Sony Corporation

Shinji Omori

Shigeru Moriya

Yoshihito Hayashi

Yoichi Katsumoto

Marcaurele Brun

Kazumasa Sato

Ikuya Oshige

Kaoru Koike

Kenzo Machida

Tomoyuki Umetsu

Yoko Watanabe

Seungmin Lee

Isao Ashida

Kaori Kawaguchi

Aya Murata

Yoshito Hayashi

Shinichiro Nohdo

To provide a system capable of evaluating a deficiency and/or a lowered function of extrinsic coagulation factors or intrinsic coagulation factors with high sensitivity by adding new procedures and apparatuses to a blood coagulation system analysis procedure, an apparatus, or the like. A blood coagulation system analysis system includes a blood coagulation system measurement apparatus that performs blood coagulation system measurement of a blood sample; and a blood coagulation system analysis apparatus including a coagulation parameter extraction unit that extracts a coagulation parameter from a measurement result by the blood coagulation system measurement apparatus, and a blood coagulation evaluation unit that evaluates a level of blood coagulation of the blood sample on the basis of the coagulation parameter, the measurement by the blood coagulation system measurement apparatus being performed under an extrinsic system acceleration condition and an intrinsic system acceleration condition.

Blood coagulation system analysis system, blood coagulation system analysis method, and blood coagulation system analysis program

Disclosed are a blood coagulation system examination module, a blood coagulation system examination system, and a blood coagulation system examination method, all of which enable to simply and easily measure thrombin potential with a whole blood sample. The blood coagulation system examination module includes a thrombin potential examination unit configured to examine thrombin potential on the basis of an electrical property of blood as measured at a specific frequency and predetermined time intervals in a predetermined period after reversal of an anticoagulation action working on the blood.

Blood coagulation system examination module, blood coagulation system examination system, blood coagulation system examination method, and determination method of parameter for blood coagulation system examination module

A flow channel device, a complex permittivity measuring apparatus, and a dielectric cytometry system are provided which can improve the measurement accuracy. A constriction portion having a constricted space is disposed between an inflow port and an outflow port of a flow channel. Electrodes are arranged between the inflow port and the constriction portion and between the outflow port and the constriction portion. The conductance of the constriction portion at a low-limit frequency is less than the combined conductance of an inflow channel portion and an outflow channel portion. The capacitance of the constriction portion at a high-limit frequency is less than the combined capacitance of the inflow channel portion and the outflow channel portion.

Flow channel device, complex permittivity measuring apparatus, and dielectric cytometry system

There is provided a microparticle analysis apparatus including a sample channel configured to receive liquid containing a plurality of microparticles, a first pair of electrodes configured to form an alternating electric field in at least a part of the sample channel, a measuring part configured to measure impedance between the first pair of electrodes, an analyzing part configured to calculate property values of the microparticles from the impedance measured in the measuring part, and a determining part configured to determine whether data of the impedance measured in the measuring part is derived from the microparticles.

Microparticle analysis apparatus and microparticle analysis system

A transmission line substrate includes at least an insulating layer of a predetermined thickness, a pair of conductor layers arranged in a state of being opposed to each other such that the insulating layer is interposed between the conductor layers, the pair of conductor layers functioning as a high-frequency transmission line, and a fault part formed so as to make the conductor layer on one side disconnected, into which a sample to be measured can be introduced.

Transmission line for dielectric measurement and dielectric measuring device having the transmission line

A blood coagulation analysis device and method in which information relating to the coagulability of blood is evaluated based on a change generated in a permittivity measured in a coagulation process of the blood due to addition of a substance that activates or inactivates platelets to the blood.

Blood coagulation system analyzing method and blood coagulation system analyzing device

Disclosed herein is a dielectric cytometric apparatus capable of analyzing cells and sorting the cells without adopting an optical analysis method and provides a dielectric cytometric cell sorting method for the apparatus. A stenosis channel allowing a single cell to flow is created on a cell injection section of a micro flow channel device used as a portion of the dielectric cytometric apparatus. A pair of measurement electrodes is created on the stenosis channel and an analyzer connected to the measurement electrodes measures the complex dielectric constant of for every cell passing through the stenosis channel. A electric-field application section provided on the downstream side of the stenosis channel applies an electric field for changing the flow of the cells inside a flow channel on the basis of information on the measured complex dielectric constants so that the cells can be sorted by making use of branch channels.

Dielectric cytometric apparatus and dielectric-cytometric cell sorting method

A blood coagulation system analyzing method includes acquiring information relating to the coagulability of blood based on a change generated in a complex permittivity spectrum measured in a coagulation process of the blood due to addition of a substance that activates or inactivates platelets to the blood.

Disclosed herein is a system for detecting interaction between substances includes a reaction field for allowing the interaction to proceed between the substances, and a voltage application section for applying a voltage to a working electrode arranged facing the reaction field such that a predetermined electrodynamic effect is given to the reaction field. The voltage application section is provided with a section for superimposingly applying two sinusoidal voltages of different frequencies to generate a beat. Also disclosed herein is a method for detecting interaction between substances in a procedure of allowing the interaction to proceed between the substances by making use of a predetermined electrodynamic effect, the method includes the step of applying two sinusoidal voltages of different frequencies superimposingly to generate a beat such that an electrochemical reaction is suppressed in a reaction field where the interaction is allowed to proceed.

System and method for detecting interaction between substances by superimposingly applying sinusoidal voltage

To provide a mask able to prevent a drop in pattern position accuracy due to the influence of internal stress of a membrane and able to align patterns including complementary divided patterns precisely, a method of producing the same, and a method of producing a semiconductor device. A stencil mask having lattice-shaped struts formed by etching a silicon wafer on four regions of a membrane wherein the lattices are offset from each other in the four regions and all of the struts are connected to other struts or the silicon wafer around the membrane (frame), a method of producing a stencil mask, and a method of producing a semiconductor device.

Mask, method of producing mask, and method of producing semiconductor device

To provide an exposure apparatus and an exposure method able to correct an image-placement error during an exposure which is unable to decrease only by correcting electron beam description data of a mask pattern, and a semiconductor device manufacturing method used the same, wherein an image placement Rof a mask is measured at an inversion posture against an exposure posture (ST), the measured image placement Ris corrected with considering a pattern displacement caused by gravity at the exposure posture and a first correction data &#x394;is prepared based on a difference of the corrected image placement and a designed data (ST), and an exposure is performed by deflecting charged particle beam to correct a position of a pattern to be exposed to a subject based on the first correction data &#x394;(ST).

Exposure device, exposure method, and semiconductor device manufacturing method

A complementary division method able to suppress a pattern deformation by wet washing, having the steps of determining a definite division length able to suppress the pattern deformation when wet washing to a width and distance of a pattern that is assumed the pattern deformation over an elasticity limit is easiest given by wet washing in advance, dividing the entire line-and-space patterns at the determined division length in the longitudinal direction to divide suitably the line-and-space pattern by a simple algorithm, and further providing a method of producing a mask and program.

Complementary division mask, method of producing mask, and program

A method of generating mask distortion data capable of improving accuracy of distortion measurement, an exposure method using the same and a method of producing a semiconductor device, wherein a production mask is produced by a first thin film formed with a predetermined pattern, and a positional accuracy measurement mask is produced by forming second positional accuracy measurement marks at substantially same positions as those of the first positional accuracy measurement marks on a mask blanks having a second thin film, positions of the second positional accuracy measurement marks and third positional accuracy measurement marks of the positional accuracy measurement mask are measured, a correlation function of the both are calculated, positions of the first positional accuracy measurement marks of the production mask are measured, and mask distortion data on the first thin film of the production mask is generated by using the correlation function.

Growing community of inventors

Tokyo, Japan

Shinji Omori