Hitachi, Ltd.

Hitachi Chemical Company, Ltd.

Hitachi Service Engineering Co., Ltd.

Service Engineering Co. Ltd.

Shigeru Takahashi

Yutaka Kobayashi

Atsushi Hiraishi

Koichiro Ishibashi

Shuji Ikeda

Toshiaki Yamanaka

Satoshi Meguro

Naotaka Hashimoto

Atsuyoshi Koike

Nobuyuki Moriwaki

Seigou Yukutake

Katsuro Sasaki

Soichiro Hashiba

Isamu Kuramoto

Masahiro Iwamura

Tatsumi Yamauchi

Takashi Akioka

Yuji Yokoyama

Akira Ide

Takuya Fukuda

Naohiro Momma

Nobuyuki Gotou

Noriaki Oka

Tadayasu Miki

Shigeo Ogasawara

Mitsuaki Katagiri

Atsushi Hiraiwa

Hideaki Uchida

Tadasi Sonobe

Kazuo Suzuki

Michio Ohue

Yasuhiro Mochizuki

Noboru Suzuki

Toshiya Satoh

Keizo Suzuki

Yuichi Satsu

Sadayuki Okudaira

Toshio Miyamoto

Satoru Ito

Ken Ninomiya

Shigeru Nishimatsu

Yutaka Misawa

Seikichi Tanno

Kunio Miyazaki

Kiichiro Mukai

Ryuji Watanabe

Yoshiyuki Tsuru

Seiki Harada

Osamu Miura

Katsuhisa Usami

Shin-ichi Muramatsu

Yukio Ookoshi

Seiichi Iwata

Kiyoshi Chiba

Koichi Motohashi

Takeo Yoshimi

Masahito Hiroshima

Kiyosi Chiba

First through holes of a relatively small diameter and second through holes of a relatively great diameter are formed in proper shapes by separate processes, respectively, in a first layer insulating film. The second through holes are tapered toward a layer underlying the first layer insulating film. First, the first through holes are formed in the first layer insulating film, the first through holes are filled up with plug electrodes, and the second through holes are formed in the first layer insulating film. When filling up the first and the second through holes formed in the first layer insulating film with plug electrodes, a first conductive film deposited over the first layer insulating film is etched back to fill up the first through holes with the plug electrodes, and then etch back residues remaining on the side walls of the second through holes are removed.

Method of manufacturing through holes in a semiconductor device

A semiconductor integrated circuit having three or more layers of wiring is provided with a plurality of lines of bonding pads arranged along the outer peripheral portion of a semiconductor chip. The bonding pads on the inner line side and those on the outer line side are arranged in a zigzag manner. First outgoing wiring for electrically connecting the bonding pads on the inner line side and internal circuits (input/output buffer circuits) is formed in one layer of wiring or a plurality of layers of wiring including at least the uppermost layer of wiring, and second outgoing wiring for electrically connecting the bonding pads on the outer line side and the internal circuits (the input/output buffer circuits) is formed in a plurality of layers of wiring other than the layer in which the first outgoing wiring is formed. Further, the first outgoing wiring and the second outgoing wiring are formed in different layers of wiring and at least one of the outgoing wiring films is formed of a plurality of layers of wiring.

Semiconductor integrated circuit

Herein disclosed is a semiconductor integrated circuit device comprising a SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs. The gate electrodes of the drive MISFETs and the gate electrodes of the transfer MISFETs of the memory cell, and the word lines are individually formed of different conductive layers. The drive MISFETs and the transfer MISFETs are individually arranged to cross each other in the gate length direction. The word lines are extended in the gate length direction of the gate electrodes of the drive MISFETs and caused to cross the gate electrodes of the drive MISFETs partially. The two transfer MISFETs of the memory cell have their individual gate electrodes connected with two respective word lines spaced from each other and extended in an identical direction. The region defined by the two word lines is arranged therein with the two drive MISFETs and the source lines. The source line is formed of a conductive layer identical to that of the word line. The individual data lines of the complementary data line are formed of an identical conductive layer which is different from that of the word line and the source line. The identical conductive layer between the word line and source line and the complementary data line is formed with two word lines: a main word line extended in the first direction identical to that of the word line and source line and used by adopting the divided word line system: and a sub-word line used by adopting the double word line system.

SRAM having load transistor formed above driver transistor

A semiconductor device is provided which comprises a memory mat formed by dividing a memory into a plurality of blocks and a circuit arrangement disposed at every memory mat block for generating access suppression signals at least for defective memory cells within that block. Using this arrangement, the access speed to a redundant memory cell array for relieving the defects is increased so that a semiconductor memory device capable of a high speed operation is obtained.

Semiconductor memory device having a redundancy capability

Semiconductor integrated circuit device and process for fabricating the

Herein disclosed is a semiconductor integrated circuit device comprising an SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs, and a method of forming this device. The gate electrodes of the drive MISFETs and of the transfer MISFETs of the memory cell, and the word lines, are individually formed of different conductive layers. The two transfer MISFETs of the memory cell have their individual gate electrodes connected with two respective word lines spaced from each other and extended in an identical direction. The source line is formed of a conductive layer identical to that of the word line. An oxidation resisting film is formed on the gate electrodes of the drive MISFETs so as to reduce stress caused by oxidization of edge portions of these gate electrodes, and to reduce a resulting leakage current. A thickness of an oxide film formed on gate electrodes of the transfer MISFETs and word lines is thicker than an oxide film formed on gate electrodes of the drive MISFETs, so that data line pads can be formed in self-alignment with the oxide film and side wall spacers on the gate electrodes of the transfer MISFETs.

Process for fabricating a semiconductor integrated circuit device

A method is provided for manufacturing a semiconductor integrated circuit device which includes a capacitor element having a first electrode, a second electrode, and a dielectric film formed between said first electrode and said second electrode. In particular, the method includes the step of forming at least one of the first electrode and second electrode with a polycrystalline silicon film which is deposited over a semiconductor substrate by a CVD method and which is doped with an impurity during said deposition to decrease the resistance of the polycrystalline silicon film. The capacitor element formed by this method is particularly useful for memory cells of static random access memory devices.

An arrangement which is particularly effective for decoders in semiconductor memory circuits which use, for example, common NMOS to receive one input for a plurality of logic decoder gates is provided includes a plurality of logic gates each having a first input terminal for respectively receiving first input signals and each being coupled to a common node. In one embodiment, first and second switching elements are also coupled to the common node. The first and second switching elements are both coupled to a second input terminal for receiving a second input signal which is common to the plurality of logic gates, and both operate complementary to one another in response to the second input signal. An improved read/write arrangement is also provided for such semiconductor memory circuit which includes circuitry to prevent connection of a common read line to the data lines during the writing operation. This enhances the writing speed by removing the load of the common read line during writing.

Semiconductor integrated circuit having logi gates

Herein disclosed is a semiconductor integrated circuit device comprising a SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs. The gate electrodes of the drive MISFETs and the gate electrodes of the transfer MISFETs of the memory cell, and the word lines are individually formed of different conductive layers. The drive MISFETs and the transfer MISFETs are individually arranged to cross each other in the gate length direction. The word lines are extended in the gate length direction of the gate electrodes of the drive MISFETs and caused to cross the gate electrodes of the drive MISFETs partially. The two transfer MISFETs of the memory cell have their individual gate electrodes connected-with two respective word lines spaced from each other and extended in an identical direction. The region defined by the two word lines is arranged therein with the two drive MISFETs and the source lines.

Herein disclosed is a semiconductor integrated circuit device comprising a SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs. The gate electrodes of the drive MISFETs and the gate electrodes of the transfer MISFETs of the memory cell, and the word lines are individually formed of different conductive layers. The drive MISFETs and the transfer MISFETs are individually arranged to cross each other in the gate length direction. The word lines are extended in the gate length direction of the gate electrodes of the drive MISFETs and caused to cross the gate electrodes of the drive MISFETs partially.

An arrangement which is particularly effective for decoders in semiconductor memory circuits which use, for example, common NMOS to receive one input for a plurality of logic decoder gates is provided includes a plurality of logic gates each having a first input terminal for respectively receiving first input signals, and each being coupled to a common node. In one embodiment, first and second switching elements are also coupled to the common node. The first and second switching elements are both coupled to a second input terminal for receiving a second input signal which is common to the plurality of logic gates, and both operate complementary to one another in response to the second input signal. An improved read/write arrangement is also provided for such semiconductor memory circuits which includes circuitry to prevent connection of a common read line to the data lines during the writing operation. This enhances the writing speed by removing the load of the common read line during writing.

Semiconductor integrated circuit having logic gates

An improved buffer circuit arrangement is provided which is particularly useful for semiconductor integrated circuit semiconductor memories and microprocessors. The buffer circuit is capable of switching large loads in various types of LSIs, and features a low noise and high speed circuit operation. This is accomplished by a parallel connection of output transistors in an output buffer circuit, and by differentiating the starting time of operation between the output transistors connected in parallel without using a delay circuit. For example, differentiating the starting times can be achieved by either providing the transistors with different characteristics from one another or the driving circuits with different characteristics from one another. Another aspect of the circuit is the provision of a two-level preset arrangement which presets the output node of the circuit to predetermined values before the input signals are applied.

Microprocessor having high speed, low noise output buffers

A plasma treatment apparatus for forming a thin film on a substrate in a vacuum vessel includes a magnetic field generator which can be positioned inside or outside the vacuum vessel, and a microwave source. The magnetic field strength is controllable such that an electron cyclotron resonance (ECR) area is defined near the substrate. The magnetic field generator can be arranged so that plasma and reactive gas introduction ports are on the microwave introduction side of the ECR area and the substrate is on the opposite side of the ECR area. Alternatively, a gas introduction port can be positioned such that reactive gas is introduced into the ECR area or onto the substrate.

Apparatus for plasma treatment using electron cyclotron resonance

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Hitachiohta, Japan

Shigeru Takahashi