Chroma Ate Inc.

Shih-Yao Pan

Chia-Hung Lin

Yu-Yen Wang

Lan-Sheng Yang

Tsung-Hsien Ou

Kuo-Wei Huang

Hsiu-Wei Kuo

Hsin-Yueh Sung

Shao-En Chung

Cheng-Ting Tsai

Yu-Hsuan Lin

Shih-Min Hsu

Alvin Chang

Hung-Ta Chien

Yi-Chang Chiu

Hsin-Yun Chang

Chih-Yao Ting

Hung-Tien Kao

Hong-Yau Mong

Yu-Shuan Lin

An automated optical measurement system and method for a near eye display are provided. A controller first controls the near eye display to display a specific pattern, then controls a displacement generation module to drive an image sensing module toward or away from an imaging module, and controls the image sensing module to capture the specific pattern to obtain focus images; and the controller performs focusing according to the focus images. Finally, the controller measures an optical characteristic of the near eye display. Accordingly, the focusing method used is to capture the specific pattern displayed by the near eye display while moving the image sensing module, and perform automatic focusing by comparing the capture results.

Automated optical measurement system and method for near eye display

The present invention discloses an optical detection apparatus for defining a detection surface on a carrier unit for a wafer in a semiconductor manufacturing process so as to obtain a corresponding detection image, wherein a vertical movement path for another device to move is defined above the carrier unit. The optical detection apparatus includes a support, and an imaging device disposed on the support and configured to be non-interfering with the movement path. The imaging device includes a lens group, an image capturing portion and a moving base. With the moving base, the photosensitive element of the image capturing portion is allowed to move horizontally relative to the lens group, and the imaging position can be adjusted, preventing image deformation or a reduced resolution easily caused by capturing at an oblique angle. Thus, the optical detection apparatus resolves complications of additionally mounting an optical detection apparatus in an optical detection environment within a narrow space.

Optical inspection apparatus in semiconductor process system

Herein disclosed are a surface topography measuring system and a method thereof. The method comprises the following steps: dividing a test beam into a first sub-beam, entering a reflecting mirror along a first axis, and a second sub-beam, entering an object surface along a second axis; moving the reflecting mirror for reflecting the first sub-beam at different positions on the first axis to generate N reflected beams; generating an object reflected beam, related to the second sub-beam, reflected from the object surface; generating N images, related to the N reflected beams and the object reflected beam, and each of the N images having a plurality of interference fringes; analyzing the interference fringes in each of the N images to calculate N curve formulas; calculating a surface topography of the object surface from the N curve formulas.

System and method of measuring surface topography

A separate microscopy system, applied to observe a specimen positioned on a stage and further to image the specimen on an imaging device, includes an ocular-lens unit, an adjustment unit and an objective-lens unit. The ocular-lens unit has an ocular-lens optical axis, and is manipulated to make the ocular-lens optical axis perpendicular to the stage. The adjustment unit is assembled to a side of the ocular-lens unit close to the stage. The objective-lens unit has an objective-lens optical axis, and is assembled to a side of the adjustment unit close to the stage. The objective-lens unit is manipulated to be adjusted by the adjustment unit to make the ocular-lens optical axis, the objective-lens optical axis and the imaging device co-axially and perpendicular to the stage, such that the specimen can be imaged at an imaging center position of the imaging device. In addition, an adjusting method thereof is also provided.

Separate microscopy system and adjusting method thereof

A surface measurement system is configured to measure a sample with a low reflectivity surface. The surface measurement system includes a condensation device and a measurement device. The condensation device is configured to form a liquid layer on the surface of the sample. The condensation device includes a chamber, a temperature controlling gas source, and a humidification gas source. The chamber is configured to accommodate the sample. The temperature controlling gas source is connected to the chamber to provide temperature controlling gases to the chamber, so as to control the temperature of the sample. The humidification gas source is connected to the chamber to provide water vapor to the chamber, so as to form the liquid layer on the surface of the sample. The measurement device includes a plate, a light source, and an image capturing device.

Surface measurement system

An imaging apparatus includes a light source; a first beam splitter for reflecting a projection beam emitted by the light source; an objective lens unit including a reflection reference surface for reproducing the projection beam into a measurement beam projected onto an object to generate a first reflection beam and a reference beam projected onto the reflection reference surface to generate a second reflection beam mixing with the first reflection beam and passing through the first splitter and forming an operating beam; a second beam splitter for modulating the operating beam into first and second sub-beams; a monochrome image detection device for passage of the first sub-beam to obtain an interferometric image with monochrome from a first interference region; and an image detection device for permitting passage of the second sub-beam in order to obtain a non-interferometric image from a second interference region.

Imaging apparatus and method thereof

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Tao-Yuan Hsien, Taiwan

Shih-Yao Pan