Hitachi, Ltd.

Shinjiro Katagiri

Keizo Suzuki

Hidemi Koike

Sadayuki Okudaira

Ken Ninomiya

Shigeru Nishimatsu

Noriyuki Sakudo

Osami Okada

Morioki Kubozoe

Shoji Kamimura

Yoshihisa Minamikawa

Koji Nishiwaki

Teiji Katsuta

Minoru Shinohara

The microwave plasma source of this invention comprises a vacuum room which forms a discharging space with discharge gas introduced therein, a means for conducting the microwave to the discharging space so that the microwave electric field is provided in the discharging space, and a means for providing the magnetic field in the discharging space located on the microwave propagating path and made up of a permanent magnet which virtually propagates the microwave.

Microwave plasma source

A plurality of band-shaped regions on a specimen are successively scanned by an electron beam having a ribbon-shaped rectangular cross-section. This scanning is effected by deflecting the electron beam electrostatically in the direction of the shorter side of the beam cross-section and electromagnetically in the direction of the longer side of the beam cross-section.

Electron beam scribing method

An electron beam emitted from an electron beam source is applied to a sample and when it produces an magnified image of the sample on a fluorescent plate, the amount of the electron beam is detected. When the accumulation of the electron beam radiation reaches a predetermined value with lapse of the time, the beam density on the surface of the sample is so controlled as to be reduced to zero or below a certain preset level, whereby the sample is prevented from damage due to excessive exposure to the electron beam.

Electron microscope

A specimen chamber is which a specimen to be irradiated by an electron beam is arranged is evacuated by an evacuation device. The evacuation device includes a nonvaporative bulk getter vacuum pump and an oil rotary pump. The oil rotary pump is used for evacuating the specimen chamber from the atmospheric pressure to 10.sup.-1 - 10.sup.-2 Torr, while the nonvaporative bulk getter vacuum pump is used for continuously evacuating the specimen chamber to 10.sup.-5 - 10.sup.-6 Torr. The steady vacuum of 10.sup.-5 - 10.sup.-6 Torr is maintained by only the nonvaporative bulk getter vacuum pump.

Apparatus for irradiating a specimen by an electron beam

An electron beam from an electron gun is made to focus on a first position by a focussing lens system. The focussed beam is then magnified and projected on a screen through a magnification lens system having an objective lens, an intermediate lens and a projection lens. The excitation is so variable that the electron beam may be focussed also on a second position behind the projection lens. A specimen is positioned at the first position for normal electron microscope analysis, while, for a scanning electron microscope analysis, another specimen is put at the second position.

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Mito, Japan

Shinjiro Katagiri