Canon Kabushiki Kaisha

Shigehira Iida

Keishi Saitoh

Tetsuya Takei

Junichiro Hashizume

Takayoshi Arai

Yuji Kondo

Tsuyoshi Santo

Motoaki Sato

Kenichi Yamaguchi

The invention provides a recording medium for ink having an ink absorbing ability capable of absorbing ink of a large amount at a high speed, showing an excellent color forming ability and capable of suppressing an image deterioration by a dye displacement which tends to appear particularly in an image storage under a high humidity condition, and an image deterioration caused by light when a printed image is displayed, and showing an excellent stability with time of the printed image, and a method for producing such recording medium for ink. The invention also provides a recording medium for ink having at least one layer laminated on a substrate and including an ink receiving layer containing alumina hydrate as an outermost layer, in which a surface of the substrate at least on the side of the ink receiving layer is subjected to a cationizing treatment, further having an undercoat layer on the side of such cationizing treatment to obtain cations in a predetermined distribution, and having an outermost ink receiving layer laminated on said undercoat layer, and a producing method for such recording medium for ink.

Recording medium for ink and method for producing the same

A recording medium for ink, capable of rapidly absorbing large amounts of ink, showing excellent color forming ability and capable of suppressing image deterioration caused by dye displacement that occurs when an image is stored in humid conditions and image deterioration caused by light when a printed image is displayed, and providing a printed image showing excellent long-term stability. The invention also provides a recording medium for ink having at least one layer provided on a substrate, and an ink receiving layer containing alumina hydrate as an outermost layer. A surface of the substrate at least on the side of the ink receiving layer is subjected to a cationizing treatment. An undercoat layer is provided on the same side as the cationizing treatment, to obtain cations in a predetermined distribution. The outermost ink receiving layer is provided on the undercoat layer.

A method of manufacturing a recording medium with an excellent productivity is provided. The method provides a recording medium having excellent ink absorbency and coloring property and includes an ink-receiving layer in which a binder is restricted and controlled. The present invention provides a method of manufacturing a recording medium including the steps of: performing a surface treatment on a substrate; and forming an ink-receiving layer using at least a pigment, polyvinyl alcohol, and a coating liquid that contains at least one selected from the group consisting of boric acid and borate. In this method, the surface-treatment step includes a first surface treatment and a second surface treatment. In the first surface treatment, a coating liquid that contains at least one selected from the group consisting of boric acid and borate is applied followed by being dried and solidified. In the second surface treatment, after the first surface treatment, a coating liquid that contains at least one selected from the group consisting of boric acid and borate is applied on the substrate. While the substrate is in a state of being wet by the coating liquid applied in the second surface treatment, the substrate is further coated with a coating liquid for forming the ink-receiving layer.

Recording medium having ink-receiving layer and method of manufacturing the same

An improved method for forming a functional deposited film by introducing a raw material gas into a substantially enclosed reaction chamber containing a substrate onto which the functional deposited film is to be deposited and coupling microwave energy from a source of microwave energy thereinto to thereby form a glow discharge plasma causing decomposition of the raw material gas whereby forming the functional deposited film on the substrate, the improvement comprising supplying microwave of a power equivalent of 1.1 times or more over that of microwave with which the deposition rate for the decomposed products from the raw material gas being deposited onto the substrate to be saturated to the raw material gas in the reaction chamber and regulating the inner pressure of the reaction chamber to a vacuum of 10 m Torr or less. According to the method of this invention, there can be formed a desired functional deposited film having a wealth of many practically applicable characteristics and having an improved response speed against photocurrent at an improved deposition rate with a raw material gas utilization efficiency of hundred percent or nearly hundred percent. And the method of this invention makes it possible to mass-produce various functional elements comprising such deposited film usable in electrophotographic photosensitive member, photosensor, thin-film transistor, solar cell, etc. on an industrial scale thereby enabling low cost production.

Method for forming functional deposited films by means of microwave

An improved method for forming a functional deposited film by introducing a raw material gas into a substantially enclosed reaction chamber containing a substrate onto which the functional deposited film is to be deposited and coupling microwave energy from a source of microwave energy thereinto to thereby form a glow discharge plasma causing decomposition of the raw material gas whereby forming the functional deposited film on the substrate, the improvement comprising supplying microwave of a power equivalent to 1.1 times or more over that of microwave with which the deposition rate for the decomposed products from the raw material gas being deposited onto the substrate to be saturated to the raw material gas in the reaction chamber and regulating the inner pressure of the reaction chamber to a vacuum of 10 m Torr or less. According to the method of this invention, there can be formed a desired functional deposited film having a wealth of many practically applicable characteristics and having an improved response speed against photocurrent at an improved deposition rate with a raw material gas utilization efficiency of hundred percent or nearly hundred percent. And the method of this invention makes it possible to mass-produce various functional elements comprising such deposited film usable in electrophotographic photosensitive member, photosensor, thin-film transistor, solar cell, etc. on an industrial scale thereby enabling low cost production.

An improved MW-PCVD apparatus, characterized in that in the MW-CVD apparatus having a substrate onto which a deposited film to be formed and a space near the substrate for the decomposition of a raw material gas with the action of microwave energy, a shielding member is provided between said substrate and said space, which has an opening to allow part of the decomposed raw material gas species to be passed toward the substrate.

Microwave plasma CVD apparatus having substrate shielding member

An improved microwave plasma CVD apparatus for the formation of a thin film on a substrate by exciting glow discharge in a reaction chamber, comprising a substantially enclosed reaction chamber to receive the substrate, a means for supplying a film forming raw material gas into said reaction chamber and a means for introducing microwave energy into said reaction chamber, characterized in that said means for introducing microwave energy retains the gas atmosphere in said reaction chamber and as well as is constituted by a microwave transmissive material capable of introducing the microwave energy, said material being alumina ceramics containing glassy component such as SiO.sub.2, CaO and MgO in an amount of 1 wt. % to 10 wt. % and substantially as other component .alpha.-alumina. In the improved apparatus, the microwave transmissive window can be repeatedly used without being damaged for a long period of time and a desirable functional deposited film may be mass-produced at a high deposition rate.

Microwave plasma CVD apparatus having an improved microwave transmissive

An improvement in the known MW-PCVD process for forming a deposited film on each of a plurality of cylindrical substrates being so arranged as to surround the discharging space in a substantially enclosed reaction space of a deposition chamber by the glow discharge of raw material gas to generate plasmas containing reactive gaseous materials causing the formation of said deposited film in the discharging space while rotating said plurality of substrates, which comprises providing a gas feed pipe provided with a plurality of gas liberation holes opening into the discharging space in every space between every two of the substrates so as to form an encircled discharging space and an open non-discharging space by said plurality of cylindrical substrates and a plurality of gas feed pipes and regulating the deposit thickness to be deposited per a rotation cycle of the substrate passing through the discharging space and the non-discharging space to a 1000 .ANG. or less.

Process for forming a deposited film on each of a plurality of

According to the present invention, there is provided an improved process for the formation of a deposited film by way of a microwave plasma CVD method, the improvement comprising monitoring an effective power of a microwave to be introduced into a reaction chamber, leading to a control means an output signal indicative of the effective power corresponding a plasma intensity, and automatically controlling the matching between the reaction chamber and the microwave to be introduced into the reaction chamber according to an output signal from the control means. According to the above process, even after a long discharge time has elapsed, the plasma intensity in the reaction chamber may be maintained constant, and the effective power of the microwave to be introduced into the reaction chamber may be therefore maintained constant. Because of this, it becomes possible to repeatedly and stably prepare a desired deposited film excelling in the uniformity of the thickness and that of the quality at a high deposition rate.

Growing community of inventors

Ueno, Japan

Shigehira Iida