Fujitsu Corporation

Nippon Kayaku Kabushiki Kaisha

Nippon Telegraph and Telephone Corporation

Shinya Inagaki

Norifumi Shukunami

Keiko Takeda

Tomoaki Takeyama

Kenji Tagawa

Susumu Kinoshita

Keiko Sasaki

Naoko Imaizumi

Nao Honda

Taiki Kobayashi

Kazuya Sasaki

Hiroyuki Itou

Kazuo Yamane

Sakae Yoshizawa

Takashi Shimizu

Hisashi Takamatsu

Kaoru Moriya

Takashi Tsuda

Yumiko Kawasaki

Misato Oonishi

Osamu Oyama

Yasushi Sugaya

Takashi Sato

Hiroshi Onaka

Hiroyuki Itoh

Michikazu Shima

Nobuhiro Fukushima

Masato Nishihara

Etsuko Hayashi

Manabu Watanabe

Tadashi Okiyama

Yoshiyuki Ono

Tadao Arima

Yoshihito Onoda

Miki Takeda

Koji Okamura

Takashi Satou

Norio Suzuki

Kazunari Tsubaki

Masayoshi Shigihara

Akihiko Ichikawa

Akitoshi Mesaki

Kouji Okamura

Takanori Koizumi

Maki Kumagai

Etsugo Yoneda

Takeshi Sumiya

Norifumi c/o Fujitsu Hokkaido Digital Technology Limited Shukunami

Hiroyuki Fujitsu Hokkaido Digital Technology Limited Itoh

The purpose of the present invention is to provide: a photosensitive epoxy resin composition and/or a resist laminate of said resin composition that makes it possible to use photolithography to form an image having a vertical sidewall shape and fine resolution, low stress, and heat/humidity resistance; and a cured product of said resin composition and said resist laminate. The present invention is a photosensitive resin composition comprising: (A) an epoxy resin; (B) a polyol compound having a specific structure; (C) a photocationic polymerization initiator; and (D) an epoxy group-containing silane compound. The epoxy resin (A) comprises: an epoxy resin (a) obtained by reacting a phenol derivative that is represented by formula (1) with an epihalohydrin; and an epoxy resin (b) that is represented by formula (2). 

Photosensitive resin composition, resist laminate, and cured product thereof (1)

The purpose of the present invention is to provide the following: a photosensitive epoxy resin composition that, via photolithography, can form a high-resolution, low-stress image that has vertical side walls and resists moisture and heat, and/or a resist laminate using said photosensitive epoxy resin composition; and an article or articles obtained by curing said photosensitive epoxy resin composition and/or resist laminate. The present invention is a photosensitive resin composition containing the following: an epoxy resin (A), a polyol compound (B) having a specific structure, a cationic-polymerization photoinitiator (C), a silane compound (D) containing an epoxy group, and a reactive epoxy monomer (E) having a specific structure. The epoxy resin (A) contains the phenol derivative represented by formula (1), an epoxy resin (a) obtained via a reaction with epihalohydrin, and an epoxy resin (b) that can be represented by formula (2). 

Photosensitive resin composition, resist laminate, and articles obtained by curing same (5)

The purpose of the present invention is to provide: a resin composition, a cured product of which has extremely low residual stress and exhibits excellent adhesion to a metal substrate such as a Pt, LT or Ta substrate after a wet heat test in the fields of semiconductors and MEMS/micromachine applications; a laminate of this resin composition; and a cured product of this resin composition or the laminate. The present invention is a photosensitive resin composition which contains an epoxy resin (A), a compound having a phenolic hydroxyl group (B) and a cationic photopolymerization initiator (C), and wherein: the epoxy resin (A) has a weighted average epoxy equivalent weight of 300 g/eq. or more; 20% by mass or more of the epoxy resin (A) is an epoxy resin represented by formula (1) and having an epoxy equivalent weight of 500-4,500 g/eq.; and the compound having a phenolic hydroxyl group (B) contains a phenolic compound having a specific structure. 

Photosensitive resin composition, resist laminate, cured product of photosensitive resin composition, and cured product of resist laminate (11)

The purpose of the present invention is to provide: a photosensitive epoxy resin composition and/or a resist laminate of said resin composition that makes it possible to use photolithography to form an image having a vertical sidewall shape and fine resolution, low stress, and heat/humidity resistance; and a cured product of said resin composition and said resist laminate. The present invention is a photosensitive resin composition comprising: (A) an epoxy resin; (B) a polyphenol compound having a specific structure; (C) a photocationic polymerization initiator; and (D) an epoxy group-containing silane compound. The epoxy resin (A) comprises: an epoxy resin (a) obtained by reacting a phenol derivative that is represented by formula (1) with an epihalohydrin; and an epoxy resin (b) that is represented by formula (2). 

Photosensitive resin composition, resist laminate, and cured product thereof (2)

The purpose of the present invention is to provide the following: a photosensitive epoxy resin composition that, via photolithography, can form a high-resolution, low-stress image that has vertical side walls and resists moisture and heat, and/or a resist laminate using said photosensitive epoxy resin composition; and an article or articles obtained by curing said photosensitive epoxy resin composition and/or resist laminate. The present invention is a photosensitive resin composition containing the following: an epoxy resin (A), a polyhydric phenol compound (B) having a specific structure, a cationic-polymerization photoinitiator (C), a silane compound (D) containing an epoxy group, and a reactive epoxy monomer (E) having a specific structure. The epoxy resin (A) contains the phenol derivative represented by formula (1), an epoxy resin (a) obtained via a reaction with epihalohydrin, and an epoxy resin (b) that can be represented by formula (2). The reactive epoxy monomer (E) is a bisphenol epoxy resin. 

Photosensitive resin composition, resist laminate, and articles obtained by curing same (7)

A negative photosensitive resin composition which contains (A) an epoxy resin that has two or more epoxy groups in each molecule, (B) an alkali-soluble resin and (C) a cationic photopolymerization initiator. The epoxy resin (A) is an epoxy resin that is obtained by a reaction between a phenol derivative represented by formula (1) and an epihalohydrin. 

Negative photosensitive resin composition and cured product of same

An alkali-developing-type photosensitive resin composition comprising: a polycarboxylic acid resin (A) obtained by reacting a polybasic anhydride (c) with a reactant (ab) between a difunctional bisphenol epoxy resin (a) having an epoxy group at both terminals and an epoxy equivalent of 600-1300 g/eq., and a monocarboxylic acid compound (b) having an alcoholic hydroxyl group; an epoxy resin (B) having two or more epoxy groups in a molecule; and a photoacid generator (C), wherein the addition ratio the monocarboxylic acid compound (b) with respect to 1 equivalent of the epoxy group of the epoxy resin (a) is 80 equivalent % or more, and the addition ratio the polybasic anhydride with respect to one equivalent of the primary hydroxyl group of the reactant (ab) is 80 equivalent % or more.

Photosensitive resin composition and cured product thereof

An optical amplification device which includes first and second optical amplifiers, and a controller. The first optical amplifier receives a light and amplifies the received light. The second optical amplifier receives the light amplified by the first optical amplifier, and amplifies the received light. When a level of the light received by the first optical amplifier changes by &#x394;, the controller controls a level of the light received by the second optical amplifier to change by approximately &#x2212;&#x394;. In various embodiments, the controller causes the sum of the gains of the first and second optical amplifiers to be constant. In other embodiments, the optical amplification device includes first and second optical amplifier and a gain adjustor. The gain adjustor detects a deviation in gain of the first optical amplifier from a target gain, and adjusts the gain of the second optical amplifier to compensate for the detected deviation.

Gain and signal level adjustments of cascaded optical amplifiers

The present invention has an object to provide an optical amplifier capable of realizing a good response characteristic in a wide frequency band, even when a population inversion state is formed by a pumping light supplied to an optical amplification medium and an ASE light generated in the optical amplification medium. To this end, in the optical amplifier according to the present invention, a delayed phase matching fiber in which a first fiber whose response speed is relatively low is arranged on the input side and a second fiber whose response speed is relatively high is arranged on the output side, is used as the optical amplification medium doped with a rare-earth element.

Optical amplifier using delayed phase matching fiber

An optical fiber includes: a first core portion doped with rare earth ions; a second core portion having a lower refractive index than that of the first core portion, provided along an outer circumference of the first core portion, and doped with the rare earth ions; and a clad portion having a lower refractive index than that of the second core portion and provided along an outer circumference of the second core portion, and is configured such that a concentration of the rare earth ions added to the second core portion is higher than that to the first core portion. With this configuration, it is possible to suppress an amount of FWM crosstalk in an optical amplification by decreasing the length of a fiber while alleviating efficiency deterioration due to concentration quenching.

Optical fiber, manufacturing method of the same, and optical amplifier

An optical amplifier includes an optical amplification medium, an excitation source to stimulate the amplification medium to output at least one wavelength gain peak, and a gain equalizer to equalize the output of the amplification medium such that gain is produced at wavelengths other than the wavelength gain peak. The gain equalizer may attenuate gain at the peak wavelength. The gain equalizer may equalize the output of the amplification medium such that gain is produced at wavelengths less than the wavelength gain peak. The optical amplifier may include both a gain equalizer and automatic level control circuitry to respectively maintain substantially uniform gain at wavelengths within an optical signal band and maintain constant output power.

Optical amplification method and device usable with bands other than the C-band

Both wavelength dispersion and a dispersion slope of a line fiber are simultaneously compensated for by combining two types of dispersion compensators having different characteristics.

Apparatus and method of compensating for wavelength dispersion of optical transmission line

A wavelength division multiplexed optical amplifier, enabling elimination of the problems of oscillation and fluctuation in output due to ASE at the time of a rapid change in the number of input wavelengths, provided with a first-stage optical amplifying unit, second-stage optical amplifying unit, a common AGC circuit for common AGC of the first and second optical amplifying units, and a pumping light distribution means for applying pumping light to the first and second-stage optical amplifying units with a predetermined distribution ratio.

Wavelength division multiplexed optical amplifier

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Kawasaki, Japan

Shinya Inagaki