National Science Council

Shih-Hciung Chan

Chun-Yen Chang

Wei-Chi Lai

Jian-Shihn Tsang

Jan-Dar Guo

An epitaxial system is provided for performing an epitaxial growth of IIIA-VA compound on the wafer substrate. The epitaxial system includes a first reaction region for providing a plasma of a first reactant, a second reaction region for epitaxially reacting the plasma of the first reactant with a second reactant on a wafer, and a guiding medium disposed between the first reaction region and the second reaction region for passing therethrough the second reactant and the first reactant plasma to the second reaction region.

Growing community of inventors

Hsinchu, Taiwan

Shih-Hciung Chan