Nec Lcd Technologies, Ltd.

Nec Corporation

Hitachi Metals, Ltd.

Hitachi-Lg Data Storage, Inc.

Shinichi Nakata

Yuji Yamamoto

Michiaki Sakamoto

Mamoru Okamoto

Hironori Kikkawa

Takahiko Watanabe

Masami Yamashita

Takayuki Ishino

Hirofumi Ihara

Muneo Maruyama

Takasuke Hayase

Akitoshi Maeda

Hiroaki Tanaka

Shigeru Kimura

Satoshi Ihida

Shouichi Kuroha

Keiko Yamada

Hiroyuki Uchida

Kazushige Takechi

Tsutomu Hamada

Hiroaki Matsuyama

Shusaku Kido

Satoshi Doi

Masanobu Hidehira

Tae Yoshikawa

Toshihiko Harano

Yoshitaka Horie

Hisanobu Shimodouzono

Masayoshi Suzuki

Teruaki Suzuki

Yoshihiko Hirai

Kazumi Kobayashi

Hiroshi Kanoh

Toshiya Ishii

Kazunori Nishimura

Hiroshi Kanou

Wakahiko Kaneko

Hirotaka Yamaguchi

Tae Miyahara

Katsumasa Yamasaki

An edge processing device includes: conveying means that convey a molded powder compact, a first rotating tool disposed on one side and a second rotating tool disposed on the other side and rotating in a direction identical to a direction the first rotating tool rotates. The first rotating tool contacts from an upstream side with a first corner portion between one side surface of a processing target portion of the molded powder compact and a rear surface of the processing target portion. The second rotating tool contacts from a downstream side with a second corner portion between the other side surface of the processing target portion and a front surface of the processing target portion. The second rotating tool faces the first rotating tool with the conveying path therebetween, and is positionally displaced to the downstream side with respect to the first rotating tool.

Edge processing device for molded powder compact and edge processing method for molded powder compact

A control unit makes the slot control mechanism execute an failure recovery operation to repeat the insertion operation and the ejection operation alternately for a predetermined amount at a first point of time when the below fact is found, if it is found that there is an error in insertion operation or ejection operation of a slot control mechanism. Afterwards, the control unit makes the slot control mechanism execute an restoration operation for a predetermined amount after a second point of time when the below fact is found, if it is found that the slot control mechanism has returned to normal, thereby making the slot control mechanism return to the state at the first point of time. Then, the control unit makes the slot control mechanism execute the insertion operation or the ejection operation again. With this arrangement, it is possible to ensure reliable insertion operation or ejection operation.

Optical disc apparatus

Light exposure areasand light masking areasin a sole reticle are arrayed in alternation to one another in both the longitudinal and transverse directions. Substrate is exposed to light by multi-domain light exposure using this reticle so that the respective areas of the reticle exposed to light with respective shots A to B, B to C . . . , N to M are not adjacent to one another in the boundary portions of the reticle shifted for executing the respective shots, thus relaxing the difference in illuminance between the respective shots and the difference in finish of the boundary portions of the shots, such differences becoming imperceptible to human eyes upon displaying liquid crystal display apparatus.

Mask for light exposure

In a liquid crystal display device comprising a first substratehaving a color filter, a second substrateand a liquid crystal layer disposed therebetween, a color filter layeris disposed on a protection filmof a thin film transistor formed on the first substrateso as to be partitioned by a light shielding portion, and a common electrodeis disposed thereon. A pixel electrode to be connected to a source electrodeis disposed through a through hole formed in an overcoat layer (interlayer separation film). On the first substrate below the color filter layerare provided plural scan signal electrodes, plural video signal electrodes crossing the scan signal electrodes in a matrix form, plural thin film transistors formed in association with the crossing points between the electrodes. Each pixel is provided with a common electrodewhich is connected over plural pixels through a common electrode wire to supply reference potential, and a pixel electrodewhich is connected to the corresponding thin film transistor and disposed so as to confront the common electrode in the pixel area.

Liquid crystal display device and method of manufacturing the same

There is provided a liquid crystal display device including a display screen comprised of a plurality of areas in each of which a pixel pattern is formed, wherein any two areas located adjacent to each other, among the areas, have at least two stitches therebetween.

Liquid crystal display device and method fabricating the same

Liquid crystal display device and method of fabricating the same

A liquid crystal display device which includes first and second organic interlaminar insulating films between pixel electrode and wire. The first interlaminar insulating film directly covers source electrode, source wire, drain electrode and back channel. Underlying one of the organic interlaminar insulating films directly contacts a channel part of a TFT. This provides an active matrix type liquid crystal display device with high transmittance and capable of bright displaying, which includes an active matrix wiring substrate having a structure of overlapping wires with a pixel electrode. The device can be prepared at low cost only through 5 photolithographic steps, i.e., without increasing the photolithographic steps as compared with those of the prior liquid crystal display device having high aperture ratio.

Liquid crystal display device and process for producing same

The method of fabricating a liquid crystal display device includes the steps of (a) fabricating a switching device on a substrate, (b) forming an interlayer insulating film on the substrate such that the switching device is covered with the interlayer insulating film, and (c) forming a transparent electrode on the interlayer insulating film, the transparent electrode being electrically connected to the switching device through the interlayer insulating film, the step (c) including (c1) depositing electrically conductive, transparent and amorphous material on the interlayer insulating film, (c2) patterning the material into the transparent electrode, and (c3) turning the transparent electrode into polysilicon by thermal annealing carried out after formation of an alignment film.

Method of fabricating liquid crystal display device

Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same

An active matrix substrate forms a liquid crystal display panel together with a counter substrate and liquid crystal filling a gap therebetween, and color filters are covered with an overcoat layer of photo-sensitive acrylic resin, wherein column spacers of the photo-sensitive acrylic resin project from the overcoat layer so that the column spacers are hardly separated from the overcoat layer in a rubbing for producing an orientation layer.

Active matrix substrate having column spacers integral with protective layer and process for fabrication thereof

The method of fabricating a liquid crystal display device includes the steps of (a) fabricating a switching device on a substrate, (b) forming an interlayer insulating film on the substrate such that the switching device is covered with the interlayer insulating film, and (c) forming a transparent electrode on the interlayer insulating film, the transparent electrode being electrically connected to the switching device through the interlayer insulating film, the step (c) including (c) depositing electrically conductive, transparent and amorphous material on the interlayer insulating film, (c) patterning the material into the transparent electrode, and (c) turning the transparent electrode into polysilicon by thermal annealing carried out after formation of an alignment film.

Alignment marks are formed when source and drain electrodes of a TFT are formed and thereon a thick red filter is formed. So that, the following respective color layers can be made thin on the red filter. Also, the exposure alignment laser permeates in an exposure step, and thereby the alignment marks can be accurately detected.

Alignment marks and manufacturing method for the same

Growing community of inventors

Izumi, Japan

Shinichi Nakata