Hitachi, Ltd.

Nippon Telegraph and Telephone Corporation

Hitachi Service Engineering, Ltd.

Shinjiro Ueda

Takashi Nagaoka

Seiji Sakagami

Naoyuki Tamura

Manabu Matsumoto

Hideo Nishida

Masami Ito

Takashi Ikeguchi

Yoshihiro Takada

Tadasi Sonobe

Hideaki Kamohara

Masahiro Mase

Toshiaki Kobari

Kazumasa Fujioka

Shinichi Yoshikawa

Kiyokazu Takemura

Yoichi Yoshinaga

Akira Nishiuchi

Takeshi Okawada

Makoto Onishi

Hirofumi Sakurai

Kazue Takahashi

Manabu Edamura

Tadashi Otaka

Hiromi Kobayashi

Nobukatsu Arai

Sumio Okuno

Takao Senshu

Takao Kuroda

Akira Arai

Osami Matsushita

Susumu Yamazaki

Nobuo Tsumaki

Kazuaki Ichihashi

Muneo Mizumoto

Kousuke Noda

Sumio Yamaguchi

Sigeaki Kuroda

Hideki Izumi

Masamichi Hanada

Mamoru Katane

Haruo Mishina

Kazuo Kuroishi

Mineo Takahashi

Takao Takahashi

Kazuaki Nakamori

Yoshitsugu Tsutsumi

Kunihiro Takahashi

Atsuhiko Kuroda

Toa Hayasaka

Toyoki Kitayama

A sewage treatment apparatus includes a membrane separation active-sludge treating section which performs a biological treatment on a part of sewage, which is introduced by a water introducing section while flowing through a sewer trunk line, to generate first treated sewage; a membrane highly treating section which performs a membrane high treatment on the first treated sewage to generate second treated sewage; a membrane treating tank which stores the first treated sewage; a membrane highly treating tank which stores the second treated sewage; water level sensors which respectively measure water level of the membrane treating tank and the membrane highly treating tank; and a power-control section which controls water introducing quantity of the water introducing section on the basis of the water level data measured by the water level sensors.

Sewage treatment apparatus and sewage reuse system

A sewage reuse system distributes a plurality of reuse water supply sections, each including a water introducing opening formed in a sewer trunk line; a treated sewage tank for storing reuse water; and a water level sensor for measuring a water level of the treated sewage tank, in a demand area of reuse water along the sewer trunk line. The system includes a movable sewage treatment section which moves to any of the plurality of water introducing openings; performs the sewage treatment to generate reuse water; and supplies the generated reuse water to the treated sewage tank, a communication section which transmits the water level data measured by the water level sensor, and a central control section which controls a water storing quantity of the treated sewage tank on the basis of the demand information of reuse water and the water level data.

Sewage reuse system

A turbo vacuum pump has a housing provided with a suction port and a discharge port, an evacuation pump disposed in the housing for compressing a gas suctioned through the suction port and discharging the compressed gas through the discharge port, and a motor for driving the evacuation pump, the motor and the evacuation pump having a common rotor. The rotor is supported at its both axial ends by bearings. A spiral grooved dynamic seal is disposed in the vicinity of the suction port and at the opposite side of the suction port to the evacuation pump. The diameter of the spiral grooved dynamic seal, at the smallest, is greater than the outside diameter of the final stage impeller of the evacuation pumps.

Turbo vacuum pump

A compact, easy-to-handle turbo vacuum pump includes a housing having an inlet port and an outlet port; a cylindrical rotor disposed in the housing and having a stepped peripheral surface and a plurality of blades secured to protruding corners of the steps; and a pumping mechanism portion in which a pumping stage is formed by a stator which faces the blades of the rotor across a narrow gap, and in which peripheral pump flow paths are provided in step-like recessions inside the stator. The turbo vacuum pump further includes a rotating shaft which is connected to the rotor and is rotatably supported by a radial gas bearing and a thrust gas bearing; and a motor portion for operating the rotor. Gas sucked in through the inlet port can be discharged into the atmosphere through the outlet port.

A turbo vacuum pump has a housing provided with a suction port and a discharge port, an evacuation pump disposed in the housing for compressing a gas sucked through the suction port and discharging the compressed gas through the discharge port, and a motor for driving the evacuation pump, the motor and the evacuation pump having a common rotor. The rotor is supported at its both axial ends by bearings. A spiral grooved dynamic seal is disposed in the vicinity of the suction port and at the opposite side of the suction port to the evacuation pump. The diameter of the spiral grooved dynamic seal, at the smallest, is greater than the outside diameter of the final stage impeller of the evacuation pump.

An evacuation system in an ultra-high vacuum sputtering apparatus capable of shortening the pumping time of the system. A main pump, composed of a turbo-molecular pump and a baffle is positioned upstream of a main pump and cooled to a temperature in which argon gas is not absorbed and only water is absorbed. The pump and a vacuum chamber are separated by a valve. A pipeline circulates a heating medium to rapidly heat and cool the vacuum chamber for enabling a gas discharge from the vacuum chamber whereby the pumping time can be reduced and the overall production of the system can be increased.

Evacuation system and method therefor

Synchrotron radiation is generated when a base of charged particles is bent by a bending magnet. The synchrotron radiation passes down a lead-out duct as the total number of pumps is limited by the size of the apparatus and many pumps are needed in order to achieve a good vacuum. An ion pump has a main magnetic field, normally generated by a magnet of the ion pump which controls the behavior of the electrons in the ion pump. However, the leakage magnetic field of the bending magnet affects the ion pump, and therefore the ion pump is arranged so that its main magnetic field is aligned with the leakage magnetic field at the ion pump, or at least with a main component thereof. In this way, the effect of the leakage magnetic field on the ion pump is reduced. Indeed, it is possible to use the leakage magnetic field as the main magnetic field of the ion pump.

Synchrotron radiation generation apparatus

A synchrotron radiation source and a method of making the same. As assembly of a beam absorber for absorbing synchrotron radiation beams and a piping for cooling the beam absorber is mounted in a charged particle beam duct of a bending section of the synchrotron radiation source for bending a charged particle beam. Fixed to at least one straight duct that is connectable to either of the opposite ends of the charged particle beam duch is a piping guide duct through which the beam absorber cooling piping is drawn to the outside, so that the assembly of the beam absorber and the beam absorber cooling piping can readily be mounted in the synchrotron radiation source.

Synchrotron radiation source and method of making the same

An analysis system in which air in a specimen exchange chamber is evacuated by an oil-sealed rotary vacuum pump and which employs electron incorporates a purge gas supply means at the inlet side of the oil-sealed rotary vacuum pump. The purge gas supply means supplies a small quantity of purge gas when the air in the specimen exchange chamber is evacuated to the almost ultimate pressure of the pump.

Apparatus for analysis employing electron

According to the turbo molecular pump of the present invention, a regenerative pump is constructed by arcuate eddy current grooves having a predetermined angle with respect to the surface of the outer periphery of a rotor and which are circumferentially engraved in array in the rotor and an arcuate ventilating channel engraved in the circumferential direction in a stator, and a partition is defined in the stator circumferentially partitioning the ventilating channel, so that the working range on the low vacuum side may be extended.

Turbo molecular pump

In a molecular beam epitaxy apparatus, the loading chamber for introducing the substrates is made separable from both the preparation chamber for cleaning the substrates and the growth chamber for forming thin films onto the respective substrates, so that the evacuation of the loading chamber is possible even when the loading chamber is separated from the apparatus, thus improving the productivity thereof.

Apparatus for manufacturing semiconductors

A rotary substrate holder of a molecular beam epitaxy apparatus including leads-cum-posts serving both as leads for passing a current to a heater for heating a substrate and as posts for supporting the heater. By this arrangement, heat transferred from the heater to a bearing disposed in the vicinity of the heater is minimized in amount, thereby prolonging the service life of the holder and minimizing a heat loss thereof.

Rotary substrate holder of molecular beam epitaxy apparatus

A turbomolecular pump including a casing stationary blades arranged in a plurality of stages in the casing axially thereof, rotating blades arranged between the stationary blades and located on an outer periphery of a rotor located in a central portion of the casing, and a bearing device journaling the rotor at its high vacuum and end a low vacuum end. A first permanent magnet of the fixed side having a high Curie point and a second permanent magnet of the rotor side located in juxtaposed relation to the first permanent magnet constitute a magnetic bearing of an attraction type for journaling the rotor at its high vacuum end. A pivot type hydrodynamic bearing or active magnetic bearings journal the rotor at its low vacuum end.

Turbomolecular pump

A centrifugal blower including a casing formed with a discharge port and a suction port, and an impeller mounted in the casing and having a plurality of backwardly curved vanes arranged circumferentially of the impeller. The suction port has a semicircular suction member located in spaced juxtaposed relation to a semicircular curled portion formed at the forward end of a shroud of the impeller. An annular guide plate may be attached to the inner side of the suction member and formed at its open end with a wall portion disposed along the shroud which is formed at its forward end with an annular wall extending into a space defined between the suction member and the guide plate. Hair may be provided on one of opposed wall surfaces of the suction member and the annular wall of the shroud.

Blower

A vaneless diffuser disposed on the outer periphery of an impeller of a centrifugal compressor and including a pair of opposed diffuser plates of a disk shape defining therebetween a fluid channel is formed with a plurality of guide vanes extending from the inlet of the diffuser to its outlet. The guide vanes which are disposed on at least one of the pair of diffuser plates and extend immediately from the outlet of the impeller in the direction of flow of a fluid through the fluid channel has a height smaller than one-half the width of the fluid channel and gradually decreasing in going from the inlet of the diffuser toward its outlet.

Diffuser of centrifugal fluid machine

Growing community of inventors

Abiko, Japan

Shinjiro Ueda