Micron Technology Incorporated

Shinobu Terada

Takashi Sasaki

Toshiyasu Fujimoto

A semiconductor memory device includes a memory cell region; a memory mat end region; a memory mat including the memory cell region and the memory mat region; a plurality of first silicon regions arranged in the memory cell region; a second silicon region arranged in the memory mat end region; a first conductive layer provided in the memory cell region and the memory mat end region; and wherein upper surface position of the second silicon region in the memory mat end region is higher than the upper surface position of the first silicon region in the memory cell region; and wherein the upper surface position of the first conductive layer in the memory mat end region is higher than the upper surface position of the first conductive layer in the memory cell region.

Growing community of inventors

Higashihiroshima, Japan

Shinobu Terada