Boe Technology Group Co., Ltd.

Hefei Xinsheng Optoelectronics Technology Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Shikai Wang

Jaeyun Jung

Dongseob Kim

Yadong Liang

Dengtao Li

Jun Geng

Mingming Wang

Qianqian Li

Yadong Xu

Liangliang Li

Zhi Hou

Jianwei Wang

Huadong Wang

Jaemoon Chung

Jae Yun Jung

Jianming Jiang

Hao Yin

Bozhu Zhou

Daeyoung Choi

Xiaoning Liu

Yubao Zi

Shengrong Li

Xuanqi Liang

Zhongren Jiang

Shiwei Lv

Dae Oh Oh

Dalin Xu

Keunbum Lee

Fugang Zhang

Daiwu Wu

Disclosed is a liquid chemical vapor recovery device, a wet stripping device, a photoresist stripping process and a method for manufacturing a thin film transistor-liquid crystal display using the same. The liquid chemical vapor recovery device comprises: an exhaust pipe for discharging a gas in a processing chamber for wet processing with a liquid chemical, the gas comprising a vapor of the liquid chemical; and a reflux pipe for refluxing the liquid chemical condensed in the exhaust pipe to a liquid chemical storage tank, the reflux pipe having an inlet connected to the exhaust pipe and an outlet connected to the liquid chemical storage tank, wherein, at least a part of the exhaust pipe positioned upstream of the inlet of the reflux pipe is formed as a pipe segment with a rugged inner surface.

Liquid chemical vapor recovery device, wet stripping device, photoresist stripping process, and method for manufacturing thin film transistor-liquid crystal display using the same

The present disclosure provides a wet etching machine and an etching method. The wet etching machine including an etching chamber in which at least two etching layers are disposed. The etching layers are successively overlapped with each other from up to down, and each etching layer includes a first transfer carrier for receiving and transferring a substrate to be etched and a spraying apparatus disposed right above the first transfer carrier for spraying etching solution. When the total etching time is needed to be longer than the transfer time of the substrate without stopping the substrate, the present disclosure can solve the problems in the prior art of causing the takt time decreased due to the stopping time of the substrate is required to be increased or causing the area of the facility increased due to the number of the etching chambers connected in series is required to be increased.

Wet etching machine and etching method using the same

A liquid knife cleaning device is provided, and it includes a splash shield; a liquid knife, which is located under the splash shield; an oblique baffle, which is located between the splash shield and the liquid knife, and a lower side of which is fixedly bonded to the top of a blade of the liquid knife. The oblique baffle can act to isolate the liquid knife and the substrate on the delivery roll from a majority of water vapor, and droplets dripping on the oblique baffle can flow down along a slope of the oblique baffle, and will not drip on the substrate that has not been rinsed by the liquid knife. Effects of droplets on the uniformity of the substrate can be greatly reduced by the present technique, thereby enhancing the product quality.

Liquid knife cleaning device

The present disclosure relates to the technical field of glass substrate cleaning. Specifically, the present disclosure provides a glass substrate detergent tank which can solve the technical problem of wasting detergent solution. The detergent tank includes a tank body enclosed by a top face, a bottom face and side faces. There are a water inlet, a water outlet and a vent hole in tank body. There is a partition plate disposed between two facing inside faces of the tank body, which separate the tank body into two cavities communicating at the bottom. The detergent tank according to the embodiment of the present disclosure will not let froth discharge outside the tank body with gas, and thus can reduce the amount of wasted detergent solution, thereby extending the usage time of the detergent solution.

Glass substrate detergent tank and cleaning device

The present invention provides an array substrate, a method for manufacturing the same and a display device, and relates to technical field of displays. The method for manufacturing an array substrate comprises forming a metal layer on a substrate and removing superficial metallic oxide on the metal layer by a washing process. The method for manufacturing an array substrate according to the present inversion can remove the superficial metal oxide on the metal layer and improve the performance of a TFT.

Array substrate, method for manufacturing the same and display device

The present invention provides a liquid crystal display device, comprising: a light source, a light guide plate having a light-exiting surface, a substrate having a first surface and a second surface opposite to the first surface, a display area of the second surface comprising a pixel area and at least one non-pixel area, and a gap provided between the light-exiting surface of the light guide plate and the first surface of the substrate, wherein, at least one slot is provided on the light-exiting surface of the light guide plate; a part of the light generated by the light source and entering the light-exiting surface of the light guide plate, after being refracted by the slot and the gap sequentially, is refracted by the first surface of the substrate into the substrate, and then enters the pixel area. According to the present invention, it is able to change the light transmission path, thereby to effectively reduce the light entering a non-pixel area.

Liquid crystal display device

The present invention provides a method for manufacturing an array substrate, wherein each data line in a plurality of data line groups forms an integral structure with a first shorting bar, and after etching a source-drain component to form a source electrode and a drain electrode, the data line groups which do not correspond to the first shorting bar is disconnected from the first shorting bar. By adopting the method provided by the present invention, electrostatic breakdown in the manufacturing process of the array substrate can be reduced.

Method for manufacturing array substrate

The embodiment of the invention discloses a liquid crystal display and a method of manufacturing the same. The liquid crystal display of the embodiment of the invention comprises an array substrate, a color filter substrate and a liquid crystal layer formed between the array substrate and the color filter substrate. The array substrate comprises a first substrate; a black matrix formed on the first substrate; and a thin film transistor (TFT) device formed on the black matrix. The TFT device is a top gate TFT device having a gate electrode formed on a side of the TFT device facing away the black matrix and an active layer made of a-Si. The color filter substrate comprises a second substrate; and a color filter layer formed on the second substrate. The color filter substrate does not include a black matrix.

Liquid crystal display device in which array substrate includes black matrix and method of manufacturing the same

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Beijing, China

Shikai Wang