Nippon Soda Co., Ltd.

Shinichi Kimizuka

Akihiro Shirai

Mitsuhiro Nakamura

Eiji Takahashi

Hiroshi Takahashi

Yasunori Miyashita

Hiroo Muramoto

Hitoshi Matsumoto

Yukikazu Nobuhara

The present invention provides a polyol composition including a polyol having a polyester chain, wherein the polyol composition substantially contains no metal-base polymerization catalyst and an amount of phosphorus element derived from a polymerization catalyst is 1 to 1000 ppm. Furthermore, a method for producing a polyol composition is provided, including reacting a compound having an active hydrogen with a compound having at least one selected from the group consisting of carboxyl group, ester group and acid halide group in the presence of 0.0001-0.05 parts by mol of a phosphorus compound with respect to 1 part by mol of the active hydrogen without using a metal-based polymerization catalyst.

Polyol Composition

A polybutadiene having a hydroxyl group at a terminal end thereof is reacted with a lactone compound such as an &#x3b5;-caprolactone to obtain a polymer polyol represented by formula (I): HO&#x2014;X&#x2014;Y&#x2014;X&#x2014;OH (wherein Xand Xeach independently represents a polyester component and Y represents a polybutadiene component), the polymer polyol is reacted with an unsymmetric diisocyanate to obtain a urethane prepolymer, and then the urethane prepolymer is reacted with a chain extender to obtain a polyurethane.

Polyurethane

A process for making poly(hydroxystyrene)s whose phenolic hydroxyl groups are partially protected by acid-decomposable or -eliminable groups, by which the degree of deblocking of the phenolic hydroxyl groups is controlled. Namely, the production of a polymer containing, in the molecule, repeating units of the general formula (IA) and those of the general formula (IB), comprising adding an acid to polymer (B) containing in the molecule repeating units of general formula (II) in an organic solvent with the molar ratio of the acid to the ORgroup being 0.0001 equivalent or above but below 0.05 equivalent, and reacting the polymer with the acid. In the general formulae, Ris hydrogen or methyl; Ris Calkyl; Ris an acid-decomposable or -eliminable group; Ris hydrogen or a group derived from Rby decomposition with acid; and p is 0, 1, or 2, with the proviso that the IB/IA molar ratio ranges 98/2 to 30/70.

Process for production of partially protected poly(hydroxystyrene)s

An ESCAP type polymer which has a controlled structure wherein the groups protecting phenolic hydroxyl groups have been selectively or partly eliminated or decomposed with an acid and no carboxylic acid residues are contained and which is a narrow-disperse polymer and is suitable for use as a material for a chemical amplification type resist for excimer lasers which has excellent resolution. The process is characterized by subjecting either an alkenylphenol in which the phenolic hydroxyl group has been protected or the alkenylphenol and a vinylaromatic compound to anionic polymerization together with a (meth)acrylic ester to give a block copolymer and eliminating only a given proportion of the groups protecting the phenolic hydroxyl groups from the block copolymer with an acid reagent. Thus, an alkenylphenol copolymer is synthesized which has a ratio of the weight-average molecular weight (Mw) to the number-average molecular weight (Mn), (Mw/Mn), of 1.00 to 1.50 and has no carboxylic acid residues.

Alkenylphenol copolymer and process for producing the same

An iodonium salt compound which is colored little, can be easily synthesized in high yield, is highly sensitive to irradiation with actinic energy rays such as light, electronic beams, or X-rays, is highly soluble in monomers, and is lowly toxic; and a photocurable composition which can cure in a short time even when the counter anion is a hexafluorophosphonate, tetrafluoroborate, etc., regardless of whether it is clear or pigmented, and which gives a cured object having excellent properties. The photocurable composition is prepared by compounding an iodonium salt compound represented by the general formula (I) with a cationically polymerizable compound, a sensitizer, etc.

Photocurable composition containing iodonium salt compound

A photopolymerization initiator comprising an iodonium salt compound; and a photocurable composition containing the compound. The composition is a photocurable cationic composition which cures in a short time upon irradiation with actinic energy rays. They are based on the following findings: (1) a colorless lowly toxic iodonium salt compound can be easily synthesized in high yield when a specific substrate is used as a starting material; (2) a photocurable composition curing in a short time to give a cured article having excellent material properties is obtained by using the iodonium salt compound in combination with a sensitizer; and (3) a highly sensitive photocurable composition which upon irradiation with actinic energy rays cures in a short time to give a cured article having excellent material properties is obtained by using a compound having a group functioning as a cationic photopolymerization initiator, a sensitizing group accelerating the phtoinitiated cationic reaction, and a cationically polymerizable group in the same molecule.

Growing community of inventors

Ichihara, Japan

Shinichi Kimizuka