Nec Corporation

Glory Ltd.

Japan Science and Technology Agency

Asahi Kasei Chemicals Corporation

Tokuyama Corporation

Panasonic Electric Works Co., Ltd.

Sii Nanotechnology Inc.

Shinji Matsui

Shinji Matsuura

Hajime Morino

Toshio Numata

Kenichiro Tanaka

Mitsuo Yamashita

Tomoji Kawai

Kazuhiro Obae

Masao Kubo

Hitoshi Tabata

Hiroshi Fukshima

Yukinori Ochiai

Jun-ichi Fujita

Susumu Asada

Akira Inoue

Masayuki Kakizawa

Mikio Masui

Shinya Omoto

Shoko Manako

Hideki Umekawa

Toshihito Ohtake

Katsumi Mori

Ken-ichiro Nakamatsu

Ken-Ichiro Nakamatsu

Kubo Masao

Inoue Akira

Masui Mikio

Yukinori c/o Nec Corporation Ochiai

Jun-Ichi c/o Nec Corporation Fujita

Masahiko c/o Nec Corporation Ishida

Takashi c/o Seiko Instruments Inc Kaito

This cellulose powder has: an average degree of polymerization of 100 to 350; a weight average particle size of over 30 &#x3bc;m, but less than 250 &#x3bc;m; an apparent specific volume of 2 to less than 15 cm/g; and a particle size distribution sharpness of 1.5 to 2.9.

Cellulose powder

A method for performing micro fabrication includes using, as a photomask, a self-organizing material-patterned substrate which is soluble in an organic solvent. A method for emitting light includes emitting the light in a pattern of a nucleic acid which is a self-organizing material immobilized on a self-organizing material-patterned substrate. An immobilization layer containing a binding material capable of binding to a self-organizing material is formed on a substrate. Then this immobilization layer is patterned by transferring a protrusion and recess pattern formed in a mold thereto by the imprint process. The self-organizing material is supplied onto the side having the protrusion and recess pattern of the immobilization layer transferred thereto. Thus, the self-organizing material is immobilized according to the protrusion and recess pattern of the immobilization layer owning to the self-organizing ability of the material per se and the binding ability of the binding material contained in the immobilization layer.

Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and photomask using patterned substrate of self-organizing material

The present invention provides a method for manufacturing a silicon substrate having texture structure, by which, in comparison with conventional methods, it is possible to reduce manufacturing step and form easily regular texture structure on silicon substrate surface. The method of the present invention comprises the steps of: (A) forming a pattern on the silicon substrate using a resin-comprising composition; (B) irradiating an etching gas to the silicon substrate surface other than the pattern portion; and (C) processing the silicon substrate irradiated with the etching gas with an alkaline etching fluid to form concave structure under the pattern portion. Furthermore, the present invention provides a resin-comprising composition usable in the method, in particular, a composition comprising photo-curable resin.

Method for manufacturing silicon substrate having textured structure

The present invention relates to a bill discriminating and counting apparatus having a function in which two operators can commonly operate the one apparatus. That is, two pairs of a process instruction button for instructing start/stop of a discriminating and counting process and an approval button for approving counting result are provided, two independent storage areas are provided in a storage area in which the counting result is stored, the counting result is stored in the corresponding storage area while each storage area is associated with the pair of the process instruction button and the approval button, and two operators can commonly use the one bill discriminating and counting apparatus by providing occupation switching means for switching an occupation state of the bill discriminating and counting apparatus and occupation state display means for displaying a current-occupation state.

Bill discriminating and counting apparatus

The present invention relates to a bill discriminating and counting apparatus including a display section which can perform display written in plural languages. The bill discriminating and counting apparatus includes a second storage area in which display data of a mother language can be written in addition to a first storage area in which data for the display written in commonly-used English is stored, and the display written in the mother language can be performed by writing the display data written in the mother language in the second storage area in the country where the bill discriminating and counting apparatus is used.

According to the present invention, pieces of data of states of sensors and actuators in a bill discriminating and counting apparatus are stored in a ring memory at constant time intervals, among these stored data, both the data involved in an error are associated with the error events and stored in a non-volatile memory or a hard disk when the error is occurred in the bill discriminating and counting apparatus, and then the data is read from the non-volatile memory or hard disk to analyze the error. Specifically, digital port input and output information (states of sensors and actuators), analog sensor voltage, and analog motor current value are stored in a memory at constant time intervals since the power is turned on or the counting is started, and the stored port information and voltage are stored in the non-volatile memory or the like along with contents of abnormality when the abnormality is occurred.

A production method for producing a light-emitting devicein which a light-emitting layer at least comprised of a n-type substrate bearing layerand a p-type substrate bearing layeris layered on a transparent crystal substrateis provided with a step of forming a transfer layeron at least a part of the transparent crystal substrateor the light-emitting layer, which transfer layeris softened or set upon supplying an energy thereto; a step of pressing a moldformed with a minute unevenness structureagainst the transfer layerto transfer the minute unevenness structureto an outer surface of the transfer layer, and a step of forming a minute unevenness structurefor preventing multiple reflection based on the minute unevenness structuretransferred to the transfer layer

Method for producing a light emitting device

A micro three-dimensional structure capable of producing a micro three-dimensional structure (micrometer-to nanometer-order outer shape) having a complicated structure, a production method therefor and production device therefor are provided. In the production method for the micro three-dimensional structure, performed are the step of irradiating a focused ion beam ( ) to a sample ( ) while supplying a material gas ( ) to form a first-layer deposit ( ), the step of releasing secondary electrons ( ) from the first-layer deposit ( ) hit by ions to allow the secondary electrons ( ) to form a terrace ( ) on the first-layer deposit ( ), a step of deflecting the focused ion beam ( ) in a desired direction of the terrace ( ) based on a set amount from a focal position controlling apparatus, a step of forming a second-layer deposit ( ) in a deflected position on the terrace ( ) based on the deflection amount, and a step of repeating the above steps to form a set micro three-dimensional structure.

Micro three-dimensional structure, production method therefor and production device therefor

The method for forming a fine pattern on a substrate disclosed includes a step of preparing a hologram having a pattern, a step of irradiating material waves (de Broglie waves) such as neutral beams, ion beams and electron beams on the hologram, and a step of imaging the pattern on the substrate with the material waves being interfered by passing through the hologram. The light source has a source that emits a beam having a coherent wave front. Since the fine patterns are formed by utilizing the interference of material waves, the minimum processing precision can be enhanced to the extent of the wavelength of the material wave.

Method and system for forming fine patterns using hologram

In a nanometer order dot pattern producing method and drawing apparatus by electron holography, a nanometer order dot pattern is readily produced with a high accuracy, using a pair of biprisms or multi-biprisms integrated as a unit so as to mutually cross. Each multi-biprism includes a plurality of biprisms arranged in parallel. Electric potentials of the integrated biprisms or multi-biprisms are independently controlled.

Method for producing nanometer order dot pattern by electron holography

A film of an element is deposited on a semiconductor substrate by passing on the substrate gas containing the element and then irradiating a predetermined portion of the substrate with an electron beam. Then, the gas is decomposed to deposit the element on the substrate so as to form a pattern. By heating the pattern, the element is diffused into the surface of the substrate thus forming a diffused region. The gas is generated by sublimating solid Cr(C.sub.6 H.sub.6).sub.2, Mo(C.sub.6 H.sub.6).sub.2, Mo(C.sub.6 H.sub.6).sub.2, Al(CH.sub.3).sub.3, WCl.sub.6 etc.

Method for forming thin films by absorption

Growing community of inventors

Himeji, Japan

Shinji Matsui