Tdk Corporation

Fujitsu Optical Components Limited

Shinji Iwatsuka

Kenji Sasaki

Hiroki Hara

Kenjiro Hata

Masaharu Doi

Yoshinobu Kubota

Kenji Endou

Yasuhiro Ohmori

Shintaro Takeuchi

Satoshi Shirai

Masaaki Kobayashi

Takashi Kikukawa

Toshinori Matsuura

Yoshikazu Narumiya

Makoto Endo

Takehito Tanaka

Makoto Nakazawa

Kazuhito Yamasawa

Masanori Goto

Hiroshi Take

Kenji Nagase

Anthony Reymund Melad Binarao

Cheng Bu Heng

Makoto Sekijima

Seiichi Takayama

Naoki Hanashima

Yoshihiko Yoshida

Masamichi Taniguchi

Yoichi Kanagawa

Atsushi Ooido

An optical modulator includes a plurality of optical modulation units having a Mach-Zehnder type optical waveguide consisting of two optical waveguides and a high-frequency line pair arranged along the two optical waveguides and consisting of two signal electrodes for applying a pair of differential high-frequency signals, and a plurality of high-resistance conductive films are provided between adjacent high-frequency line pairs separated from the high-frequency line pair.

Optical modulator

To provide an optical modulation element capable of suppressing electrode loss at a low frequency of 50 GHz or less, and suppressing radiation loss at a high frequency of 50 GHz or more. An optical modulation element comprises: a substrate; and at least one interaction part provided on the substrate. The interaction part includes: first and second optical waveguides formed adjacent to each other on the substrate; and first and second signal electrodes provided so as to oppose the first and second optical waveguides respectively. o ground electrode is provided in a nearby region of the interaction part, and a ground electrode is provided in the vicinity of at least one of an input part and a terminal part electrically connected to each of the first and second signal electrodes.

Optical modulation element

To provide an optical modulation element whereby reduced drive voltage and suppression of DC drift can be obtained at the same time. An optical modulation element includes: a substrate; and an optical waveguide formed of an electrooptic material film formed on the substrate and having a ridge part which is a protruding portion, and a slab part having a smaller film thickness than the ridge part. The optical waveguide includes a first waveguide part having a first ridge width and a first slab film thickness and to which an RF signal is applied, and a second waveguide part having a second ridge width and a second slab film thickness different from the first slab film thickness and to which a DC bias is applied.

An optical waveguide element includes: an optical waveguide having a ridge part and a slab part having a thickness less than the ridge part. The optical waveguide includes: a first waveguide having a first ridge with and a first slab film thickness; a second waveguide having a second ridge width and a second slab film thickness; a first intermediate waveguide connected to the first waveguide and having a third ridge width and the first slab film thickness; and a second intermediate waveguide connected to the second waveguide and having a fourth ridge width and the second slab film thickness. The first waveguide, the first intermediate waveguide, the second intermediate waveguide, and the second waveguide are arranged in this order; the second slab film thickness is larger than the first slab film thickness; and the third ridge width is larger than the fourth ridge width.

Optical waveguide element and optical modulation element

An optical modulator includes: a substrate; a waveguide layer including first and second optical waveguides formed of an electro-optic material film on the substrate to have a ridge shape and to be disposed adjacent to each other; an RF part that applies a modulated signal to the optical waveguides; and a DC part that applies a DC bias to the optical waveguides. The DC part includes: a buffer layer covering at least upper surfaces of the optical waveguides; a first bias electrode opposed to the first optical waveguide through the buffer layer; and a second bias electrode provided adjacent to the first bias electrode. A first DC bias voltage is applied between the first and second bias electrodes. A waveguide layer removal area in which at least part of the waveguide layer is removed is provided at least under an area between the first and second bias electrodes.

An optical modulator includes: first and second optical waveguides formed of an electro-optic material film on a substrate so as to have a ridge shape and to be disposed adjacent to each other; a buffer layer covering at least the upper surfaces of the first and second optical waveguides; and first and second signal electrodes provided above the buffer layer. The first and second signal electrodes have, respectively, first and second lower layer parts opposite, respectively, to the first and second optical waveguides through the buffer layer; and first and second upper layer parts provided, respectively, above the first and second lower layer parts. Widths of the lower surfaces of the first and second lower layer parts are smaller than widths of the first and second upper layer parts.

An electro-optic device is provided with a substrate, an optical waveguide formed of a lithium niobate film with a ridge shape on the substrate, and an electrode that applies an electric field to the optical waveguide. The optical waveguide includes a first waveguide section provided at least in an electric field application region applied with the electric field and having a thickness of 1 &#x3bc;m or larger and a second waveguide section provided in a region other than the electric field application region and having a thickness of 0.3 &#x3bc;m or larger and less than 1 &#x3bc;m.

Electro-optic device

An electro-optic device is provided with a Mach-Zehnder optical waveguide including at least one linear section and at least one curved section and a differential RF signal electrode provided along the Mach-Zehnder optical waveguide. Optical input/output ports of the Mach-Zehnder optical waveguide are provided at one end side in a first direction in which the linear section extends. The differential RF signal electrode is provided in both the linear and curved sections.

An optical modulator is provided with a ridge-shaped optical waveguide formed of a dielectric thin film having electro-optic effect, a buffer layer covering the optical waveguide, a signal electrode formed on the buffer layer so as to be opposed to the optical waveguide through the buffer layer; a ground electrode formed on the buffer layer together with the signal electrode, and a dielectric film having a higher dielectric constant than air and covering at least a part of exposed surfaces of the signal electrode and ground electrode and exposed surfaces of the buffer layer.

An optical modulator is provided with a substrate, first and second optical waveguides each formed of a ridge-shaped electro-optic material film and disposed so as to be mutually adjacent on the substrate, a buffer layer covering upper surfaces of the first and second optical waveguides, first and second signal electrodes provided above the buffer layer so as to be opposed respectively to the first and second optical waveguides, and a dielectric layer covering at least one of a part of an exposed surface of the first signal electrode and a part of an exposed surface of the second signal electrode, and a part of an upper surface of the buffer layer. Differential signals are applied to the first and second signal electrodes.

An object of the present invention is to provide a single drive type optical modulator having good high-frequency characteristics and reduced wavelength chirp of the modulated light. An optical modulatoris provided with a Mach-Zehnder optical waveguideincluding first and second optical waveguides, a buffer layercovering the first and second optical waveguides, and an electrode layerincluding first and second ground electrodesand a signal electrodepositioned between the first and second ground electrodesin a plan view, the signal electrodehas a first lower surface Scovering the first optical waveguidethrough the buffer layer, the first ground electrodehas a first lower surface Scovering the second optical waveguidethrough the buffer layerand a second lower surface Spositioned above the first lower surface S, and a gap Gbetween the signal electrodeand the second ground electrodeis larger than a gap Gbetween the signal electrodeand the first ground electrode

A dielectric thin film-applied substrate that suppresses occurrence of cracks when the film thickness of the lithium niobate film is equal to or larger than 1 &#x3bc;m. The dielectric thin film-applied substrate includes a single crystal substrate and a dielectric thin film made of c-axis oriented lithium niobate epitaxially formed on a main surface of the single crystal substrate. The dielectric thin film has a twin crystal structure including first and second crystals 180&#xb0; apart, centered on the c-axis. In pole figure measurement by X-ray diffraction, the ratio between a first diffraction intensity corresponding to the first crystal and a second diffraction intensity corresponding to the second crystal is equal to or higher than 0.5 and equal to or lower than 2.0, which alleviates distortions accumulated inside the lithium niobate film and supresses occurrences of cracks accompanying increases in the film thickness.

Dielectric thin film-applied substrate and optical modulation element using the same

A single drive type optical modulator has good high-frequency characteristics and reduced wavelength chirp of the modulated light. An optical modulator is provided with a Mach-Zehnder optical waveguide including first and second optical waveguides, a buffer layer covering the first and second optical waveguides, and an electrode layer including first and second ground electrodes and a signal electrode positioned between the first and second ground electrodes in a plan view. The signal electrode has a first lower surface covering the first optical waveguide through the buffer layer, the first ground electrode has a first lower surface covering the second optical waveguide through the buffer layer and a second lower surface positioned above the first lower surface, and a gap between the signal electrode and the second ground electrode that is larger than a gap between the signal electrode and the first ground electrode.

Disclosed herein is an optical waveguide element that includes a substrate and a waveguide layer formed on the substrate and comprising lithium niobate. The waveguide layer has a slab part having a predetermined thickness and a ridge part protruding from the slab part. The maximum thickness of the slab part is 0.05 times or more and less than 0.4 times a wavelength of a light propagating in the ridge part.

Growing community of inventors

Tokyo, Japan

Shinji Iwatsuka