Fujitsu Corporation

Kyushu Fujitsu Electronics Limited

Shinichi Nomura

Yoshikazu Kanazawa

Masahiro Nakahara

Hisatsugu Shirai

Hidehiko Shiraiwa

Yukinori Miyazaki

Ryuji Tazume

Mitsuhiro Moriyama

Nobuhiro Takahashi

A plasma display panel of a surface discharge type is disclosed, which can positively generate the discharge for display while suppressing the power consumption even when the number of the electrodes is increased for attaining the high definition. A plurality of display electrode pairs are arranged in proximity with each other inside of a pair of substrates opposed to each other with a discharge gap formed therebetween. Each display electrode includes a main pattern extending in one direction, independent discharge patterns each formed for each luminous area corresponding to a display cell, and a plurality of auxiliary patterns for electrically connecting the main pattern and the discharge patterns to each other. The auxiliary patterns are higher in conductivity than the discharge patterns.

Surface discharge plasma display panel

A method for preventing contamination caused by residues of etched off patterns etched by photolithographic etching. A considerable amount of small contamination spots on a semiconductor chip are found to be caused by tiny residues of etched off patterns. These residues are formed primarily around the periphery of device areas and mark patterns when their outsides are etched off. The occurence of such residues of etching is increased by anisotropic etching. These residues are dislodged by succeeding steps of the pattern making process, and disperse over the substrate causing small contamination spots. To avoid the detrimental effects of the etching residues, the edges of the mark patterns and device areas are covered with an edge cover which is formed in a step to following the pattern etching process.

Method for fabricating semiconductor devices that prevents pattern

Growing community of inventors

Higashimorokata, Japan

Shinichi Nomura