Other

Sharp Kabushiki Kaisha Corporation

Shigeaki Zaima

Hiroshi Iwata

Akira Sakai

Akihide Shibata

Seizo Kakimoto

Nobutoshi Arai

Takayuki Ogura

Kouichirou Adachi

Yukio Yasuda

A memory film operable at a low voltage and a method of manufacturing the memory film; the method, comprising the steps of forming a first insulation film () on a semiconductor substrate () forming a first electrode, forming a first conductor film () on the first insulation film (), forming a second insulation film (B) on the surface of the first conductor film (), forming a third insulation film containing conductor particulates () on the second insulation film (B), and forming a second conductor film forming a second electrode on the third insulation film.

Memory film, method of manufacturing the memory film, memory element, semiconductor storage device, semiconductor integrated circuit, and portable electronic equipment

Growing community of inventors

Kasugai-shi, Aichi, Japan

Shigeaki Zaima