Tokyo Shibaura Denki Kabushiki Kaisha

Shingo Watanabe

Takeo Itou

Takeo Ito

Norio Koike

Kunihiro Ikari

A method for forming a pattern of a non-light-emitting black material on the inner surface of a faceplate of a color cathode ray tube is provided, which comprises the steps of forming a photoresist layer of a photoresist containing a water-soluble bisazidocompound, a water-soluble diazocompound, and a water-soluble polymeric material, on an inner surface of a faceplate of a color cathode ray tube, selectively exposing parts of the photoresist layer using a shadow mask so as to photocure the exposed parts, developing the photoresist layer to remove unexposed parts of the photoresist layer, thereby forming dots of the photoresist, forming a film of a non-light-emitting black material on the inner surface of the faceplate including the dots, and removing the dots and the non-light-emitting black material on the dots so as to form holes in the film of the non-light-emitting black material.

Photoresist composition with water soluble bisazide and diazo compound

A method for forming a pattern of a non-light-emitting black material on the inner surface of a faceplate of a color cathode ray tube is provided, which comprises the steps of:

Method for forming pattern and photoresist used therein

Photoresist compositions based upon a water-soluble polymer are disclosed together with a water-soluble bisazide compound as a cross-linker, a water-soluble adhesion-improving diazo compound are characterized in that a water-soluble silane compound is included. The compositions are photosensitive, particularly to ultraviolet rays, and adhere well to the substrates to which they are applied. The compositions of the invention are used as photoresists.

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Himeji, Japan

Shingo Watanabe