Rigaku Corporation

Rigaku Industrial Corporation

Shinya Hara

Yasujiro Yamada

Makoto Doi

Takashi Matsuo

Yoshiyuki Kataoka

Naoki Kawahara

Hisashi Honma

Yoshihisa Yamamoto

Hisashi Homma

Kenji Kodama

An exclusion module (21) is configured to calculate a coating amount of each component whose measurement element is not contained in the base layers, for each of corresponding measurement lines, on an assumption that that component solely makes up the thin film and to adopt a maximum coating amount as an initial value of the coating amount of that component; and to calculate a coating amount of each component whose measurement element is contained in the base layers, for each of corresponding measurement lines, on the basis of initial values of coating amounts of individual components whose measurement elements are not contained in the base layers, if calculation results for all the corresponding measurement lines give errors, to exclude that component from analysis targets as an unquantifiable component, and in other cases, to adopt a maximum coating amount as an initial value of the coating amount of that component.

X-ray fluorescence spectrometer

Provided are an X-ray fluorescence spectrometer and a control method for an X-ray fluorescence spectrometer which are capable of preventing deterioration and breakage of a sample, and contamination of an inside of an apparatus even when an abnormality occurs in the X-ray fluorescence spectrometer. The X-ray fluorescence spectrometer includes: a measuring unit including: a moving mechanism configured to move a sample between a standby position and a measurement position; an X-ray source; a detector; and a first control unit; and an information processing unit including: an analysis unit; and a second control unit configured to control the measuring unit by communicating with the first control unit, the first control unit including retreat controller configured to perform retreat control for causing the moving mechanism to retreat the sample present at the measurement position to the standby position when communication between the first control unit and the second control unit is interrupted.

X-ray fluorescence spectrometer and control method for x-ray fluorescence spectrometer

An X-ray fluorescence spectrometer of the present invention includes: a determination module () configured to determine, with respect to every one of measurement lines that correspond to secondary X-rays having intensities to be measured, whether or not a ratio of a theoretical intensity in thin film calculated on the basis of an assumed thickness and known contents of respective components to a theoretical intensity in bulk calculated on the basis of the known contents of the respective components exceeds a predetermined threshold; and a saturation thickness quantification module () configured to, according to a positive determination by the determination module (), calculate a saturation thickness with respect to each of the measurement lines, at which the theoretical intensity saturates, on the basis of the known contents of the respective components and to adopt a largest saturation thickness as a quantitative value of a thickness.

A X-ray fluorescence spectrometer of the present invention simultaneously generates an analytical pulse-height width profile and a narrow pulse-height width profile that are distributions of intensities of secondary X-rays () against scan angles (&#x3b8;) set by an interlocking unit () on the basis of a differential curve which is output by a multichannel pulse-height analyzer (), as well as a predetermined analytical pulse-height width for an analytical line that is a primary reflection line and a predetermined narrow pulse-height width that is narrower than the analytical pulse-height width. Identification of the analytical lines is performed for the analytical pulse-height width profile and the narrow pulse-height width profile, and any analytical line identified only in the narrow pulse-height width profile is added to the analytical lines identified in the analytical pulse-height width profile to obtain an identification result of the analytical lines.

A quantitative analysis condition setting unit () included in a sequential X-ray fluorescence spectrometer according to the present invention: performs qualitative analyses of a plurality of standard samples (); sets, on the basis of the qualitative analysis results, a peak measurement angle of each measurement line for analytical samples () in quantitative analysis conditions; and obtains a single virtual profile by synthesizing peak profiles of the plurality of standard samples () subjected to the qualitative analyses and sets, on the basis of the virtual profile and a preset half value width of the peak profile, background measurement angles of each measurement line for the analytical samples () in the quantitative analysis conditions.

A scanning-type X-ray fluorescence spectrometer according to the present invention includes a quantitative analysis condition setting unit configured to determine whether or not to add, as an analytical element, a new detected element other than preset sample constituting elements, from an absorption-enhancement effect degree of fluorescent X-rays on an analytical value of an analytical element and an overlapping effect degree by an interfering line on an analytical line of the analytical element, on the basis of qualitative analysis results and semi-quantitative analysis results of standard samples.

A measurement line evaluation unit (): calculates, for all of specified measurement lines, estimated measured intensities by theoretical calculation on the basis of a composition and/or a thickness specified for a thin film; changes, by a predetermined amount, only an estimated measured intensity of one measurement line, and obtains quantitative values of the composition and/or the thickness of the thin film after change of the estimated measured intensity, for each changed measurement line, by a fundamental parameter method; and estimates a quantitative error and/or determines possibility of analysis, on the basis of the obtained quantitative values and the specified composition and/or the specified thickness.

An X-ray fluorescence spectrometer which includes a calculating device () operable to calculate the theoretical intensity of secondary X-rays (), emanated from each of elements contained in a sample (), based on the assumed composition and then to successively approximately modify and calculate the assumed composition so that the theoretical intensity and the converted and measured intensity, which have been detected by a detecting device () and then converted in a theoretical intensity scale, can match with each other, to thereby calculate the composition of the sample (). The calculating device (), when calculating the theoretical intensity, performs a simulation to determine the theoretical intensity of the secondary X-rays () for each of optical paths, using the size of the sample (), and the intensity and the incident angle (&#x3c6;) of primary X-rays () impinged upon various areas of the sample surface () as parameters.

X-ray fluorescence spectrometer and program used therein

A calculating devicefor calculating the concentration of elements contained in a samplebased on the FP method is provided. The calculating deviceis operable to assume a concentration of unmeasured elements as far as unmeasured elements, of which fluorescent X-rays are not measured, are concerned, and, also, to utilize, in place of the secondary X-rays emanating from the unmeasured elements contained in the sample, scattered X-rays of the primary X-rays at least equal in number to the number of the unmeasured elements, of which concentrations are assumed, and including scattered X-rays of different wavelengths before they are scattered from the sample.

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Takatsuki, Japan

Shinya Hara