Canon Kabushiki Kaisha

Shigeo Koya

Kazunori Nakajima

Takahiro Sumi

A stage apparatus for holding a substrate, including a substrate holding unit including a holding surface that holds the substrate, a driving mechanism configured to transfer the substrate to the holding surface, and a control unit configured to decide, based on warpage information concerning warpage of the substrate measured while the substrate is supported by a supporting surface smaller than the holding surface, a driving profile of the substrate by the driving mechanism in a height direction of the substrate such that the substrate is transferred to the holding surface while the warping of the substrate is corrected.

Stage apparatus, lithography apparatus and article manufacturing method

A conveying apparatus for conveying a holding portion that includes a holding surface where the holding portion holds a substrate, the conveying apparatus including a conveying portion configured to convey the holding portion, and a cover member that covers a first surface on an opposite side of the holding surface of the holding portion, and an attaching and detaching portion configured to attach and detach the holding portion to and from the cover member, wherein the cover member comprises a first removing member configured to remove a foreign substance attached to the first surface, wherein the cover member is configured to be fixed to the holding portion while the first surface and the first removing member are in contact with each other, wherein the conveying portion conveys the holding portion and the cover member to a movable moving unit configured to hold the holding portion while having the first surface and the first removing member of the cover member be in contact with each other, wherein the conveying portion conveys the cover member from the moving unit, and wherein the attaching and detaching portion conveys the holding portion to the moving unit.

Cover member, conveying apparatus, lithography apparatus, and method of manufacturing article

A cover member that covers a first surface on an opposite side with respect to a holding surface of a holding portion that holds a substrate, the cover member including a first removing member that removes a foreign substance attached to the first surface, in which the cover member is capable of being fixed to the holding portion while the first surface and the first removing member are in contact with each other covering the first surface.

The present invention provides a holder for holding a substrate, the holder including a base to be received by a table, the base including a first surface arranged to receive the substrate to be held by the holder and a second surface opposite to the first surface, a first support provided on the second surface and arranged to surround a through hole formed in the base and configured to contact the table, a second support provided on the second surface and arranged to surround the first support and to contact the table, and a plurality of first pins provided in a region of the second surface between the second support and an outer edge of the base and arranged to contact the table.

Holder, lithography apparatus, and method of manufacturing article

A charged particle beam drawing apparatus includes: a charged particle optical system; a substrate stage; an interferometer configured to measure a position of the stage in the direction of the optical axis of the charged particle optical system; a measuring device configured to measure a characteristic of the charged particle beam; and a controller configured to correct the measurement, obtained by the interferometer, using correction information. The controller is configured to cause first measurement as measurement by the interferometer and second measurement as measurement by the measuring device to be performed in parallel, and to obtain the correction information based on the first measurement and the second measurement obtained with respect to each of the plurality of positions.

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Utsunomiya, Japan

Shigeo Koya