Renesas Northern Japan Semiconductor, Inc.

Renesas Electronics Corporation

Renesas Technology Corp.

Shingo Oosaka

Noriyuki Takahashi

Yoshihiko Yamaguchi

Mitsuru Kinoshita

Tadashi Munakata

A semiconductor device manufacturing method comprising the steps of providing a matrix substrate having a main surface with plural device areas formed thereon, fixing plural semiconductor chips to the plural device areas respectively, then sealing the plural semiconductor chips all together with resin to form a block sealing member, dividing the block sealing member and the matrix substrate for each of the device areas by dicing, thereafter rubbing a surface of each of the diced sealing member portions with a brush, then storing semiconductor devices formed by the dicing once into pockets respectively of a tray, and conveying the semiconductor devices each individually from the tray. Since the substrate dividing work after block molding is performed by dicing while vacuum-chucking the surface of the block sealing member, the substrate division can be done without imposing any stress on an external terminal mounting surface of the matrix substrate.

Growing community of inventors

Hakodate, Japan

Shingo Oosaka