Matsushita Electric Industrial Co., Ltd.

Other

Matsushita Electric Co., Ltd.

Shinichi Mizuguchi

Yoshikazu Yoshida

Noritsugu Umehara

Tatsuo Itoh

Teruhiro Shiono

Michihito Ueda

Kazuo Yokoyama

Takahiro Asano

Koji Kato

Takeo Sato

Tadashi Kimura

Tatsuo Ito

Kazuhiro Nishiyama

Yasunao Okazaki

Akio Takimoto

Koji Akiyama

Keishi Kubo

Hiroshi Tsutsui

Yoshito Nakanishi

Nobuaki Furuya

Kazunori Komori

Yasunori Kuratomi

Toru Kawase

Takeo Miyata

Shuji Ueda

Youichi Ohnishi

Akira Okuda

Tadayuki Onoda

Tsutomu Hamada

Kenichi Matsumura

Syuji Ueda

Yoshinobu Nagano

Hisato Noda

Hiromi Shima

Kouji Kato

Toshio Ishikawa

The diffractive optical modulator of the invention includes: a plate having a portion functioning as a first electrode; a spacer layer formed on the plate; and a grating consisting of a plurality of beams having a portion functioning as a second electrode, both ends of the beams being supported on the spacer layer. In the diffractive optical modulator, by adjusting a voltage applied between the first electrode and the second electrode, a distance between the beams and the plate is varied, thereby controlling the diffraction efficiency. An insulating layer is further provided between the plate and the plurality of beams.

Diffractive optical modulator and method for producing the same,

A spatial light modulator (SLM) providing effects light blocking of even strong incident light without reducing the photoelectric conversion efficiency, and a projector using said SLM, are disclosed. Said projector uses an SLM comprising a readout side glass substrate comprising a readout side transparent electrode; a light modulation layer for modulating incident light according to an applied voltage; a reflective electrode comprising plural electrode elements for applying a voltage to the light modulation layer, and reflecting the light passed by the readout side glass substrate, the readout side transparent electrode, and light modulation layer; a light blocking layer having plural holes; a drive electrode comprising plural electrode elements electrically connected through the holes in the light blocking layer to a corresponding electrode element of the reflective electrode; and voltage applying means for applying a voltage corresponding to the brightness of each pixel in the input image to each electrode element of the drive electrode.

Spatial light modulator and projector

The microwave plasma torch of the invention includes: a vacuum container having an evacuating apparatus; a coaxial waveguide including an inner conductor and an outer conductor, a first end portion of the coaxial waveguide being connected with a microwave supplying apparatus for supplying a microwave and a second end portion of the coaxial waveguide being connected with the vacuum container, thereby introducing the microwave supplied from the microwave supplying apparatus into the vacuum container along a waveguide axis of the coaxial waveguide; and a gas supplying apparatus for injecting a gas into the vacuum container along a plurality of injection axes. In the microwave plasma torch, at least two of the plurality of injection axes do not cross the waveguide axis in the second end portion, and do not exist in a plane vertical to the waveguide axis, and a ratio of a diameter of the inner conductor to a diameter of the outer conductor in a vicinity of the second end portion decreases from the first to the second end portion along the waveguide axis.

Microwave plasma torch having discretely positioned gas injection holes

The plasma processing apparatus of the invention generates plasma from a reactive gas with microwave power so as to process a substrate. The plasma processing apparatus includes: a vacuum chamber having an evacuation means and reactive gas inlet ports; a means for holding the substrate to be processed which is disposed inside the vacuum chamber; a dielectric plate disposed at a position facing the substrate to be processed so as to form an integral part of the vacuum chamber; a metal conductor plate disposed on an outer plane of the dielectric plate not facing the vacuum chamber so as to face the substrate to be processed; and a means for supplying microwave power substantially inverse-radially from a circumferential side of the dielectric plate towards a center thereof. Under the above construction, the microwave is supplied substantially inverse-radially from the circumferential side of the dielectric plate towards the center thereof, thereby generating a surface wave on the dielectric plate facing the substrate. As a result, the microwave power is uniformly radiated along radial directions into the vacuum chamber and plasma is uniformly generated from a reactive gas over a large area, so that even a large substrate may be processed uniformly.

Microwave plasma processing apparatus and processing method using the

In an excitation atomic beam source for use in doping impurities to a semiconductor, a magnetic field is generated in a space between a nozzle (12) and a skimmer (13). A microwave discharge is generated in the space to form a plasma in the space by applying microwaves to a gas to be ionized emitted from the nozzle (12). In this manner, high-velocity particles and excited atoms in the plasma are passed through the skimmer (13) to thereby generate a supersonic excitation atomic beam.

Excitation atomic beam source

A laser ablation apparatus includes a laser oscillator, a condenser lens for condensing a laser light generated from the oscillator, a rotary cylindrical target having a side face which is illuminated by the laser light, a driving device for rotating the target, a substrate carrier device for moving a substrate in a direction parallel to a tangential direction of the cylindrical target, and a vacuum chamber located above the substrate. The vacuum chamber encloses a part of the cylindrical target, and has an open laser inlet port so that the side face of the target is illuminated by the laser light passing through the laser inlet port to adhere material evaporated from the target to the substrate when the substrate passing through the vacuum chamber.

Laser ablation apparatus

A method for polishing a slight region of the surface of a workpiece utilizes an actuator or actuators having piezoelectric elements. The actuators cause slight movement of a polishing portion disposed at the leading end of a polishing tool in an XY-direction parallel with the surface of the workpiece and/or a Z-direction perpendicular to the surface of the workpiece. A polishing material, including a magnetic fluid and nonmagnetic abrasive grains dispersed in the magnetic fluid, is held magnetically in a space between the polishing portion and the workpiece.

Method for polishing slight area of surface of workpiece and tool

An exposure system includes a pulse light source emitting light in response to a trigger signal and giving a predetermined exposure light quantity by a plurality of times of light emission. A reticle has an alignment mark and a light exposure pattern. A projection lens contractedly projects the pattern of the reticle. A wafer has an alignment mark to be located. The wafer is exposed to a projection of the pattern. A wafer stage is movable and carries the wafer. A laser interferometer measures a position of the wafer stage. An alignment device serves to detect a condition of an alignment of the wafer with respect to the reticle in an exposure position.

Exposure system

An optical scanning device which includes a laser light source, an aspheric lens for converging a laser beam emitted from the laser light source, and a reflection type holographic disk for diffracting and scanning the laser beam passing through the aspheric lens.

Optical scanning device

A micro-abrading method wherein an abrading section undergoes a micromotion in the XY-direction parallel with the surface of a workpiece according to the operation of an actuator comprising piezoelectric elements, and an abrading material is held between the abrading section positioned at the lower end of an abrading tool and the workpiece. The phase difference between the X-direction motion and the Y-direction motion is cyclically changed while the abrading section is undergoing the micromotion, and the surface of the workpiece is entirely and uniformly abraded even though a large area is abraded.

Micro-abrading method and micro-abrading tool

A patterning composition is prepared by mixing a metallic salt of organic acid which separates a metal when reduced (e.g. copper (II) heptanoate), a reducing agent (e.g., 4-methoxy-1-naphthol), which shows reducing activity by being heated and loses the reducing activity by being irradiated by UV light, visible light or infrared light, gelatin and water, the composition is applied on a substrate, and the coating is irradiated by UV or visible infrared light through a mask and then heated, thereby to deposit metal in a pattern.

Patterning composition and method for patterning on a substrate

Light transmission paste and a metallic copper deposition method of the present invention can educe metallic copper in the desired portion by applying or contacting light transmission paste on cuprous oxide and applying light upon the desired portion. Also, the light is applied through a mask corresponding to the pattern to be obtained, so that desired circuit pattern may be easily obtained. Further, metallic copper of high density may be educed by the contacting or applying metal deposition paste upon metal of a substrate.

Light transmission paste and metallic copper deposition method using same

A microscopic grinding device grinds a workpiece at ultrahigh precision with the use of magnetic grinding fluid actuated microscopically in three dimensional directions by Z- and XY-axis actuators. The magnetic grinding fluid is magnetically supported between a grinding member and the workpiece by the magnetic field. Because magnetic field is generated to form a magnetic circuit within the device itself where no workpiece is necessary to form the magnetic circuit, the device can be used with equal results even with workpieces made from non-magnetic material. The pressure applied to the workpiece by the grinding member via the magnetic grinding fluid is detected by a load cell for feeding back a signal indicative of the detected pressure to the controller. The controller controls the actuators to actuate the grinding member such that the pressure applied from the grinding member, via the magnetic fluid, to the workpiece is maintained within a predetermined range.

Microscopic grinding method and microscopic grinding device

An optical wavelength converting apparatus for converting the divergent lights by a compact apparatus into a parallel lights comprises a light source, a means for collecting the lights from the light source to introduce them into the optical waveguide of the wavelength converting element, a rotation symmetrical lens disposed on the end portion opposite to the end portion on the side irradiated with the collected lights, thereby to make it possible to convert the divergent lights like Cherenkov radiation lights into parallel lights by a compact apparatus.

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Katano, Japan

Shinichi Mizuguchi