Kabushiki Kaisha Toshiba

Shigeki Nishizumi

Takahiro Mori

Norimitsu Kato

Hisatoshi Ikeda

Hiroaki Toda

Tsutomu Tanaka

A resistance-provided UHV breaker includes a tank, a main contact unit, a resistance unit, and a resistance contact unit. The main contact unit includes plural main contacts arranged in the axial direction of the tank. The resistance unit includes plural resistances arranged in the axial direction of the tank. The resistance contact unit cooperates with the resistance unit to form a resistant parallel circuit and it is arranged, crossing the axial direction of the tank. The main and resistance contact units are opened and closed by an operating mechanism arranged outside the tank.

UHV breaker provided with resistances

A resistor-provided UHV breaker has a tank sealing an insulating gas therein, a main contact unit located in the tank, a resistor unit connected parallel to the main contact unit, a resistor contact unit located in the tank, a main contact making/breaking unit for making and breaking the main contact unit, and a resistor contact making/breaking unit for making and breaking the resistor contact unit. Further, the breaker has a coupling unit for coupling the main contact making/breaking unit with the resistor contact making/breaking unit. The coupling unit drives the main contact making/breaking unit together with the resistor contact making/breaking unit during closing operation of the main contact unit, and drives the main contact making/breaking unit and the resistor contact making/breaking unit, independently, during breaking operation of the main contact unit.

Resistor-provided UHV breaker having delaying/operating mechanism for

A resistor-provided UHV breaker includes a tank, a main contact unit, a resistor unit, a resistor contact unit, support members, and a displacement absorbing system. The support members are arranged between the main contact and the resistor unit to support the resistor unit relative to the main contact unit. The displacement absorbing system is arranged at both ends of the resistor unit to absorb the relative displacement of the resistor unit in its axial direction.

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Tokyo, Japan

Shigeki Nishizumi