Canon Anelva Corporation

Shinya Nagasawa

Nobuo Yamaguchi

Kimiko Mashimo

A deposition apparatus includes a shutter storage unit which is connected to a processing chamber via an opening and stores a shutter in the retracted state into an exhaust chamber, and a shield member which is formed around the opening of the shutter storage unit and covers the exhaust port of the exhaust chamber. The shield member has, at a position of a predetermined height between the opening of the shutter storage unit and a deposition unit, the first exhaust path which communicates with the exhaust port of the exhaust chamber.

Deposition apparatus and electronic device manufacturing method

It is an object of this invention to prevent a deposited film from adhering to an exhaust chamber so as to suppress the generation of particles. A sputtering apparatus () includes a shutter accommodation unit () which is detachably placed in an exhaust chamber () and accommodates a shutter () in a retracted state, and shield members () which at least partially cover the exhaust port of the exhaust chamber (), and are at least partially formed around an opening portion of the shutter accommodation unit ().

Growing community of inventors

Hino, Japan

Shinya Nagasawa