Nec Corporation

Sumitomo Metal Mining Company, Ltd.

Murata Manufacturing Co., Ltd.

Shingo Murakami

Masaya Yukinobu

Junji Ishii

Hiroyuki Tanaka

Haruo Nishiyama

Yukio Ogura

Toshiaki Terao

Yuji Watanabe

Tsutomu Tanimitsu

Takahiro Kamata

Yoshiyuki Kunifusa

Katsunori Nagamatsu

Yuki Kumagai

Yoshiaki Matsumura

Tsuyoshi Yamane

Katsuhiko Nakatani

Yoshiaki Aida

To provide a fine nickel powder for an internal electrode paste of an electronic component, the nickel powder obtained by a wet method and having high crystallinity, excellent sintering characteristics, and heat-shrinking characteristics. The nickel powder is obtained by precipitating nickel by a reduction reaction in a reaction solution including at least water-soluble nickel salt, salt of metal nobler than nickel, hydrazine as a reducing agent, and alkali metal hydroxide as a pH adjusting agent and water; the reaction solution is prepared by mixing a nickel salt solution including the water-soluble nickel salt and the salt of metal nobler than nickel with a mixed reducing agent solution including hydrazine and alkali metal hydroxide; and the hydrazine is additionally added to the reaction solution after a reduction reaction initiates in the reaction solution.

Nickel powder, method for manufacturing nickel powder, internal electrode paste using nickel powder, and electronic component

A process for producing nickel powder capable of obtaining inexpensive, and also, high-performance nickel powder, even when using wet process. A process for producing nickel powder, including a crystallization step for obtaining nickel crystal powder by reductive reaction in reaction solution in which at least water-soluble nickel salt, metal salt of metal more noble than nickel, reducing agent, alkali hydroxide, amine compound, and water are mixed, wherein the reducing agent to be mixed in the crystallization step is hydrazine, the amine compound is autolysis inhibitor of hydrazine, and contains two or more primary amino groups in molecule, or contains one primary amino group and one or more secondary amino groups in molecule, and ratio of molar number of the amine compound with respect to molar number of nickel in the reaction solution is in a range of 0.01 mol % to 5 mol %.

Process for producing nickel powder

A device and method for inspecting a test piece with a laser beam in which the laser beam is divided into plural beams, and each of the plural beams has an identification marker, such as a particular polarity or intensity. Each of the marked beams, scans a different portion of the test piece to reduce the time needed to inspect the test piece.

Method and apparatus for inspecting high-precision patterns

A focal point detecting apparatus for an objective lens is disclosed for inspecting whether or not the focal point of the objective lens used in an electron microscope, an optical inspecting apparatus, a laser processing apparatus, etc. is positioned on a surface of a target object. The focal point detecting apparatus comprises for entering an optical beam for detecting a focal point from a position deviant from an optical axis of an objective lens to a surface of a target object to be inspected through at least the objective lens; and two two-split sensors on which the optical beam reflected from the surface of the target object so as to pass again through the objective lens is converged by at least a condenser lens. The two two-split sensors are arranged at the same optical inclination in front of and behind the position on which the reflected optical beam is converged by the condenser lens when the focal point of the objective lens is positioned on the surface of the target object.

Detection of focal point of objective lens by means of a two-split sensor

Powdery Cr(CO).sub.6 is stored in a reservoir, into which Ar gas, under flow rate control by a flow rate controller, is introduced. On the other hand, He gas, whose molecular weight differs from that of Ar gas, is also introduced into the reservoir under flow rate control by another flow rate controller. These Ar and He gases are used as carrier gases for feeding a reactive gas into a chamber. The reservoir sublimates the powdery Cr(CO).sub.6 stored therein. The Cr(CO).sub.6 obtained by sublimation is carried by the Ar and He gases which are introduced into the reservoir, and supplied onto a substrate in the chamber. The substrate is irradiated with a laser beam. This irradiation with the laser beam decomposes the Cr(CO).sub.6 gas to form a film of metallic chromium on the substrate.

Method and apparatus for film formation by chemical vapor deposition

In a photo-CVD apparatus, a holder on which an article is held is provided in a main chamber. The holder is moved in a predetermined direction to coincide a predetermined point of the article with a imaging point of light radiated from a light source, so that a thin film is grown on the predetermined point of the article. A process chamber is defined on the holder of the main chamber is accordance with the separation of a seal wall. Process gas is supplied to the process chamber for the growing of the thin film on the article, while inert gas is supplied to the remaining portion of the main chamber. A gas pressure of the main chamber is slightly greater than that of the process chamber, so that the process gas is prevented from flowing to the main chamber. For this structure, a size of the process chamber can be small, so that a consumption of process gas is decreased.

Photo-chemical vapor deposition apparatus

Growing community of inventors

Tokyo, Japan

Shingo Murakami