Fujitsu Corporation

Hitachi, Ltd.

Hitachi Consumer Electronics Co., Ltd.

Hitachi Plasma Patent Licensing Co., Ltd.

Shinya Fukuta

Keiichi Betsui

Osamu Toyoda

Tadashi Nakatani

Shigeo Kasahara

Tomonari Misawa

Toshiaki Onimaru

Tadayoshi Kosaka

Minoru Hasegawa

Hironori Sakata

Hajime Inoue

Kazunori Inoue

Yoshiho Seo

Yasunobu Hashimoto

Akira Nakazawa

Fumihiro Namiki

Noriyuki Awaji

A protective film () having a high secondary-emission coefficient is formed on a dielectric layer () so as to lower the discharge voltage of a plasma display panel. When the protective film () is exposed to the air, it will transform or become cloudy, or the secondary-emission coefficient will lower. To prevent this problem, an inert film () is formed on the surface of the protective film (). As the inert film (), a film of a metal oxide such as SiOand a film of a metal such as Tb are simultaneously formed. Thus, an inert film () excellent in barrier property against oxygen and water in the air and enabling easy sputtering from near the discharge electrode at the aging step can be obtained. With this, a plasma display panel exhibiting a low discharge voltage can be realized.

Plasma display panel having inert film and manufacturing method

A technique for achieving both discharge voltage reduction and discharge stabilization in a PDP and the like is provided. This PDP manufacturing method includes, for a structure of a front plate structure () to be exposed to a discharge space () to be filled with a discharge gas, a step of forming a first layer () having an effect of discharge protective layer on a dielectric layer (), a step of forming a second layer () for protecting the first layer on the first layer, and a step of forming a third layer () of a powder for discharge stabilization to be exposed to the discharge space (), the steps being performed in vacuum manufacturing process. And, the structure is made such that a surface of the first layer is exposed to the discharge space () by a step of removing the second layer by an aging discharge in the discharge space ().

Plasma display panel having a discharge stabilizer powder and method of manufacturing the same

A display device comprising at least one phosphor layer, the phosphor layer containing a green phosphor represented by the following formula: (AB) (ZnMn) AlOwherein, A is an element selected from Ca, Ba and Sr, B is a rare-earth element, x is a number satisfying 0.0001&#x2266;x&#x2266;0.1, and y is a number satisfying 0.02&#x2266;y&#x2266;0.14.

Display device and green phosphor

A phosphor having a magnetoplumbite-type crystal structure and comprising at least one element selected from B, Si, P, Ge, Ti, V, Ni, Ta, Nb, Mo, W, Yb, Tm and Bi.

Phosphor and device using the same

A reducing agent is discharged by an ink-jet method into a groove between partition walls of a glass substrate formed by sandblasting, that is, a desired region where an electrode is to be formed. After fixing the reducing agent to the glass substrate, the entire substrate is immersed into a plating solution so as to reduce and deposit a plating catalytic metal contained in the plating solution in the region where the reducing agent is fixed. By immersing the entire substrate into an electroless plating solution, a metal is deposited by electroless plating in the region where the plating catalytic metal is deposited. The variation in the shape of electrodes to be formed is reduced, and mass production and low cost are achieved.

Method of forming electrode for flat display panel

A green phosphor represented by the formula: A(ZnMn)AlOwherein A is Ca, Ba or Sr and x is a number satisfying 0.02&#x2266;x&#x2266;0.14.

green phosphor and device using the same

In the present invention, the process of forming the dielectric layer is carried out by laminating a dielectric thin film sheet on a substrate. Alternatively, it is carried out by sealing together a dielectric thin film sheet and the rear-side substrate whilst leaving a discharge gap therebetween. In particular, by using a dielectric thin film sheet to constitute the dielectric layer formed onto the display-side substrate, which must be transparent, the conventional processes of printing and anneling become unnecessary. For this dielectric thin film sheet, a micro-sheet comprising borosilicate glass or soda-lime glass as a principal component is used. This micro-sheet may have a thickness of 5 &mgr;m or less, and it is suitable as a dielectric layer for a plasma display panel.

Plasma display panel and method of manufacturing same

The gas discharge panel according to the present invention includes a pair of substrates, a plurality of barrier ribs, a sealing member, and two gas flow barriers. One of the substrates has a first vent hole and a second vent hole provided in a peripheral portion thereof for intercommunication between the inside and outside of the panel. The at least two gas flow barriers are provided between the sealing member and the barrier ribs located on opposite sides of an arrangement of the barrier ribs so that a gas introduced from the first vent hole flows through inter-rib spaces defined between adjacent pairs of barrier ribs and is expelled from the second vent hole.

Gas discharge panel having gas flow barriers and evacuation method thereof

A cathode device comprising a plurality of emitter tips having conical tip end portions to emit electrons therefrom. A gate electrode layer has an opening through which the tip end portion of each of the emitter tips is exposed. The diameter of the opening in the gate electrode layer is made smaller than that of the portion of the emitter tip at the juncture thereof with the substrate. In the fabrication of the cathode device, an oxide layer is formed at least on the surface of the formed emitter tip to sharpen the latter. By removing the oxide layer, an inner circumferential wall of the opening of the gate electrode layer is formed on the outside of the conical tip end portion of the emitter tip and extends approximately in parallel to the conical tip end portion of the emitter tip.

Cathode device having smaller opening

A method for fabrication of a display device is provided which comprises the steps of: forming an aluminum electrode having a predetermined configuration on a substrate; and treating the aluminum electrode with a solution containing an oxidizing agent to form on a surface of the aluminum electrode a compound film containing as a principal component a substance derived from the solution containing the oxidizing agent.

Display panel having compound film covered electrodes

An electron emitter element is provided which comprises: an insulating base having a gate opening and a slit communicating to the gate opening; an emitter electrode layer formed in the gate opening and the slit on the insulating base; an emitter tip formed in the gate opening on the emitter electrode layer; a gate electrode layer formed on a top surface of the insulating base as circumscribing the gate opening and extending perpendicular to the emitter electrode layer; and the gate electrode layer and the emitter electrode layer being crossed each other with nothing interposed therebetween.

Electron emitter elements, their use and fabrication processes therefor

Display device and fabrication method therefor

A cathode device includes a plurality of emitter tips having conical tip end portions to emit electrons therefrom. A gate electrode layer has an opening through which the tip end portion of each of the emitter tips is exposed. The diameter of the opening in the gate electrode layer is made smaller than that of the portion of the emitter tip at the juncture thereof with the substrate. In the fabrication of the cathode device, an oxide layer is formed at least on the surface of the formed emitter tip to sharpen the latter. By removing the oxide layer, an inner circumferential wall of the opening of the gate electrode layer is formed on the outside of the conical tip end portion of the emitter tip and extends approximately in parallel to the conical tip end portion of the emitter tip.

A field emitter array includes electron-beam source elements, each including a cathode for emitting electrons and a gate provided in the vicinity of the cathode. To emit electrons from the cathode by the field emission effect, a cathode voltage is applied to the cathode and a gate voltage is applied to the gate. An anode is arranged in proximity to the cathode and supplied with a positive anode voltage to capture electrons from the cathode in a first (e.g., normal or display) mode of operation. In a second (e.g., cleaning) mode of operation of the field emitter array, a negative anode voltage is supplied to the anode to urge electrons emitted by a first cathode, back toward a second cathode supplied with a cathode voltage which attracts electrons, to clean the second cathode.

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Kawasaki, Japan

Shinya Fukuta