Kanto Denka Kogyo Co., Ltd.

Shinichi Kawaguchi

Korehito Kato

Yoshinao Takahashi

Yoshihiko Iketani

Yukinobu Shibusawa

Hiroki Takizawa

Sho Kikuchi

Yoshimasa Sakurai

Provided are a method and a device that do not require any pretreatment and measure and analyze impurities or hydrogen fluoride in corrosive gas with high sensitivity. The method and the device measure a fluorine-based gas in a sample containing a corrosive gas with a Fourier transform infrared spectrophotometer, wherein the Fourier transform infrared spectrophotometer includes a detector having an InGaAs detection element and a single-path gas cell having an optical path length of 0.01 m to 2 m, a cell window is made of a corrosion-resistant material, a measurement region ranges from 3800 to 14300 cmin wavenumber, and the concentration of the fluorine-based gas is quantified based on an amount of absorption of light having a predetermined wavenumber by the sample and a calibration curve.

Method and device for analyzing gas

A chlorine fluoride feeding device and feeding process are provided that can stably generate industrially applicable chlorine fluoride (ClF), control flow rate, and provide continual feed. The feeding process of chlorine fluoride of this invention is a feeding process to feed chlorine fluoride generated by loading a gas that contains fluorine atoms and a gas that contains chlorine atoms to a flow-type heat reactor or a plasma reactor, and it can stably generate and safely feed chlorine fluoride for a long time by reacting chlorine fluoride that is difficult to pack at a high pressure, such that an amount that can be packed in a gas container such as a gas cylinder is limited, with two or more types of gas materials that can be packed safely in a gas container by liquefaction, or with such gas material and a solid material.

Feeding process of chlorine fluoride

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Shibukawa, Japan

Shinichi Kawaguchi