Oki Electric Industry Co., Ltd.

International Superconductivity Technology Center

The Chugoku Electric Power Co., Inc.

Hokkaido Electric Power Company, Inc.

Mitsubishi Materials Corporation

Mitsubishi Metal Corporation

Shinji Kawamoto

Hiromi Takahashi

Hideyuki Kondo

Norio Homma

Tadataka Morishita

Tadataka Horishita

A process for forming a thin oxide film on an underlying surface adapted for film formation thereon according to a radio frequency magnetron sputtering method using an oxide target(s). The excitation frequency is a frequency which is higher than 13.56 MHz and which provides a negative target self-bias voltage permitting of film formation.

Process for forming thin oxide film

A process for forming a thin oxide film on an underlying surface adapted for film formation thereon according to a radio frequency magnetron sputtering method using an oxide target(s). The excitation frequency is higher than 13.56 MHz and provides a lower negative target self-bias voltage permitting improved film formation.

Growing community of inventors

Tokyo, Japan

Shinji Kawamoto