Taiwan Semiconductor Manufacturing Comp. Ltd.

Shih-Peng Tai

Chi-Hsi Wu

Chen-Hua Douglas Yu

Der-Chyang Yeh

An-Jhih Su

Tzu-Shiun Sheu

Hsien-Wei Chen

Shin-Puu Jeng

Hung-Jui Kuo

Tsung-Shu Lin

Yu-Hung Lin

Wei-Ming Wang

Shih-Hui Wang

I-Chia Chen

Yi-Chung Huang

Wen-Chih Chiou

Chih-Wei Lin

Ching-Hua Hsieh

Wei-Cheng Wu

Yu-Hsiang Hu

Kuo-Chung Yee

Po-Han Wang

Yu-Wei Lin

Hsiang-Fan Lee

Tang-Jung Chiu

Tzu-Ting Chou

Chun-Yen Lan

Ying-Ju Chen

Ming-Tan Lee

Ting-Yang Yu

Chun-Yi Liu

Yu-Hsiao Lin

Chuen-De Wang

A semiconductor package and a manufacturing method thereof are provided. The semiconductor package includes a substrate, a semiconductor die, a semiconductor frame structure, a semiconductor cover structure and conductive balls. The substrate has a ground plate embedded therein. The semiconductor die is disposed on the substrate and electrically connected with the substrate. The semiconductor frame structure is disposed on the substrate and surrounds the semiconductor die. The semiconductor frame structure includes conductive through semiconductor vias (TSVs) penetrating through the semiconductor frame structure, and at least one conductive TSV is electrically connected with the ground plate. The semiconductor cover structure is disposed on the semiconductor frame structure and on the semiconductor die. The semiconductor cover structure includes a conductive grid pattern and the conductive grid pattern contacts the conductive TSVs. The conductive balls are disposed on the substrate and electrically connected with the semiconductor die through the substrate.

Semiconductor package and manufacturing method thereof

A semiconductor structure includes a dielectric layer, a conductive pad embedded in the dielectric layer, a semiconductor substrate disposed on the dielectric layer and including a via opening with a notch in proximity to the dielectric layer, a through substrate via (TSV) disposed in the via opening of the semiconductor substrate and extending into the dielectric layer to land on the conductive pad, and a dielectric liner disposed in the via opening of the semiconductor substrate and filling the notch to laterally separate the TSV from the semiconductor substrate. A surface of the dielectric liner facing the TSV is substantially leveled with an inner sidewall of the dielectric layer facing the TSV.

Semiconductor structure having through substrate via and manufacturing method thereof

A semiconductor package including a plurality of semiconductor devices, an insulating layer, and a redistribution layer is provided. The insulating layer is disposed over the semiconductor device. The redistribution layer is disposed over the insulating layer and electrically connected to the semiconductor device. The redistribution layer includes a conductive line portion. The semiconductor package has a stitching zone, and the insulating layer has a ridge structure on a surface away from the semiconductor device and positioned within the stitching zone.

Semiconductor package and method for manufacturing the same

A semiconductor device includes an integrated circuit structure and a thermal pillar over the integrated circuit structure. The integrated circuit structure includes a semiconductor substrate including circuitry, a dielectric layer over the semiconductor substrate, an interconnect structure over the dielectric layer, and a first thermal fin extending through the semiconductor substrate, the dielectric layer, and the interconnect structure. The first thermal fin is electrically isolated from the circuitry. The thermal pillar is thermally coupled to the first thermal fin.

Thermal structure for semiconductor device and method of forming the same

A semiconductor device includes a circuit substrate, a semiconductor package, and a package frame. The semiconductor package is disposed on the circuit substrate. The package frame is disposed over the circuit substrate. The package frame encircles the semiconductor package. The semiconductor package has a first surface facing the circuit substrate and a second surface opposite to the first surface. The package frame leaves exposed at least a portion of the second surface of the semiconductor package. The package frame forms a cavity, which cavity encircles the semiconductor package.

Semiconductor device and manufacturing method thereof

A package structure includes a semiconductor device and an adhesive pattern. The adhesive pattern surrounds the semiconductor device, wherein an angle θ is formed between a sidewall of the semiconductor device and a sidewall of the adhesive pattern, 0°<θ<90° wherein the adhesive layer has a first opening misaligned with a corner of the semiconductor device closest to the first opening.

Package structure

A package structure includes a substrate, a semiconductor device and an adhesive layer. The semiconductor device is disposed on the substrate, wherein an angle &#x3b8; is formed between one sidewall of the semiconductor device and one of sides of the substrate, 0&#xb0;&#x3c;&#x3b8;&#x3c;90&#xb0;. The adhesive layer surrounds the semiconductor device on the substrate and at least continuously disposed at two of the sides of the substrate, wherein the adhesive layer has a first opening misaligned with a corner of the semiconductor device closest to the first opening.

A package structure including a substrate, a semiconductor device, a heat spreader, and an adhesive layer is provided. The semiconductor device is bonded onto the substrate, wherein an angle &#x3b8; is formed between one sidewall of the semiconductor device and one sidewall of the substrate, 0&#xb0;&#x3c;&#x3b8;&#x3c;90&#xb0;. The heat spreader is disposed over the substrate, wherein the semiconductor device is disposed between the heat spreader and the substrate. The adhesive layer is surrounding the semiconductor device and attaching the heat spreader onto the substrate, wherein the adhesive layer has a first opening misaligned with one of corners of the semiconductor device closest to the first opening.

Package structure and manufacturing method thereof

A device includes a molding compound encapsulating a first integrated circuit die and a second integrated circuit die; a dielectric layer over the molding compound, the first integrated circuit die, and the second integrated circuit die; and a metallization pattern over the dielectric layer and electrically connecting the first integrated circuit die to the second integrated circuit die. The metallization pattern comprises a plurality of conductive lines. Each of the plurality of conductive lines extends continuously from a first region of the metallization pattern through a second region of the metallization pattern to a third region of the metallization pattern; and has a same type of manufacturing anomaly in the second region of the metallization pattern.

Lithography process for semiconductor packaging and structures resulting therefrom

A method includes mounting a wafer-level package substrate over a carrier, and pre-cutting the wafer-level package substrate to form trenches extending from a top surface of the wafer-level package substrate into the wafer-level package substrate. A plurality of dies is bonded over the wafer-level package substrate. The plurality of dies is molded in a molding material to form a wafer-level package, with the wafer-level package including the wafer-level package substrate, the plurality of dies, and the molding material. The carrier is detached from the wafer-level package. The wafer-level package is sawed into a plurality of packages, with each of the plurality of packages including a portion of the wafer-level package substrate and one of the plurality of dies.

Chip-on-substrate packaging on carrier

A method includes forming an alignment pattern over an insulating layer formed over a carrier. A die is mounted over the carrier and encapsulated. Connectors are formed and the structure is attached to a debond tape. The carrier is removed. A cutting device is aligned to a backside of the insulating layer using the alignment pattern. The first insulating layer and encapsulant are cut from the backside of the insulating layer. Another method includes scanning a backside of a packages structure for an alignment pattern in a first package area of the packages structure. A cutting device is aligned to a cut-line in a non-package area of the packages structure based on the alignment pattern and packages are singulated. An InFO package includes an insulating layer on the backside, the insulating layer having a laser marking thereon. The InFO package also includes an alignment pattern proximate to the insulating layer.

Alignment pattern for package singulation

Semiconductor device, multi-die packages, and methods of manufacture thereof are described. In an embodiment, a semiconductor device may include: first conductive pillars and second conductive pillars respectively aligned to a first row of first pins and a second row of second pins of a first die, the first pins and the second pins differing in function; a first insulating layer covering surfaces of the first conductive pillars and the second conductive pillars facing away from the first die; first pads disposed on a surface of the first insulating layer facing away from the first die, the first pads substantially aligned to the first conductive pillars; and first traces coupled to the first pads, the first traces extending over a portion of the first insulating layer covering the second conductive pillars.

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Xinpu, Taiwan

Shih-Peng Tai