Gigaphoton Inc.

Shinya Ikesaka

Yutaka Shiraishi

Tsukasa Hori

Takanobu Ishihara

Toshiro Umeki

Toshiyuki Hirashita

A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.

Target supply device, processing device and processing method therefor

Target supply device, processing device and processing method thefefor

A target supply device may include: a target generator configured to accommodate a liquid target material and having a nozzle with a nozzle hole from which the liquid target material is outputted; and a filter disposed in the target generator and made of glass, the glass reacting with the liquid target material, so that a solid reaction product is generated. The filter may include a first through-hole configured to allow the liquid target material to pass therethrough, and an inner surface of the first through-hole may be coated with a material which is not easy to react with the liquid target material.

Target supply device

Growing community of inventors

Oyama, Japan

Shinya Ikesaka