Shin-etsu Handotai Co., Ltd.

Shigemaru Maeda

Izumi Fusegawa

Ryoji Hoshi

Tomohiko Ohta

Koji Mizuishi

Kouji Mizuishi

Nobuo Katsuoka

Shinichi Furuse

The present invention provides a silicon wafer sliced from a silicon single crystal ingot grown by the Czochralski method under such conditions that V-rich region should become dominant, wherein count number of particles having a size of 0.1 &mgr;m or more is 1 count/cm or less when particles are counted by using a particle counter and a method for producing a silicon single crystal. Thus, there is provided a production technique that can improve productivity and reduce cost for high quality silicon wafers of excellent device characteristics by further reducing density and size of defects such as COP.

Silicon wafer and method for producing silicon single crystal

A crystal pulling apparatus is disclosed in which a single crystal ingot is pulled from a melt of a crystalline material by using a cable. A crimp portion and a spherical portion supported by the crimp portion are provided in the vicinity of the tip of the cable. Two divided couplings are screwed into a chuck body of a seed chuck. The couplings have an accommodation space therein so as to accommodate the cable and the spherical portion, and conical hole sections serving as the shoulder portion of the accommodation space contact and hold the spherical portion. This structure allows the cable to rotate during crystal pulling operation and facilitates attachment of the seed chuck to the cable and removal of the seed chuck from the cable.

Crystal pulling apparatus

A Czochralski-type single crystal pulling apparatus in which the heater device is adapted to shift vertically, and a control device is provided for controlling the vertical shifting of the heater and the crucible assembly in predetermined manners, of which a preferred manner is to control the vertical shifting of the heater and the crucible assembly such that the vertical velocities of the crucible assembly and the heater are in direct proportion to the vertical velocity of the pull means.

Single crystal pulling apparatus

Growing community of inventors

Takefu, Japan

Shigemaru Maeda