuo Kusumoto

Masanao Hayashi

Ayaki Hosono

Junichi Miyake

Kenta Shimizu

The compound is represented by general formula (i). In the compound, in a group K, at least two secondary carbon atoms in an alkyl group (a linear alkyl, halogenated alkyl, or cyanogenated alkyl group having 3 to 40 carbon atoms) are replaced with &#x2014;C(&#x2550;X)&#x2014; and/or &#x2014;CH(&#x2014;CN)&#x2014;, where Xis an oxygen atom, a sulfur atom, NH, or NR; in addition, a group A, a group A, or the group Kincludes, as a substituent, at least one P-Sp- group, where Pis a polymerizable group, and SPis a spacer group or a single bond. The liquid crystal composition including the compound represented by general formula (i) can be adsorbed onto substrates between which a liquid crystal layer is held, and, consequently, without the use of an alignment film, liquid crystal molecules can be maintained in a state in which the liquid crystal molecules are aligned in a vertical direction.

Polymerizable compound, and liquid crystal composition and liquid crystal display element in which the compound is used

To provide a resist material that can form a film with high smoothness and uniformity and has high patterning performance, such as resolution, a resist material is provided that contains a calixarene compound (A) with a molecular structure represented by the following structural formula (1) and a resin component (B); wherein Rdenotes a perfluoroalkyl group or a structural moiety with a perfluoroalkyl group; Rdenotes a hydrogen atom, a polar group, a polymerizable group, or a structural moiety with a polar group or a polymerizable group; Rdenotes a hydrogen atom, an aliphatic hydrocarbon group that optionally has a substituent, or an aryl group that optionally has a substituent; n denotes an integer in the range of 2 to 10; and * denotes a bonding point with an aromatic ring.

Resist material

A calixarene compound represented by formula (1) below is provided. The calixarene compound contains, per molecule, at least one &#x2014;CHOH group or phenolic hydroxy group and at least one carbon-carbon unsaturated bond. R's are a structural moiety (A), which has a &#x2014;CHOH group; a structural moiety (B), which has a carbon-carbon unsaturated bond; a structural moiety (C), which has a &#x2014;CHOH group and a carbon-carbon unsaturated bond; a monovalent organic group (D), which is different from (A), (B), and (C); or a hydrogen atom (E). R's are (A), (B), (C), (D), or (E) provided that not all R's are (E). R's are one of a hydrogen atom, an aliphatic hydrocarbon group, and an aryl group, n is 2 to 10. * is a point of attachment to an aromatic ring. A curable composition including the calixarene compound is provided. A cured product of the curable composition is provided 

Calixarene compound, curable composition, and cured product

A compound useful as a release agent, and a release agent, a curable composition, and a nanoimprint lithography resin material each containing the compound are provided. More specifically, a calixarene compound with a molecular structure represented by the following structural formula (1) and a composition containing the calixarene compound are provided. wherein Rdenotes a structural moiety with a perfluoroalkyl group, Rdenotes a hydrogen atom, a polar group, a polymerizable group, or a structural moiety with a polar group or a polymerizable group, Rdenotes a hydrogen atom, an aliphatic hydrocarbon group that may have a substituent, or an aryl group that may have a substituent, n denotes an integer in the range of 2 to 10, and * denotes a bonding point with an aromatic ring.

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Sakura, Japan

Shinya Yamamoto