Canon Kabushiki Kaisha

Shingo Ishida

Toshiki Ito

Weijun Liu

Keiko Chiba

Timothy Brian Stachowiak

Kunihiko Asada

Toshiaki Ando

Kenta Sasa

A method of controlling a control apparatus for controlling a forming apparatus operable to form a layer of a formable material on a substrate is provided. The method includes acquiring data that specifies a drop amount and a drop position on the substrate of each of droplets, calculating a spread of each of the droplets assuming that a spread shape of each of the droplets is a polygon, and calculating a surface area of an overlapping region in which a region of a droplet that spreads into the polygon and a region of a recessed portion in the mold to be filled with the formable material overlap, and correcting, based on a result of the calculation, the data so that the recessed portion is filled with the formable material.

Control method, storage medium, imprint method, and article manufacturing method

An adjusting method for adjusting an imprint apparatus includes a preparation step of preparing a sample for evaluating a state in which a contact region of a test mold is in contact with an imprint material supplied on a substrate; an evaluation step of evaluating the sample; and an adjustment step of adjusting the imprint apparatus based on a result of evaluation obtained in the evaluation step. The contact region includes a flat region which does not include a pattern, the evaluation in the evaluation step includes a first evaluation, which is an evaluation of a state of the imprint material in the flat region, and the imprint apparatus is adjusted based on a result of the first evaluation in the adjustment step.

Adjusting method for imprint apparatus, imprinting method, and article manufacturing method

The pattern forming method, which is a photo-nanoimprint technology, includes in this order: laying a layer formed of a curable composition (A1) containing at least a polymerizable compound on a surface of a substrate; dispensing liquid droplets of a curable composition (A2) containing at least a polymerizable compound dropwise discretely onto the layer of (A1) to lay the liquid droplets; sandwiching a layer obtained by partially mixing (A1) and (A2) between a mold and the substrate; of irradiating the layer obtained by partially mixing (A1) and (A2) with light from a side of the mold to cure the layer in one stroke; and releasing the mold from the layer formed of the curable compositions after the curing, in which a value Vr/Vc obtained by dividing a volume of (A2) per shot area (Vr) by a volume of (A1) (Vc) is 4 or more and 15 or less.

Pattern forming method and methods for manufacturing processed substrate, optical component and quartz mold replica as well as coating material for imprint pretreatment and set thereof with imprint resist

To provide a cleaning apparatus advantageous for cleaning, for example, an original plate used to transfer a pattern to a substrate. Provided is a cleaning apparatus that cleans an original plate used when a pattern is transferred to a substrate, the cleaning apparatus including a region dividing unit which divides the original plate into a plurality of regions on the basis of information of the original plate, a conditions generator which generates cleaning conditions for each of the separate regions, and a cleaner which cleans the original plate on the basis of the cleaning conditions.

Growing community of inventors

Utsunomiya, Japan

Shingo Ishida