Taiwan Semiconductor Manufacturing Comp. Ltd.

Shin-Ta Wu

Chwen Yu

A method of monitoring static charge is provided. The method includes the operations as follows. A conductive tape is wrapped around an outer surface of a non-conductive tube. A metallic plate is connected to the conductive tape. The conductive tape and the metallic plate are covered by a metallic box, wherein the conductive tape and the metallic plate are entirely disposed within a metallic box. A plurality of static charges are detected from the metallic plate by an electrostatic field meter.

Method of monitoring static charge

A method of monitoring static charge is provided. The method includes the operations as follows. A metallic plate is connected to a conductive tape wrapped around an outer surface of a non-conductive tube. A plurality of static charges are detected from the metallic plate by an electrostatic field meter, wherein the conductive tape and the metallic plate are entirely disposed within a metallic box. A flow rate of a fluid flowing through the non-conductive tube is adjusted according to the plurality of static charges detected by the electrostatic field meter.

A monitoring system is provided. The monitoring system includes a non-conductive tube, a conductive tape, a metallic plate, and an electrostatic field meter. The non-conductive tube includes an outer surface. The conductive tape is wrapped around the outer surface of the non-conductive tube. The metallic plate contacts and extends away from the conductive tape. The electrostatic field meter is disposed a predetermined distance away from the metallic plate, and a static charge of the metallic plate is detectable by the electrostatic field meter. A method of monitoring static charge is also provided.

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Hsinchu, Taiwan

Shin-Ta Wu