Seiko Instruments Inc

Shigeyuki Tsunoda

Kenji Kitamura

Koju Nonaka

The semiconductor device contains a CMOS transistor pair comprised of a P channel MOS transistor having a polysilicon gate 4 and an N channel MOS transistor having a polysilicon gate. The MOS transistor has a channel dope layer 5 localized in a vicinity of a surface of a channel region just below a gate electrode. This channel dope layer 5 has a quite shallow p-n junction depth xj effective to suppress a leak current. Thereby, an amount of impurity concentration in the surface of the channel region can be reduced to improve a subthreshold characteristics of the MOS transistor and to enable a low voltage and high speed operation under suppressing a leakage current.

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Tokyo, Japan

Shigeyuki Tsunoda