Tokyo Electron Limited

Shinichi Sagara

Yasuhiro Kuga

Yukinobu Otsuka

Shinsuke Takaki

A heat treatment apparatus for heating, in a treatment container, a substrate on which a coating film is formed. The heat treatment apparatus includes: a mount provided in the treatment container and which mounts the substrate thereon; a heating part that heats the substrate mounted on the mount; a suction pipe leading to a suction port formed in the mount, penetrating the mount, and extending directly downward; and a collection container provided on a suction path between the suction pipe and a suction mechanism. The collection container is provided directly below the mount in plan view and connected to the suction pipe to collect a sublimate in the treatment container.

Growing community of inventors

Koshi, Japan

Shinichi Sagara