Kao Corporation

Shinichi Masuda

Genji Imokawa

Akira Kawamata

Masakazu Yamaguchi

Shinji Yamada

Hiroko Joukura

Naotake Takaishi

Koichi Nakamura

Katsumi Kita

Kazuyuki Yahagi

Kouichi Niinaka

Michihiro Hattori

Kazuhiro Tashiro

Tetsuo Uno

Koichi Niinaka

Tohru Tejima

A novel aroyl ketone derivative represented by formula (I) is disclosed.

Aroyl ketone derivative, UV ray absorber comprising the same, and

A novel aroyl ketone derivative represented by formula (I) is disclosed:

A cosmetic composition comprising a long-chain alkyltrimethylol is disclosed. The alkyltrimethylol is represeneted by the formula (I): ##STR1## wherein R is a linear or branched, saturated or unsaturated alkyl group having 8-22 carbon atoms. The composition is applied to various types of cosmetic and exhibits superior extendibility when applied, imparts a non-sticky, fresh feeling upon use, and provides an excellent moisture-retaining effect.

Cosmetic composition

A chalcone derivative of the formula (I): ##STR1## in which R.sub.1 represents hydrogen or a methyl group, and R.sub.2 represents a linear or branched aliphatic hydrocarbon group having from 2 to 24 carbon atoms. The derivative is effective in protecting the skin when made into ultraviolet absorbing agents including an anti-sunburn oil, since it has the maximum absorbing capacity at a wave length in the vicinity of 350 nm, does not irritate the skin and is highly compatible with a cosmetic base.

Novel chalcone derivatives and ultraviolet absorbers comprising the same

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Utsunomiya, Japan

Shinichi Masuda