Nec Corporation

Kabushiki Kaisha Toshiba

Nikkiso Company Limited

Sony Corporation

Mitsubishi Denki Kabushiki Kaisha

Nec Tokin Corporation

Disco Corporation

Other

Mitsubishi Electric Corporation

Panasonic Intellectual Property Management Co., Ltd.

Honda Motor Co., Ltd.

Renesas Technology Corp.

Kawasaki Jukogyo Kabushiki Kaisha

Kabushiki Kaisha Topcon

National Institute of Information and Communications Technology, Incorporated

Shinya Watanabe

Tetsumi Ochi

Hiroshi Ono

Yoshio Awakura

Kenichi Matsushima

Hiroaki Mochizuki

Kazuyuki Iizuka

Koji Kamei

Masaru Takizawa

Yoshinori Tanaka

Susumu Saito

Makoto Watanabe

Hitoshi Suzuki

Keiji Tatani

Satoshi Abe

Toru Tojo

Katsuhiko Suzuki

Kenichi Tanaka

Masaru Suzuki

Takashi Okamoto

Mitsuya Kinoshita

Ryoichi Hirano

Yoshiaki Kitano

Yoshiyuki Uchinono

Toshiaki Ogawa

Kazuo Abe

Takatoshi Masuda

Keiichi Kajiyama

Setsuo Yamamoto

Tatsuo Kasaoka

Moriaki Akazawa

Kazuyuki Higashi

Takayuki Saito

Satoshi Watanabe

Yuji Matsumoto

Kohei Sasaki

Shigeyoshi Yoshida

Isao Ozawa

Shigeru Inai

Yuichi Yokoyama

Kaoru Nomichi

Hiroshi Shinkai

Kaoru Fukuda

Hitoshi Saito

Morio Takahashi

Kuniaki Yagi

Eiichi Ishikawa

Katsuhiko Kohyama

Seiji Harada

Masataka Higashiwaki

Chikara Iwasawa

Tsukasa Aiba

Kimiyoshi Koshi

Takashi Inaguchi

Mitsuru Kurihara

Akito Kuramata

Fumitomo Takano

Hiroshi Matsuo

Masaki Tani

Katsuki Hotta

Joji Nakashima

Fumihiro Tanaka

Yoshio Shimada

Hayato Kaji

Takekazu Masui

Yuta Sagara

Kaneo Yamaguchi

Satoshi Shiratori

Shunji Yasumura

Junichi Shiga

Yu Yamaoka

Tsukasa Kusano

Eiichi Tsuga

Yusuke Kawakami

Ichiro Yamahata

Daiki Wakimoto

Mikio Mori

Nobuhiro Torii

Yosuke Isoo

Katsutoshi Ikarashi

Kouji Yahazu

Jin Takano

Naoki Sakuma

Yoshikazu Kobayashi

Shinya Inoue

Naoki Hatta

Xihao Tan

Hirotoshi Hoshikawa

Shinichi Hirasawa

Masanori Tajima

Hiroshi Fukuta

Tomoki Furuya

Hidenori Konagayoshi

Takeshi Muro

Michio Nemoto

Katsuhisa Chiba

Kei Takizawa

Taku Kamoto

Shouhei Maezawa

Shunji Kurita

To visually display the manufacturing statuses of products manufactured through a plurality of manufacturing processes in order and changes of process characteristic factors caused in the manufacturing processes, a visualization system according to an embodiment stores manufacturing log information including start times and end times of manufacturing processes of products grouped in manufacturing units and manufactured through a plurality of manufacturing processes in order, and chronological history information of process characteristic factors corresponding to factors affecting quality characteristics in the manufacturing processes. A time axis for the process characteristic factors in synchronization with the time course of the manufacturing log information is created, and a display object representing a state or a change of each of the process characteristic factors is created based on the chronological history information and placed on the time axis to create a timeline object of each of the process characteristic factors. A process characteristic factor timeline screen including the timeline objects of the respective process characteristic factors arranged in parallel is displayed on a display apparatus.

Visualization system

A spot welding method includes supplying a welding current having a pulse-shaped waveform to a workpiece by alternately executing a step of maintaining the welding current within a set peak current range and a step of decreasing the welding current from the peak current range toward a bottom current and then increasing the welding current toward the peak current range when an effective value of the welding current reaches a set target range for a plurality of cycles. The spatter detection method includes measuring a pulse width IW(1), IW(2), . . . in each cycle of the pulse-shaped waveform and detecting the occurrence of spatter when a pulse width difference D(M)=IW(M)−IW(M−1) between a pulse width IW(M) in a target cycle (M-th cycle) and a pulse width IW(M−1) in a cycle immediately before the target cycle exceeds a width threshold value Dth.

Spatter detection method

A switch includes a first fixed contactor, a second fixed contactor, a movable contactor, permanent magnets, and a yoke. The movable contactor extends in a first direction, includes a first movable contact at a first end portion, and is provided to be contactable with and separatable from the first fixed contactor in a second direction. The permanent magnets are arranged to sandwich the movable contactor, and to cause their surfaces facing the movable contactor in the third direction of the movable contactor to have the same polarity. The yoke surrounds a periphery of the movable contactor in the first direction and the third direction and is connected to surfaces of the permanent magnets on opposite sides of their surfaces facing the movable contactor. The yoke includes a protrusion protruding toward the movable contactor at a position facing the first end portion of the movable contactor in the first direction.

Switch

A switch includes: a first stationary contact having a first stationary contact point; a second stationary contact having a second stationary contact point; a movable contact having a first movable contact, and a second movable contact point; a first magnet pair defined by magnets having surfaces facing each other, the magnets of the first magnet pair being disposed with the first stationary contact point and the first movable contact point therebetween in such a manner that the magnets of the first magnet pair become farther from each other outwardly; and a second magnet pair defined by magnets having surfaces facing each other, the magnets of the second magnet pair being disposed with the second stationary contact point and the second movable contact point therebetween in such a manner that the magnets of the second magnet pair become farther from each other outwardly.

Switch configured to form magnetic fields relative to contact points

A workpiece processing apparatus which coats a front surface of a workpiece with a resin, the workpiece having devices formed in regions demarcated by a plurality of planned dividing lines formed in a lattice pattern. The workpiece processing apparatus includes a cassette mounting base mounted with a cassette housing a plurality of workpieces, a resin coating unit that coats the front surface of the workpiece with the resin, a resin curing unit that cures the resin by applying an external stimulus to the coated resin, a resin grinding unit that flattens the cured resin by grinding the cured resin by a rotating grinding stone, and a conveying mechanism that conveys the workpiece between the units.

Workpiece processing apparatus including a resin coater and a resin grinder

A processing apparatus used in processing a workpiece having a device in each of a plurality of regions that includes a chuck table holding the workpiece, positioning means positioning the workpiece before grinding, resin coating means including a rotatable spinner table for coating the workpiece with a resin, cleaning means, a grinding unit, and a transfer unit. The transfer unit includes a first transfer unit transferring the workpiece from the positioning means to the spinner table and from the spinner table to the chuck table, a second transfer unit transferring the workpiece from the chuck table to the cleaning means, and a front/back surface inversion transfer unit taking over the workpiece from the cleaning means to the second transfer unit.

Workpiece processing and resin grinding apparatus

A semiconductor substrate includes a single crystal GaO-based substrate and a polycrystalline substrate that are bonded to each other. A thickness of the single crystal GaO-based substrate is smaller than a thickness of the polycrystalline substrate, and a fracture toughness value of the polycrystalline substrate is higher than a fracture toughness value of the single crystal GaO-based substrate.

Semiconductor substrate, semiconductor element and method for producing semiconductor substrate

To manufacture a sprue-bush which is capable of suitably cooling a melt raw resin in a raw resin-flow path as a whole, there is provided a method for manufacturing a sprue-bush, wherein a shaped part is located on a base part to manufacture the sprue-bush, the base part comprising a raw resin-flow path and a cooling medium-flow path, wherein, in the shaped part, a downstream raw resin-flow path portion is located and a downstream cooling medium-flow path portion is also located, the downstream raw resin-flow path portion corresponding to a downstream side region of a raw resin-flow path of the sprue-bush, the downstream cooling medium-flow path portion being positioned around the downstream raw resin-flow path portion and corresponding to a downstream side region of a cooling medium-flow path of the sprue-bush, and wherein the downstream cooling medium-flow path portion is located to surround the downstream raw resin-flow path portion.

Sprue-bush and method for manufacturing sprue-bush

Provided is a water treatment apparatus that can uniformly irradiate water to be treated with ultraviolet light in sufficient irradiation quantity and in which a cleaning device and the like can be mounted easily. A water treatment apparatus that subjects water to be treated to ultraviolet treatment using ultraviolet light, the water treatment apparatus comprises: a flow channel through which water to be treated flows; and an ultraviolet irradiation portion that is located on an opposite side of the flow channel from an inlet side, and irradiates the water to be treated flowing in the flow channel with ultraviolet light via a window portion toward the inlet side, the window portion being formed by a transparent member, wherein the flow channel includes a diameter increase portion, and the diameter increase portion is provided with at least one of: a cleaning device used to clean the window portion; and a sensor.

Water treatment apparatus

In order to provide a sprue-bush which is capable of suitably cooling a melt raw resin in a raw resin-flow path as a whole, there is provided a sprue-bush, comprising a raw resin-flow path and a cooling medium-flow path located around the raw resin-flow path, wherein a width dimension of the raw-resin flow path gradually becomes larger toward a downstream side-end surface of the sprue-bush, and wherein the downstream side-end surface of the sprue-bush is a heat transfer surface.

Sprue-bush

Provided is a flowing-water sterilization system that includes a flow channel for passing seawater to be sterilized, and a light source emitting ultraviolet light to irradiate the seawater passing through the flow channel, wherein the light source includes a light-emitting diode that emits light not including infrared light. The light-emitting diode may emit ultraviolet light that has a wavelength of not less than 250 nm and not more than 350 nm and does not include light with a wavelength of not more than 200 nm. The system may further include a cooling unit for cooling the light source.

Flowing-water sterilization system

A water treatment apparatussubjects water to be treated to ultraviolet treatment with ultraviolet light emitted from LED elements. The water treatment apparatuscomprises: a flow channelthrough which water to be treated flows; an LED element housing chamberlocated on outside of the flow channel, with a window portionformed by a transparent member being interposed therebetween; and a plurality of LED elementsarranged in the LED element housing chamber, wherein the LED element housing chamberhas an inletand an outletfor dry gas, and light emitting surfaces of the plurality of LED elementsare exposed to a space in the LED element housing chamber

Water treatment apparatus with dry gas flow

An ultraviolet sterilization device includes a processing chamber that houses a subject of sterilization and a light source that irradiates an interior of the processing chamber with ultraviolet light. A wall of the processing chamber has a stack structure including a first layer made of a fluororesin material and a second layer made of an ultraviolet reflective material, the first layer being provided on the inner side of the processing chamber. The light source includes an aluminum gallium nitride (AlGaN) based ultraviolet light emitting device.

Ultraviolet sterilization device

A fluid sterilization device includes: a housing formed with a processing passage for sterilizing a fluid passing through the processing passage; a light source that radiates ultraviolet toward the processing passage; and a transmissive member provided between the light source and the processing passage and transmitting the ultraviolet light radiated by the light source. The transmissive member is a one-piece component including: a focusing part that focuses the ultraviolet light radiated by the light source toward the processing passage by refracting or reflecting the ultraviolet light; an exit part that guides the ultraviolet light transmitted through the focusing part toward the processing passage, and a supported part formed on an outer circumference of the exit part to be contiguous with the exit part, and supported by the housing. The exit part is exposed to the processing passage.

Fluid sterilization device

A water treatment device includes: a dual-pipe structure unit including an outer pipe, an inner pipe provided in the outer pipe, and a prevention member provided between the outer pipe and the inner pipe; and a light source unit radiating ultraviolet light in the axial direction to irradiate water subject to treatment flowing in the inner pipe. The inner pipe includes an opposing end facing the light source unit across a gap and an inflow end positioned opposite to the opposing end. The outer pipe includes an outflow port provided on an outer circumferential surface of the outer pipe. The water subject to treatment flowing out of the inner pipe via the gap flows out from the outflow port.

Water treatment device and water treatment method

Growing community of inventors

Tokyo, Japan

Shinya Watanabe