Asml Netherlands B.v.

Shih-Chin Liu

Alexander Ypma

Boris Menchtchikov

Hakki Ergün Cekli

Peter Ten Berge

Michael James Lercel

Chenxi Lin

Simon Hendrik Celine Van Gorp

Cyrus Emil Tabery

Simon Philip Spencer Hastings

Dag Sonntag

Ruben Alvarez Sanchez

Pierre-Yves Jerome Yvan Guittet

Christiaan Theodoor De Ruiter

Wei Duan

A method and associated computer program for predicting an electrical characteristic of a substrate subject to a process. The method includes determining a sensitivity of the electrical characteristic to a process characteristic, based on analysis of electrical metrology data including electrical characteristic measurements from previously processed substrates and of process metrology data including measurements of at least one parameter related to the process characteristic measured from the previously processed substrates; obtaining process metrology data related to the substrate describing the at least one parameter; and predicting the electrical characteristic of the substrate based on the sensitivity and the process metrology data.

Method to predict yield of a device manufacturing process

Growing community of inventors

Eindhoven, Netherlands

Shih-Chin Liu