Fujitsu Corporation

Fujitsu Semiconductor Limited

Shintaro Sato

Daiyu Kondo

Mizuhisa Nihei

Akio Kawabata

Kenjiro Hayashi

Yuji Awano

Taisuke Iwai

Hideyuki Jippo

Hironori Nishino

Motonobu Sato

Naoki Harada

Junichi Yamaguchi

Noriyoshi Shimizu

Naoki Yokoyama

Makoto Takahashi

Masahiro Horibe

Ken-ichi Itoh

Manabu Ohtomo

Mari Ohfuchi

Tsugio Kumai

Hiroko Yamada

Ayaka Yamada

Katsunori Yagi

Kazuki Tanaka

A photo detection element includes: a substrate; a light-receiving layer formed over the substrate, the light-receiving layer including graphene layers and spacer layers that are alternately stacked, light passing through each of the spacer layers, the spacer layers being made of insulating material; a first electrode that is in contact with the light-receiving layer; and a second electrode that is in contact with the light-receiving layer, a material of the second electrode being different from a material of the first electrode.

Photo detection element, optical sensor, and method of manufacturing photo detection element

A graphene nanoribbon precursor having a structural formula represented by a following chemical formula (1), wherein in the following chemical formula (1): n is an integer greater than or equal to 0; X is bromine, iodine or chlorine; and Y is hydrogen or fluorine.

Graphene nanoribbon precursor and method for producing graphene nanoribbon

A photo detection element includes: a substrate; a light-receiving layer formed over the substrate, the light-receiving layer including graphene layers that are stacked such that lattices of the graphene layers are randomly displaced from each other in plan view; a first electrode that is in contact with the light-receiving layer; and a second electrode that is in contact with the light-receiving layer, a material of the second electrode differing from a material of the first electrode.

A gas sensor includes: a semiconductor layer; a graphene film provided above the semiconductor layer and having at least a portion in contact with gas; and a barrier film between the semiconductor layer and the graphene film.

Gas sensor and method of using the same

An electronic device includes, a semiconductor layer, a source region and a drain region provided with the semiconductor layer to be interposed therebetween, a gate insulation film on the semiconductor layer between the source region and the drain region, and a gate of a graphene on the gate insulation film. The gate insulation film induces doping of charges in the graphene.

Electronic device, manufacturing method for electronic device, and electronic apparatus

A Schottky barrier diode includes a graphene nanoribbon, a first electrode connected to one end of the graphene nanoribbon, and a second electrode connected to the other end of the graphene nanoribbon. The graphene nanoribbon includes a first part and a second part which are connected in the length direction of the graphene nanoribbon and which differ in electronic state. For example, edges of the first part in a length direction of the graphene nanoribbon are terminated with a first modifying group and edges of the second part in the length direction of the graphene nanoribbon are terminated with a second modifying group.

Schottky barrier diode and electronic apparatus

An electronic device includes: a nanocarbon material; a pair of electrodes that is electrically connected to the nanocarbon material; a lower layer that is formed under the nanocarbon material and is made of at least one kind of a molecular material having a doping function; and an upper layer that is formed on the nanocarbon material and is made of at least two kinds of molecular materials having doping functions whose polarities are reverse to each other, in which the nanocarbon material constitutes one type selected from among an NPN structure, a PNP structure, an NPPstructure, and a PNNstructure in a region between the pair of electrodes by the lower layer and the upper layer. By this constitution, a highly reliable electronic device including a band gap formed by the molecular materials and using the nanocarbon material as a channel with a relatively simple structure is fabricated.

Electronic device and method of manufacturing the same

A connecting structure includes: a Si substrate; a nanocarbon material formed above the Si substrate; and an electrode electrically connected to the nanocarbon material, wherein a molecular material having a doping function is inserted between the Si substrate and the nanocarbon material. With this configuration, a highly-reliable connecting structure and a method for manufacturing the same are obtained which realize, even though using the nanocarbon material, a sufficiently low contact resistance between the nanocarbon material and the electrode.

Connecting structure and method for manufacturing the same, and semiconductor device

A GNR is a ribbon-shaped graphene film which includes: five or more (for example, five, seven, or nine) six-membered rings of carbon atoms which are bonded and arranged in line in a short side direction; and a complete armchair type edge structure along a long side direction. By such a constitution, without using a transfer method, there are materialized a highly reliable graphene film which has an armchair type edge structure with a uniform width at a desired value and which enables an electric current on-off ratio of 10or more that is practically sufficient for exhibiting a desired band gap.

Method for manufacturing graphine film electronic device

A semiconductor device including a graphene layer and a method of manufacturing the same are disclosed. A method in which graphene is grown on a catalyst metal by a chemical vapor deposition or the like is known. However, the graphene cannot be used as a channel, since the graphene is in contact with the catalyst metal, which is conductive. There is disclosed a method in which a catalyst film () is formed over a substrate (), a graphene layer () is grown originating from the catalyst film (), an electrode () in contact with the graphene layer () is formed, and the catalyst film () is removed.

Semiconductor device and method of manufacturing the same

A gas sensor includes: a channel layer in which a F-terminated GNR, a H-terminated GNR, and a F-terminated GNR whose edge portions are terminated with different modifying groups are bonded to each other; a source electrode formed on one end of the channel layer; and a drain electrode formed on the other end of the channel layer, in which a surface of the H-terminated GNR is exposed, and this exposed portion is a gas sensing part.

Gas sensor and method of manufacturing the same

A transistor includes a channel layer in which a plurality of graphene whose edge portions are terminated with modifying groups different from each other are bonded to each other; a gate electrode formed on the channel layer via a gate insulating film; and a source electrode and a drain electrode formed on the channel layer.

A wiring structure is made up by electrically connecting a via part made up by forming CNTs in a via hole and a wiring part made up of multilayer graphene on an interlayer insulating film via a metal block such as Cu. In the wiring structure using the CNTs at the via part and the graphene at the wiring part, it is thereby possible to obtain the wiring structure with high reliability enabling a certain electrical connection between the CNTs and the graphene with a relatively simple configuration.

Wiring structure and method of manufacturing the same

The graphite structure includes a plurality of domains of graphite where a layer body of graphene sheets is curved in domelike, wherein the plurality of domains are arranged in plane, and the domains adjacent each other are in contact with each other.

Growing community of inventors

Kawasaki, Japan

Shintaro Sato