Kao Corporation

Shinji Yano

Akira Kawamata

Genji Imokawa

Katsumi Kita

Naotake Takaishi

Takashi Komori

Shuichi Akazaki

Yoshiaki Fujikura

Takeshi Ihara

Tsuyoshi Ohtomo

Yoshihiro Minematsu

Mitsuko Zama

Yukihiro Ohashi

Munehisa Okutsu

Junichi Fukasawa

Yasuyuki Fujii

Hisakazu Furugaki

Mituo Suda

Eiko Tamura

Minehiro Okuda

Shinji Ishikawa

Hironori Kawasaki

Takashi Mizooku

Michihiro Hattori

Akira Akaogi

The present invention discloses phosphoric triesters represented by formula (1):

Phosphoric triesters and external compositions containing the same

A novel fluorine-containing compound having functions corresponding to those of fluorine is provided, which is stable under various conditions, excellent in compatibility with other solvents, and can be widely utilized as solvents, cosmetics, detergents, emulsifiers, surface finishing agents, lubricants, as well as lubricants or oils in the field of semiconductor/electronics. That is, the present invention provides fluorine-containing ether compounds represented by the general formula (1):

Fluorine-containing ether compound

Fluorine-containing ether compound and gelling agent containing the same

Polyvalent metal salts of phosphoric diester and organo(poly)siloxanes

Phosphoric esters (mono-, di- or triester) is useful as, for example, a cleaner, an emulsifier, an antistatic agent, metal-chelating agent and a lubricant for fibers. It is produced at a high yield while completely trapping the hydrogen chloride gas formed as a by-product. The reaction between a phosphorus oxyhalide and an organic hydroxyl compound to produce a phosphoric ester is effected in the presence of a metal salt of an acid having a pKa of from -5 to 13.

Process for producing phosphoric esters

Organo(poly)siloxane modified with phosphoric ester and process for

Phosphoric diesters having formula (1): ##STR1## wherein R.sup.1 is an acyl group having at least one phenyl group; R.sup.2 is a C.sub.2-12 linear or branched alkylene group which may optionally be inserted with an oxygen atom between carbon atoms thereof; L is a C.sub.2-40 linear or branched alkyl group which may optionally be inserted with an oxygen atom between carbon atoms thereof or the group R.sup.1 -O-R.sup.2 ; M is a hydrogen atom, an alkali metal ion, a metal ion of di- or higher valence, an ammonium group, an alkanolammonium group having 2 to 14 carbon atoms, C.sub.1-14 alkylammonium group; and n is the valence of M are useful UV absorbing compounds. The phosphoric diesters remain on the skin for long periods of time and exhibit lasting UV shielding effects. The compounds and the cosmetic compositions containing the compounds are very safe to the skin.

Phosphoric diesters which absorb UV rays, method of preparing the same,

An amide derivative represented by the following general formula (II): ##STR1## (wherein R.sup.3 represents a straight-chain or branched, saturated or unsaturated hydrocarbon group carrying 10 to 40 carbon atoms; R.sup.4 represents a straight-chain or branched hydrocarbon group carrying 3 to 39 carbon atoms; and R.sup.5 represents a hydrogen atom, a straight-chain or branched, saturated or unsaturated hydrocarbon group carrying 10 to 40 carbon atoms or an acyl group); and a dermatologic preparation containing the same.

Amide derivatives and dermatologic preparations containing the same

An amide derivative represented by the following general formula (I) or (II): ##STR1## (wherein R.sup.1 and R.sup.2 represent each a straight-chain or branched, saturated or unsaturated hydrocarbon group provided that one of them carries 26 to 39 carbon atoms while the other carries 9 to 39 carbon atoms); or ##STR2## (wherein R.sup.3 represents a straight-chain or branched, saturated or unsaturated hydrocarbon group carrying 10 to 40 carbon atoms; R.sup.4 represents a straight-chain or branched hydrocarbon group carrying 3 to 39 carbon atoms; and R.sup.5 represents a dydrogen atom, a straight-chain or branched, saturated or unsaturated hydrocarbon group carrying 10 to 40 carbon atoms or an acyl group); and a dermatologic preparation containing the same.

An external skin care preparation comprising a compound represented by the following general formula (I) or (II), or a salt thereof: ##STR1## wherein R.sup.1 means an aliphatic hydrocarbon group having 9-25 carbon atoms, A and B denote specific groups respectively, R.sup.6 and R.sup.7 are individually an aliphatic hydrocarbon group having 10-26 carbon atoms, and R.sup.8 denotes a group --CH.sub.2 CH.sub.2 OH, --CH.sub.2 COOH, or --COCH.sub.3.

External skin care preparation

An external skin care preparation comprising a compound represented by the following general formula (I) or (II), or a salt thereof: ##STR1## wherein R.sup.1 means an aliphatic hydrocarbon group having 9-25 carbon atoms, A and B denote specific groups respectively, R.sup.6 and R.sup.7 are individually an aliphatic hydrocarbon group having 10-26 carbon atoms, and R.sup.8 denotes a group --CH.sub.2 CH.sub.2 OH, --CH.sub.2 COOH or --COCH.sub.3.

An external medicament comprises a novel amide derivative represented by the following formula (I). ##STR1## The external medicament is applicable to both a pharmaceutical external medicament and a cosmetic composition, and it provides excellent improving and preventing effects for chapping of the skin.

Amide derivative and external medicament comprising same

Growing community of inventors

Naga-gun, Japan

Shinji Yano