Motorola Corporation

Shih K Cheng

Marius K Orlowski

James H Carlquist

Kenneth J Long

Edward C Dasse

Thomas R Yarbrough

Robert W Bollish

Kelvin L Holub

Charles F Toewe

Marcus R Burton

Walid S Ballouli

Alfredo Figueroa

David Q Ngo

Han-Bin K Liang

Jun Ma

Edward T Spears

Bruce R Yeung

A monolithic integrated circuit die (10) is fabricated to include unilateral FETs (113, 114, 115), RF passive devices such as a double polysilicon capacitor (57), a polysilicon resistor (58), and an inductor (155), and an ESD protection device (160). A first P.sup.+ sinker (28) provides signal isolation between two FETs (113, 115) separated by the first sinker (28) and is coupled to a source region (86) of a power FET (115) via a self-aligned titanium silicide structure (96). A second P.sup.+ sinker (29) is coupled to a bottom plate (44) of the double polysilicon capacitor (57). A third P+ sinker (178) is coupled to a source region (168) of the ESD protection device (160) via another titanium silicide structure (174).

Monolithic RF mixed signal IC with power amplification

Wafer level testing of a wafer (500) is accomplished by dividing the integrated circuits of the wafer into a plurality of segmented bus regions (514, 516, and 518 for example). Each bus region is formed having its own set of test conductors (520-530) wherein each set of test conductors are isolated from all other sets of test conductors on the wafer. Each test conductor has at least one contact pad (531-546) where each contact pad lies within a periphery of the integrated circuits' active areas. By forming pads over ICs and by sub-dividing the bus structure of test conductive lines, more high powered ICs can be tested in a wafer-level manner with fewer problems associated with speed, power, throughput, and routing problems.

Apparatus for performing wafer-level testing of integrated circuits

Insulated gate semiconductor device (10) and a method of manufacturing the insulated gate semiconductor device (10). The insulated gate semiconductor device (10) includes an N-channel transistor (15) and a P-channel transistor (16). The N-channel transistor (15) has a gate electrode (35) that has a central portion (28) and two adjacent gate extensions (49, 52). Likewise the P-channel transistor (16) has a gate electrode (35') which has a central portion (29) and two adjacent gate extensions (53, 54). The gate extensions (49, 52, 53, 54) allow the formation of graded channel regions underneath the gate electrodes (35, 35') and adjacent to the source (57, 59) and drain (58, 62) regions by offsetting an LDD or a single heavily doped source/drain implant from channel regions which are covered by the gate extensions (49, 52 53, 54).

Method for manufacturing an insulated gate semiconductor device

Insulated gate semiconductor device (10) and a method of manufacturing the insulated gate semiconductor device (10). The insulated gate semiconductor device (10) includes an N-channel transistor (55) and a P-channel transistor (60). The N-channel transistor (55) has a gate electrode (22') that has a central portion (22) and gate electrode extensions (41) adjacent to the central portion (22). Likewise the P-channel transistor (60) has a gate electrode (24') that has a central portion (24) and gate electrode extensions (42) adjacent to the central portion (24). The gate electrode extensions (41, 42) are formed by filling openings (34, 36) with a gate electrode material. The openings are used for the formation of graded channel regions underneath the gate electrode extensions (41, 42).

Method of manufacturing graded channels underneath the gate electrode

A semiconductor wafer (20) having integrated circuit dice (22), wafer conductors (42-47, 50-53), and wafer contact pads (38) formed thereon. The wafer conductors (42-47, 50-53) are used to transfer electrical signals to and from the integrated circuit dice (22) on semiconductor wafer (20) so that wafer level testing and burn-in can be performed on the integrated circuit dice (22). In accordance with one embodiment of the present, each wafer conductor (45, 52) is electrically coupled to the same bonding pad (78) on each integrated circuit dice (22). Each wafer conductor (42-47, 50-53) includes at least a portion of conductor (42-47) which overlies the upper surface of at least one integrated circuit dice (22).

Method and apparatus for performing wafer level testing of integrated

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Scottsdale, AZ, United States of America

Shih K Cheng