Nitto Chemical Industry Co., Ltd.

Fujitsu Corporation

Mitsubishi Rayon Company, Limited

Shigeru Shimizu

Takashi Saitoh

Tomio Nakamura

Masashi Uzawa

Keiji Watanabe

Keiko Yano

Takashi Maruyama

Yasuhiro Yoneda

Yasuyuki Takayanagi

Ei Yano

Takahisa Namiki

Hideaki Tanaka

Koichi Kobayashi

Miwa Igarashi

Tatsuya Haga

Yoko Kuramitsu

Shinichi Maeda

Masami Ishikawa

Hiroaki Murai

Naoki Sugama

Masami Aihara

Noriyuki Sato

Yuichi Hirao

Masaki Obuchi

Mitsuhiko Sugiyama

Masami Yuasa

Kikuko Takeuchi

Takumi Kakuya

A disk storage device stores write data in a cache area of a data buffer according to a write command from a host, reports write completion to the host, and then writes the write data in the cache area to a storage medium. The disk storage device stores the write data stored in the data buffer in a save area created on the storage disk in response to the reception of a command which requires integrity, other than a write command, and reports a response to the host. Therefore processing time of this command and response time to the host can be decreased, while maintaining the safety of the write data.

Disk storage device and cache control method for disk storage device

A cross-linkable, electrically conductive composition comprising (a) a soluble, electrically conducting polymer having a sulfonic acid group and/or a carboxyl group and (b) a thermally cross-linkable or ultraviolet- or electron beam-cross-linkable resin or paint.

Cross-linkable, electrically conductive composition, electric conductor

A method for producing a soluble conductive polymer having acidic groups, which comprises subjecting to electrolytic polymerization (a) at least one compound selected from the group consisting of acidic group-substituted anilines, acidic group-substituted pyrroles, acidic group-substituted thiophenes, acidic group-substituted furans, acidic group-substituted selenophenes, acidic group-substituted tellurophenes, acidic group-substituted isothianaphthenes, acidic group-substituted isobenzofurans, acidic group-substituted isoindolines, acidic group-substituted isobenzoselenophenes, acidic group-substituted isobenzotellurophenes, and their metal salts, ammonium salts and substituted ammonium salts in a solution containing (b) a basic compound.

Method for producing soluble conductive polymer having acidic group

A soluble aniline conducting polymer characterized in that said conductive polymer comprises as a repeating unit an alkoxyl group-substituted aminobenzenesulfonic acid, its alkali metal salts, ammonium salts and/or substituted ammonium salts, and is a solid having a weight average molecular weight of about 1900 or more at room temperature, a conductive composition and electric conductor comprising the same, and a method for producing a soluble aniline conducting polymer having a weight average molecular weight of 10,000 t 3,240,000 characterized by polymerizing at least one compound (1) selected from the group consisting of an acidic group-substituted aniline, its alkali metal salts, ammonium salts and substituted ammonium salts in a solution containing a basic compound (2) using an oxidizing agent.

Soluble aniline conducting polymers

A composition for forming a conductivity imparting agent comprising:

Composition for forming conductivity imparting agent and pattern forming

A composition for irradiation with an ionizing radiation, characterized by comprising: (a) 0.01 to 30 parts by weight of a soluble aniline polymer which comprises one or both of the repeating units represented by the following general formulae (1) and (2), said repeating units being included at least 80% of the total repeating units, possesses a weight average molecular weight of not less than 10,000, and is solid at room temperature; and (b) 100 parts by weight of a solvent, ##STR1## wherein R.sup.1 to R.sup.4 represent an electron-donating group, Y.sup.1 to Y.sup.4 represent --SO.sub.3 -- or --COO--, and M.sup.1 to M.sup.4 represent a hydrogen ion, an ammonium ion, an a1kyl ammonium ion with 1 to 8 carbon atoms, an aromatic ammonium ion, or a quaternary ion of an aromatic heterocyclic ring.

Ionizing radiation exposure method utilizing water soluble aniline

A composition for forming an electrically conductive layer which is used in patterning of a resist with electric charge beam, which comprises:

Composition for forming an electrically conductive layer to be used in

Soluble alkoxy-group substituted aminobenzenesulfonic acid aniline

Sulfonated aniline-type copolymer and a process for their preparation are disclosed. These products comprise a water soluble and alcohol soluble copolymer of a compound (A) selected from the group of aniline, N-alkylaniline and phenylenediamine, and aminobenzene sulfonic acid (B); said sulfonated product being a following compound of a general formulae I to V stated in the specification, or a mixture thereof. Also, process for the sulfonated aniline-type copolymer comprises the steps:

Sulfonated aniline-type copolymer and process for production thereof

A pattern-forming method using an electroconductive composition comprising at least one TCNQ complex salt selected from the group consisting of isoquinolinium-TCNQ complex salts, quinolinium-TCNQ complex salts, alkyl pyridinium-TCNQ complex salts, and morpholinium-TCNQ complex salts, a specific polymer, and a solvent are disclosed. This composition gives an electroconductive film having a superior long-term storage stability and electroconductive characteristics. When this electroconductive composition is coated on a resist to form an electroconductive film, and a pattern is formed by an irradiation with charging beams, such as electron beams, an accumulation of charges (charge-up) is prevented and a fine resist pattern in which a misregistration is completely prevented is obtained.

Method of forming pattern by using an electroconductive composition

A conducting varnish composition consisting essentially of:

Conducting varnish composition

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Yokohama, Japan

Shigeru Shimizu