Fujifilm Corporation

Shigehide Itou

Kenichi Ishizuka

Satoshi Sano

Takeshi Umehara

Kentaro Shiratsuchi

Ichirou Nagata

Tomonori Ishino

Makoto Sawada

Takeshi Narita

Yusuke Mochizuki

Atsushi Mukai

Hiroyuki Noda

Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator.0.9&#x2265;&#x2265;0.63&#x2003;&#x2003;Expression 1&#x2265;1.7&#x2003;&#x2003;Expression 2In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.

Gas separation membrane, method of producing gas separation membrane, gas separation membrane module, and gas separator

Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator.0.9&#x2265;&#x2265;0.55&#x2003;&#x2003;Expression 1&#x2265;1.7&#x2003;&#x2003;Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.

A gas separation membrane containing a support and a separating layer formed on the support,

Gas separation membrane, method of producing the same, and gas separating membrane module using the same

A separation composite membrane including: a separating layer for separating fluid components, the separating layer being constituted of a polymer having cross-linked structure, and a porous layer for supporting the separating layer, the porous layer having a maximum pore diameter of 0.05 to 0.5 &#x3bc;m, the separating layer being partly impregnated into the porous layer in the range of 0.1 to 30% in terms of the impregnation amount ratio (&#x3b7;a) defined by Formula (A):[impregnation amount ratio (&#x3b7;){%}=impregnation depth ()/(membrane thickness () of separating layer)&#xd7;100]&#x2003;&#x2003;(A).

Separation composite membrane and separating membrane module using the same

A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin has structure in which a polyimide compound is crosslinked and linked, and the polyimide compound is a copolymer having at least an imide group-containing monomer component and a monomer component having a specific polar group; and a module, a gas separation apparatus and a gas separation method using the same.

Gas separation composite membrane, and gas separating module, gas separation apparatus and gas separation method using the same

A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin is formed by a polyimide compound being crosslinked by a radically crosslinkable functional group thereof, and a ratio [&#x3b7;] of a crosslinked site to an imide group of the polyimide compound (the number of crosslinked sites/the number of imide groups) in the crosslinked polyimide resin is 0.0001 or more and 0.45 or less; a method of producing the same; and a gas separating module, a gas separation apparatus and a gas separation method using the same.

Gas separation composite membrane and method of producing the same, and gas separating module, gas separation apparatus and gas separation method using the same

A gas separation composite membrane, containing a gas-permeable supporting layer and a gas separating layer containing a crosslinked polyimide resin over the gas-permeable supporting layer, in which the crosslinked polyimide resin has structure in which a polyimide compound is crosslinked through a specific crosslinking chain, the specific crosslinking chain has at least one kind of linking group selected from the group consisting of &#x2014;NRC(&#x2550;O)&#x2014;, &#x2014;NRC(&#x2550;O)O&#x2014;, &#x2014;CHOCH&#x2014;, &#x2014;CHSCH&#x2014;, &#x2014;OC(&#x2550;O)O&#x2014;, &#x2014;C(&#x2550;O)ON(R)&#x2014;, &#x2014;SON(R)&#x2014; and &#x2014;PON(R)&#x2014;, and R, R, R, Rand Reach independently represent a hydrogen atom or a substituent.

Gas separation composite membrane and gas separating module, gas separation apparatus and gas separation method using the same

A laminate film having excellent barrier property is provided. The laminate film comprises a substrate film, an organic layer and an inorganic layer in that order, wherein the organic layer has a thickness of 300 nm to 2000 nm, the inorganic layer comprises silicon oxide represented by SiOx, wherein x is in a range from 0.9 to 1.5, and the organic layer has a surface satisfying Ra (100 &#x3bc;m square)&#x3c;50 nm, Ra (10 &#x3bc;m square)&#x3c;2 nm, and 75 nm&#x3c;Rz (100 &#x3bc;m square)&#x3c;300 nm.

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Ashigarakami-gun, Japan

Shigehide Itou