Hitachi, Ltd.

Computer Basic Technology Research Association

Computer Basic Technology Association

Shinichi Hara

Shinji Narishige

Masanobu Hanazono

Makoto Morijiri

Tetsuo Kobayashi

Katsuya Mitsuoka

Hiroshi Ikeda

Moriaki Fuyama

Masaaki Hayashi

Takashi Kawabe

Masaaki Sano

Tetsuya Okai

Eiji Ashida

Masatoshi Tsuchiya

Yukihisa Tsukada

Akira Kumagai

Hirosi Akiyama

Tsuneo Yoshinari

Mistuo Sato

Harunobu Saitoo

Ataru Kobayashi

Takumi Kurisu

A method of forming a thin film pattern on a base having a step portion. This method comprises a first step of forming a thin film of given material on the base, a second step of forming a predetermined pattern of a first photoresist film on said thin film at one of a first portion including a lower part of the step portion and a second portion including an upper part of the step portion, a third step of forming a predetermined pattern of a second photoresist film on said thin film at the other of the first and second portions and a fourth step of applying ion-milling to said thin film of given material using masks said first and second photoresist film patterns formed on said thin film at the first and second portions.

Method for forming thin film pattern and method for fabricating thin

A first magnetic layer is formed upon a non-magnetic substrate, a gap layer is formed upon the first magnetic layer, a conductor coil covered with an insulation layer is formed upon the gap layer, a second magnetic layer is formed upon the gap layer and the insulation layer, a magnetic gap being formed between the first and second magnetic layers at a front portion facing a recording medium, and the second magnetic layer being connected to the first magnetic layer at a back portion. After forming a mask made of metal oxide upon the second magnetic layer, the second magnetic layer, the gap layer, and the first magnetic layer are formed into a predetermined shape respectively at the tip portion by dry etching. Thus, a high performance thin-film magnetic head having the same widths for the first and second magnetic layers is obtained.

Method of manufacturing a thin-film magnetic head

In producing a magnetic head by thin film technique, a magnetic film is formed on an insulating member covering coil conductor films after the surface of the insulating member is flattened. After a flattening coating is formed on the insulating member, the flattening coating as well as the insulating member are etched by plasma-assisted etching technique in order to flatten the surface.

Production method of thin film magnetic head

A magnetic thin film of Ni-Co-Fe ternary alloy containing at most 75% by weight of Ni, 10 to 90% by weight of Co, and at most 15% by weight of Fe, which shows the magnetostriction constant between +2.times.10.sup.-6 to -2.times.10.sup.-6 and shows a uniaxial magnetic anisotropy of at most 10 Oe. The film is formed through the vacuum evaporation of the alloy during which two orthogonal external magnetic fields, directions x and y, are alternately applied over the deposition surface of a substrate. The film is suitable for a core material of a thin film magnetic head with a higher recording density.

Thin film of Ni-Co-Fe ternary alloy and process for producing the same

A method of patterning a thin film by dry etching is disclosed in which, in order for a thin alumina film to have a predetermined pattern, the thin alumina film is selectively removed by carrying out the ion beam etching which uses a carbon fluoride gas, while using a photoresist film as a mask.

Method of patterning thin film

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Hitachi, Japan

Shinichi Hara