Hitachi, Ltd.

Shigemi Ishii

Minori Noguchi

Yukihiro Shibata

Tsuneo Terasawa

Yoshitada Oshida

Makoto Murayama

Tutomu Tawa

A projection exposure apparatus comprises a light source for emitting a light beam for exposure; an illumination optical system comprising optical fiber bundle portion including a plurality of bundled optical fibers having an entrance plane to which a light beam exiting from the exposing light source is incident, and a little optical fiber bundle portion including a plurality of little optical fiber bundles respectively having an outgoing plane; and an projection exposure system for projecting a light beam passing through the illumination optical system and transmitting a mask or a reticle onto an object to be exposed as a pattern image of the mask or the reticle.

Growing community of inventors

Ibaraki, Japan

Shigemi Ishii