Panasonic Intellectual Property Management Co., Ltd.

Panasonic Corporation

Shin-Ichi Imai

Mari Onodera

Masaki Fujikane

Hironori Kumagai

Yoshihiro Sakaguchi

Satoshi Yasuda

A liquid treatment apparatus for treating water to be treated, according to the present disclosure, includes a treatment tank, a dielectric partition wall dividing inside of the treatment tank into a first space in which the water to be treated is injected, and a second space in which an electrolytic solution is filled, a first electrode at least part of which is arranged in the first space of the treatment tank, a second electrode at least part of which is arranged in the second space of the treatment tank, and a power supply that applies a high-frequency AC voltage between the first electrode and the second electrode.

Liquid treatment apparatus and liquid treatment method

A plasma generation device includes: a pair of electrodes that cause plasma to be generated in atmospheric pressure by a voltage being applied between the pair of electrodes; and a power source that includes a step-up transformer that has a coupling coefficient of 0.9 or greater and 0.9999 or less and generates the voltage.

Plasma generation device

A liquid treatment unit includes: a treatment tank provided with an inlet and an outlet, the treatment tank having a shape that allows a portion of liquid to be retained; a controller that controls supply of liquid into the treatment tank and ejection of liquid from the treatment tank; and a plasma generator generates plasma in the liquid inside the treatment tank. The plasma generator generates plasma while the controller stops supply of liquid and ejection of liquid. After the liquid has been treated, the controller resumes the supply of liquid, and causes the liquid to be ejected from the treatment tank while allowing a portion of the treated liquid to be retained inside the treatment tank.

Liquid treatment unit, toilet seat with washer, washing machine, and liquid treatment apparatus

The present disclosure provides a liquid treatment device and a liquid treatment method each capable of efficiently generating plasma and treating a liquid in a short time period. A liquid treatment device according to the present disclosure includes a first electrode, a second electrode disposed in a liquid, an insulator disposed surrounding the first electrode through a space, the insulator having an opening portion at a position in contact with the liquid, and a power supply that applies an AC voltage or a pulse voltage between the first electrode and the second electrode.

Liquid treatment device and liquid treatment method

A liquid treatment apparatus includes a dielectric tube through which water to be treated flows, a first electrode, at least one end of which is dispose in the dielectric tube, and a second electrode made of a conductive metallic material, at least one end of the second electrode being disposed in the dielectric tube and on an upstream side of a flow pass of the water relative to the first electrode. The conductive metallic material of the second electrode is adapted to be in direct contact with the water to be treated. The liquid treatment apparatus also includes a power supply for applying a voltage between the first electrode and the second electrode, and a heat-resistant member covering at least a portion of an inner wall face of the dielectric tube. The portion of the inner wall faces the first electrode.

Liquid treatment apparatus

A liquid treatment apparatus according to an aspect of the present disclosure comprises a reactor and a plasma generator. The reactor includes an inner wall, a first space, and a second space. Each of the first space and a second space is capable of containing a liquid. The liquid is suppressed to move between the first space and the second space. The inner wall allows ions or electrons to move between the first space and the second space. The plasma generator includes a first electrode at least partially located in the first space, a second electrode at least partially located in the second space, and a power supply that applies AC or pulse voltage between the first electrode and the second electrode. The plasma generator produces plasma in the liquid.

This disclosure of a liquid treatment device includes a first metal electrode having a part disposed in a reaction tank into which a water being treated is filled, a second metal electrode disposed in the reaction tank, an insulator having an opening portion disposed to surround the first metal electrode so that a closed space is formed. A bubble is generated from the closed space to the water being treated via the opening portion. The liquid treatment device also includes a gas supply device that supplies the space with a gas for generating the bubble, and a power supply that applies a voltage between the first metal electrode and the second metal electrode.

An elemental analysis apparatusincludes a treatment vesselof which at least a part is optically transparent, a first electrodecovered by insulator, a second electrode, a bubble-generating part which generates a bubble, a gas-supplying apparatuswhich supplies gas to the bubble-generating part in an amount necessary for generating the bubble, a power supplywhich applies voltage between the first electrodeand the second electrode, and an optical detection devicewhich determines an emission spectrum of plasma that is generated by application of the voltage, and the apparatus conducts qualitatively or quantitatively analysis of a component contained in the liquidbased on the emission spectrum determined by the optical detection device

Apparatus for analyzing elements in liquid with controlled amount of gas supply for plasma generation

A plasma generation apparatus includes a flow path tube through which a liquid flows and which includes a concave portion and/or a convex portion on an internal wall surface thereof, a liquid feed device, a first electrode, a second electrode, a power source, and a control circuit which controls the liquid feed device and the power source. The concave portion and/or the convex portion causes, when the liquid flows therethrough, a pressure difference to be generated between at least part of the inside of the flow path tube and the external space, allowing a gas to be introduced into the liquid from the external space through a gas introduction path. The power source applies a predetermined voltage between the first electrode and the second electrode in a state in which a bubble containing the gas is generated in the liquid.

Plasma generation apparatus

A liquid treatment apparatus includes a dielectric tube through which water to be treated flows, a first electrode at least a part of which is disposed in the dielectric tube, a second electrode at least a part of which is disposed in the dielectric tube at a position upstream of the first electrode, a gas supplier operative to generate a bubble by supplying a gas into the water to be treated, and a power supply operative to apply a voltage between the first electrode and the second electrode in a state in which the bubble covers a conductor-exposed portion of the first electrode.

A liquid treatment apparatus according to the present disclosure includes a dielectric tube that defines a channel through which water to be treated flows, the channel being split upstream of the dielectric tube into a first channel and a second channel, the first channel and the second channel being merged with each other downstream of the dielectric tube, a first electrode at least partially disposed within the first channel, a second electrode at least partially disposed within the first channel, a first gas-supply unit that supplies gas to form a gas bubble into water to be treated that flows through the first channel, and a first power-supply that applies a voltage between the first electrode and the second electrode.

The present disclosure provides a liquid treatment device, a liquid treatment method, and a plasma treatment liquid each capable of efficiently generating plasma and treating a liquid in a short time period. A liquid treatment device according to the present disclosure includes a first electrode, a second electrode disposed in a liquid to be treated, an insulator disposed around the first electrode with a space between the first electrode and the insulator, the insulator has an opening portion in a position in contact with the liquid to be treated, a power supply that applies voltage between the first electrode and the second electrode, and a supply device supplying a liquid to the space before the power source applies the voltage.

Liquid treatment device, liquid treatment method, and plasma treatment liquid

The plasma-generating apparatus includes a treatment vesselcontaining to-be-treated water, a first electrodeand a second electrodewithin the treatment vessel, a bubble-generating part which generate a bubblesuch that a surface where conductor of the first electrodeis exposed to the to-be-treated water is positioned within the bubble, a gas-supplying apparatuswhich supplies gas to the bubble-generating part, a pulsed power supplyconnected to the first and the second electrodesand, a control apparatuswhich controls one or both of the gas-supplying apparatus and the power supply such that the voltage is applied between the first and the second electrodesandwhen at least surface where the conductor of the first electrodeis exposed is positioned within the bubble.

Plasma generating apparatus and plasma generating method

The present invention provides a method for quantitative determination of oxidant which method is capable of accurately and rapidly performing quantitative determination of oxidant at low cost, and an apparatus for quantitative determination of oxidant used in the method. The method for quantitative determination of oxidant according to the present invention is a method for quantitative determination of oxidant performing quantitative determination of oxidant in a sample using a redox reaction, the method including: adding one kind of reducing agent to a sample solution containing one or a plurality of kinds of oxidants having different lifetimes; producing an absorbance curve by measuring a time change in absorbance of the post-color-change or post-coloring reducing agent; and performing the quantitative determination of the oxidant while identifying the oxidant in the sample solution based on the obtained absorbance curve.

Method for quantitative determination of oxidant and apparatus for quantitative determination of oxidant

In the bevel etching apparatus relating to the present invention, a substrate is inserted between electrically connected electrodes. A high-frequency power source is connected to the electrodes, and ground potential is applied to a support unit that supports the substrate. Gas (atmosphere) is supplied to the gap between the electrodes and the application of the high-frequency electric power to the electrodes causes the generation of atmospheric-pressure glow discharge between the electrode and the substrate. Bevel etching is performed by rotating the substrate along the circumferential direction in this condition. According to this construction, the bevel etching can be simultaneously performed to the front surface, the rear surface and the side of the substrate without causing any configuration change in the substrate.

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Osaka, Japan

Shin-Ichi Imai