Tokyo Ohka Kogyo Co., Ltd.

Shinya Koga

Kazuhiro Takahashi

Yukihisa Wada

Daijiro Mori

Natsumi Okawa

An aqueous cleaning liquid including hydrofluoric acid and tetradecylphosphonic acid, and a method of cleaning an electronic device, contacting the electronic device with the aqueous cleaning liquid.

Aqueous cleaning liquid and method of cleaning electronic device

A chemical solution used for cleaning or etching a ruthenium-containing layer, which can obtain the ruthenium-containing layer having a reduced surface roughness while maintaining a good etching rate against the ruthenium, and a method for fabricating ruthenium wiring. The chemical solution includes orthoperiodic acid, a base component, and any one of a nitrogen-containing heterocyclic compound, an organic phosphonic acid, and an organic carboxylic acid.

Chemical solution used for cleaning or etching ruthenium-containing layer and method for fabricating ruthenium wiring

A method for manufacturing a ruthenium wiring including (i) treating a metal surface including ruthenium using a first chemical solution including a compound having a functional group capable of coordinating to a ruthenium atom, and (ii) carrying out an etching treatment on the metal surface including ruthenium treated with the first chemical solution, using a second chemical solution.

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Kawasaki, Japan

Shinya Koga