Au Optronics Corporation

Shin-Shueh Chen

Yi-Wei Chen

Che-Chia Chang

Pin-Miao Liu

Chia-Tien Peng

Ming-Hung Chuang

Wan-Yi Liu

Po-Hsueh Chen

Ming-Hsien Lee

Jia-Hong Ye

Pei-Ming Chen

Hsien-Chun Wang

Shu-Wen Tzeng

Chih-Chung Su

Wu-Hsiung Lin

Tsung-Yi Hsu

Jen-Pei Tseng

Pao-Yu Huang

Guang-Ren Shen

A display device, including a pixel array substrate and a sensor element substrate, is provided. The sensor element substrate overlaps the pixel array substrate, and includes a substrate, a switch element, and a photosensitive element. The switch element is located on the substrate. The photosensitive element is electrically connected to the switch element, and includes a transparent electrode, a sensing layer, a metal electrode, and a barrier layer. The sensing layer is located on the transparent electrode. The metal electrode is located on the sensing layer, and covers a first sidewall of the sensing layer. The barrier layer covers a first sidewall of the transparent electrode. The barrier layer is located between the metal electrode and the sensing layer, or between the transparent electrode and the sensing layer.

Display device

A display apparatus includes a first substrate, a second substrate, a display medium, a pixel structure, a read-out transistor, a first insulating layer, a light-sensing structure, and a color filter pattern. The display medium is disposed between the first substrate and the second substrate. The pixel structure is disposed between the display medium and the first substrate. The read-out transistor has a semiconductor pattern and a control terminal. The light-sensing structure is disposed between the second substrate and the display medium, and is electrically connected to the read-out transistor. The first insulating layer is disposed between the semiconductor pattern and the control terminal of the read-out transistor. The color filter pattern is disposed between the second substrate and the display medium. The first insulating layer has an opening located outside the light-sensing structure, and the color filter pattern fills the opening of the first insulating layer.

Display apparatus

A display device includes a pixel array substrate, a sensing element substrate, and a display medium layer. The display medium layer is disposed between the pixel array substrate and the sensing element substrate. The sensing element substrate includes a substrate, a switch element, an insulation layer, an electrically conductive layer, a signal line, a sensing layer, and an electrode layer. The switch element is disposed on the substrate. The insulation layer covers the switch element. The electrically conductive layer is disposed on the insulation layer. The signal line is electrically connected to the electrically conductive layer. The sensing layer covers a top surface of the electrically conductive layer, a first side of the electrically conductive layer, and a second side of the electrically conductive layer. The electrode layer covers the sensing layer. The electrode layer is electrically connected to the switching element.

Display device and sensing element substrate capable of increasing ratio between photo current and dark current

A semiconductor substrate including a data line, a scan line, a capacitance control line, a first transistor, a pixel electrode, a second transistor, a storage capacitor and a third transistor is provided. A first terminal of the first transistor is electrically connected to the data line. A control terminal of the first transistor is electrically connected to the scan line. The pixel electrode is electrically connected to a second terminal of the first transistor. A first terminal of the second transistor is electrically connected to the second terminal of the first transistor. A first terminal of the third transistor is electrically connected to the capacitance control line. A control terminal of the third transistor is electrically connected to the scan line, and a second terminal of the third transistor is electrically connected to a control terminal of the second transistor.

Semiconductor substrate and driving method

A pixel structure includes a scan line, a data line, a switching element, a planarization layer, a first common electrode, a common line, a first insulating layer, a pixel electrode, a second insulating layer, and a second common electrode. The switching element includes a source and a drain. The common line is located on the planarization layer and directly connected with the first common electrode. The planarization layer is located on the scan line, the data line, and the switching element. The pixel electrode is electrically connected with the drain through a first contact hole, wherein the first contact hole penetrates through the planarization layer and the first insulating layer. The second common electrode is electrically connected with the first common electrode through a second contact hole, wherein the second contact hole penetrates through the first insulating layer and the second insulating layer. A touch panel is also provided.

Pixel structure with multilayered common electrodes and touch panel thereof

An image-sensing display device and an image processing method are provided. The image-sensing display device includes a substrate, banks, and sensor units. The banks and the sensor units are located on the substrate. Each of the sensor units includes first to fourth light-emitting devices and a photo sensor. The first to fourth light-emitting devices are located around a corresponding bank. The first to third light-emitting devices include a red light-emitting device, a green light-emitting device, and a blue light-emitting device. The first and fourth light-emitting devices are light-emitting devices of a same color. The photo sensor is located on the corresponding bank. The photo sensor includes a first electrode, a second electrode, and a sensing layer located between the first electrode and the second electrode. The first electrode and the second electrode respectively extend from the sensing layer along a first direction and a second direction.

Image-sensing display device and image processing method

A method for fabricating a touch display device is provided. The method includes: forming a sensor on a substrate, and forming a sensing signal line electrically connected to the sensor. The method of forming the sensor includes: forming a semiconductor layer including a semiconductor pattern of the sensor on the substrate, forming a gate insulation layer on the semiconductor layer, forming a first conductor layer on the gate insulation layer, forming an interlayered insulation layer on the gate insulation layer, performing an annealing process, removing the interlayered insulation layer on a gate predetermined region after the annealing process is performed, removing the first conductor layer on the gate predetermined region, forming a gate in the gate predetermined region, and forming a second conductor layer including a source and a drain of the sensor respectively electrically connected to the semiconductor pattern of the sensor.

Method for fabricating touch display device

An integration method of fabricating optical sensor device and thin film transistor device includes the follow steps. A substrate is provided, and a gate electrode and a bottom electrode are formed on the substrate. A first insulating layer is formed on the gate electrode and the bottom electrode, and the first insulating layer at least partially exposes the bottom electrode. An optical sensing pattern is formed on the bottom electrode. A patterned transparent semiconductor layer is formed on the first insulating layer, wherein the patterned transparent semiconductor layer includes a first transparent semiconductor pattern covering the gate electrode, and a second transparent semiconductor pattern covering the optical sensing pattern. A source electrode and a drain electrode are formed on the first transparent semiconductor pattern. A modification process including introducing at least one gas is performed on the second transparent semiconductor pattern to transfer the second transparent semiconductor pattern into a conductive transparent top electrode.

Method of fabricating optical sensor device and thin film transistor device

A semiconductor device includes a substrate, a gate electrode, an insulating layer, a source electrode, a drain electrode, a semiconductor channel layer, a first passivation layer and a second passivation layer. The gate is formed on the substrate. The insulating layer covers the gate electrode. The source electrode and the drain electrode are positioned on the insulating layer. The semiconductor channel layer is disposed on the insulating layer, and connects the source electrode and the drain electrode. The first passivation layer covers the source electrode, the drain electrode and the semiconductor channel layer. The first passivation layer includes silicon oxide. The second passivation layer is disposed on the first passivation layer. The second passivation layer includes silicon nitride that has a hydrogen concentration of about 2.0&#xd7;10atom/cmto about 3.11&#xd7;10atom/cm.

Semiconductor device

A pixel structure and a manufacturing method thereof are provided. In the pixel structure, an electrode of a storage capacitor is formed when an active layer is formed, and the electrode and the active layer are made of the same material. The material of the electrode and the active layer can be an oxide semiconductor with high transmittance. Therefore, a stable display frame of the pixel structure can be provided by the storage capacitor, an aperture ratio of the pixel structure can be improved, and power consumption can be further reduced.

Pixel structure and manufacturing method thereof

An optical sensor, method of making the same, and a display panel having an optical sensor. The optical sensor includes a first electrode, a second electrode, a photosensitive silicon-rich dielectric layer, and a first interfacial silicon-rich dielectric layer. The photosensitive silicon-rich dielectric layer is disposed between the first and second electrodes. The first interfacial silicon-rich dielectric layer is disposed between the first electrode and the photosensitive silicon-rich dielectric layer.

Optical sensor, method of making the same, and display panel having optical sensor

A photosensor includes a metal conductive layer, an interface dielectric layer, a silicon-rich dielectric layer and a transparent conductive layer. The interface dielectric layer is formed on the metal conductive layer. The silicon-rich dielectric layer is formed on the interface dielectric layer. The transparent conductive layer is formed on the silicon-rich dielectric layer. A method for fabricating a photosensor is also disclosed herein.

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Hsinchu County, Taiwan

Shin-Shueh Chen