Hitachi High-tech Science Corporation

Shin Okawa

Yoshiki Matoba

Masahiro Sakuta

Disclosed is a mass analysis apparatus and method, wherein the precision of detection of a first material including a second material is improved, without enlarging the apparatus, and the measurement time is reduced. The mass analysis apparatus for analyzing a sample containing a first material including an organic compound and at least one second material including an organic compound and having a mass spectrum peak overlapping that of the first material includes a peak correction unit, wherein, when an intensity ratio (peak B)/(peak A) of peak A, not overlapping that of the first material, and peak B, overlapping that of the first material, is a correction coefficient (W), an intensity of a net peak D of the mass spectrum of the first material is calculated by subtracting W&#xd7;(intensity of peak A) from an intensity of a peak C of the mass spectrum of the first material in the sample.

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Tokyo, Japan

Shin Okawa